|국가/구분||United States(US) Patent 등록|
|국제특허분류(IPC7판)||A61L-002/00 B08B-003/00 D06F-039/02 A01N-059/16 D06M-023/10|
|발명자 / 주소|
|출원인 / 주소|
|대리인 / 주소||
|인용정보||피인용 횟수 : 0 인용 특허 : 72|
An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the ...
1. An antimicrobial fabric treatment system comprising: a metallic ion supply providing a high ion concentrate to an output;a dilution reservoir connected to the metallic ion supply output and having an input from a process water supply;a dosing pump connected to an output of the reservoir;a manifold connected to the pump and providing a dilute concentrate to at least one washing system; and,an electronics control module connected to a first flow controller between the process water supply and the dilution reservoir and a second flow controller between t...