Method for producing glass particulate deposit and method for producing glass preform
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C03B-019/14
C03B-037/014
출원번호
US-0537004
(2014-11-10)
등록번호
US-9676657
(2017-06-13)
우선권정보
JP-2013-235193 (2013-11-13)
발명자
/ 주소
Ishihara, Tomohiro
Yamazaki, Takashi
출원인 / 주소
SUMITOMO ELECTRIC INDUSTRIES, LTD.
대리인 / 주소
Drinker Biddle & Reath LLP
인용정보
피인용 횟수 :
0인용 특허 :
3
초록▼
A production method for a glass particulate deposit which includes a deposition step in which, at least two liquid source material ejecting ports 31a for a glass source material 23 jetting out from a burner 22 are provided per one burner 22, the area of at least one liquid source material port 31a i
A production method for a glass particulate deposit which includes a deposition step in which, at least two liquid source material ejecting ports 31a for a glass source material 23 jetting out from a burner 22 are provided per one burner 22, the area of at least one liquid source material port 31a is 2.25×10−4 or less of the area of the flame forming part of the burner 22, the glass source material 23 is, in the form of a liquid thereof, supplied to each liquid material source port 31a, jetting gas ports 31b are arranged in such a manner that the inner periphery of the jetting gas port is positioned outside by 1.0 mm or less from the outer periphery of each liquid source material port 31a, and a gas is jetted out from each gas jetting port 31b.
대표청구항▼
1. A production method for a glass particulate deposit which includes a deposition step where a starting rod and a burner for production of glass particles are installed in a reactor, a glass source material is introduced into the burner, the glass source material is subjected to flame thermal decom
1. A production method for a glass particulate deposit which includes a deposition step where a starting rod and a burner for production of glass particles are installed in a reactor, a glass source material is introduced into the burner, the glass source material is subjected to flame thermal decomposition in the flame formed by the burner to thereby form glass particles, and the formed glass particles are deposited on the starting rod to produce a glass particulate deposit, wherein: in the deposition step, at least two ejecting ports are provided per one burner for ejecting the glass source material jetting out from the burner, the area of at least one ejecting port of those ejecting ports is 2.25×10−4 or less of the area of the flame forming part of the burner, the glass source material is, in the form of a liquid thereof, supplied to each of the ejecting ports, gas jetting ports are arranged in such a manner that the inner periphery of the gas jetting port is positioned outside by 1.0 mm or less from the outer periphery of the liquid material ejecting port, and a gas is jetted out from the gas jetting port at a flow rate of more than 513 m/s. 2. The production method for a glass particulate deposit according to claim 1, wherein in the deposition step, five or more liquid material ejecting ports are provided per one burner. 3. The production method for a glass particulate deposit according to claim 1, wherein in the deposition step, the area of at least one ejecting port is 1.00×10−4 or less of the area of the flame forming part of the burner. 4. The production method for a glass particulate deposit according to claim 1, wherein in the deposition step, the area of at least one ejecting port is 2.50×10−5 or less of the area of the flame forming part. 5. The production method for a glass particulate deposit according to claim 1, wherein in the deposition step, the area of at least one ejecting port is 4.00×10−6 or less of the area of the flame forming part. 6. The production method for a glass particulate deposit according to claim 1, wherein in the deposition step, a gas containing oxygen gas is jetted out through each gas jetting port to thereby atomize the glass source material jetting out through each ejecting port. 7. The production method for a glass particulate deposit according to claim 6, wherein in the deposition step, the gas is jetted out at a flow rate of 856 m/s or more through each gas jetting port to thereby atomize the glass source material jetting out through each liquid material ejecting port. 8. The production method for a glass particulate deposit according to claim 7, wherein in the deposition step, the number of the oxygen molecules contained in the gas jetted out through each gas jetting port is not less than the number of the Si atoms contained in the glass source material jetting out through each liquid material ejecting port. 9. The production method for a glass particulate deposit according to claim 7, wherein in the deposition step, the number of the oxygen molecules contained in the gas jetted out through each gas jetting port is at least 1.5 times the number of the Si atoms contained in the glass source material jetting out through each liquid material ejecting port. 10. The production method for a glass particulate deposit according to claim 6, wherein in the deposition step, the gas is jetted out at a flow rate of 1283 m/s or more through each gas jetting port to thereby atomize the glass source material jetting out through each liquid material ejecting port. 11. The production method for a glass particulate deposit according to claim 1, wherein in the deposition step, the glass source material to be supplied to the burner is siloxane. 12. The production method for a glass particulate deposit according to claim 1, wherein in the deposition step, the glass source material to be supplied to the burner is octamethylcyclotetrasiloxane (OMCTS). 13. A production method for a glass preform which includes a vitrification step where a glass particulate deposit is produced according to the production method for a glass particulate deposit of claim 1, and the thus-produced glass particulate deposit is heated to give a transparent glass preform. 14. The production method for a glass preform according to claim 13, wherein the deposition of the glass particles on the starting rod in the deposition step is implemented according to any of an OVD process, a VAD process or an MMD process.
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이 특허에 인용된 특허 (3)
Bakshi, Shivalik; Hawtof, Daniel W.; Rosettie, John S.; Rovelstad, Amy L.; Stone, III, John, Multi-layer burner module, adapter, and assembly therefor.
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