A PLD in which a configuration memory is formed using a nonvolatile memory with a small number of transistors and in which the area of a region where the configuration memory is disposed is reduced is provided. Further, a PLD that is easily capable of dynamic reconfiguration and has a short startup
A PLD in which a configuration memory is formed using a nonvolatile memory with a small number of transistors and in which the area of a region where the configuration memory is disposed is reduced is provided. Further, a PLD that is easily capable of dynamic reconfiguration and has a short startup time is provided. A programmable logic device including a memory element, a selector, and an output portion is provided. The memory element includes a transistor in which a channel is formed in an oxide semiconductor film, and a storage capacitor and an inverter which are connected to one of a source and a drain of the transistor. The inverter is connected to the selector. The selector is connected to the output portion.
대표청구항▼
1. A semiconductor device comprising: a first circuit;a second circuit; andan output portion,wherein the first circuit comprises: a first transistor;a second transistor; anda capacitor,wherein one of a source and a drain of the first transistor is electrically connected to a gate of the second trans
1. A semiconductor device comprising: a first circuit;a second circuit; andan output portion,wherein the first circuit comprises: a first transistor;a second transistor; anda capacitor,wherein one of a source and a drain of the first transistor is electrically connected to a gate of the second transistor,wherein the second circuit comprises a third transistor,wherein one of a source and a drain of the second transistor is electrically connected to one of a source and a drain of the third transistor,wherein the capacitor is electrically connected to the gate of the second transistor, andwherein the other of the source and the drain of the third transistor is electrically connected to the output portion. 2. The semiconductor device according to claim 1, wherein a gate of the first transistor is electrically connected to a first wiring, andwherein the other of the source and the drain of the first transistor is electrically connected to a second wiring. 3. The semiconductor device according to claim 1, wherein the second circuit comprises a plurality of third circuits each comprising an input terminal, an inverter and a fourth transistor, andwherein conduction between the first circuit and the output portion depends on a conduction state of the fourth transistor, the conduction state being determined by a signal input from the input terminal. 4. The semiconductor device according to claim 1, further comprising a first precharge circuit electrically connected to the output portion. 5. The semiconductor device according to claim 1, further comprising a second precharge circuit electrically connected to the other of the source and the drain of the second transistor. 6. The semiconductor device according to claim 1, further comprising a latch circuit between the third transistor and the output portion. 7. The semiconductor device according to claim 1, wherein the first transistor comprises an oxide semiconductor layer, wherein a channel is formed in the oxide semiconductor layer. 8. A semiconductor device comprising: a first circuit;a second circuit; andan output portion,wherein the first circuit comprises: a first transistor;a second transistor; anda third transistor,wherein one of a source and a drain of the first transistor is electrically connected to a gate of the second transistor,wherein one of a source and a drain of the second transistor is electrically connected to one of a source and a drain of the third transistor,wherein the second circuit comprises a fourth transistor,wherein the other of the source and the drain of the third transistor is electrically connected to one of a source and a drain of the fourth transistor, andwherein the other of the source and the drain of the fourth transistor is electrically connected to the output portion. 9. The semiconductor device according to claim 8, wherein a gate of the first transistor is electrically connected to a first wiring, andwherein the other of the source and the drain of the first transistor is electrically connected to a second wiring. 10. The semiconductor device according to claim 8, wherein the second circuit comprises a plurality of third circuits each comprising an input terminal, an inverter and a fifth transistor, andwherein conduction between the first circuit and the output portion depends on a conduction state of the fifth transistor, the conduction state being determined by a signal input from the input terminal. 11. The semiconductor device according to claim 8, further comprising a first precharge circuit electrically connected to the output portion. 12. The semiconductor device according to claim 8, further comprising a second precharge circuit electrically connected to the other of the source and the drain of the second transistor. 13. The semiconductor device according to claim 8, wherein the first transistor comprises an oxide semiconductor layer, wherein a channel is formed in the oxide semiconductor layer.
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