이 특허에 인용된 특허 (41)

1. Taylor,Theodore M., Apparatus and method for conditioning a polishing pad used for mechanical and/or chemical-mechanical planarization.

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2. Tetsuji Togawa JP; Nobuyuki Takada JP; Seiji Katsuoka JP; Kenichi Shigeta JP, Apparatus and method for polishing workpiece.

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3. Birang Manoocher ; Prince John, Apparatus and method to determine the coefficient of friction of a chemical mechanical polishing pad during a pad condi.

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4. Damon Vincent Williams, Apparatus and methods for controlling pad conditioning head tilt for chemical mechanical polishing.

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5. Kinoshita, Toshiya, Beveling grindstone.

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6. Flener Jeff M. (456 N. Yucca Cir. Mesa AZ 85201), Canister for surface mount electronic components.

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7. Fowler Allan R. (Santa Ana CA) Bolls Alfred W. (Foster City CA), Carrier accessory for use with record discs on phonographs.

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8. Halpin, Michael; Shero, Eric; White, Carl; Alokozai, Fred; Winkler, Jerry; Dunn, Todd, Chamber sealing member.

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9. Donohue,Timothy J., Conditioner disk for use in chemical mechanical polishing.

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10. Perlov Ilya ; Gantvarg Eugene, Conditioner head in a substrate polisher and method.

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11. Shinozaki, Hiroyuki, Dresser disk.

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12. Shinozaki, Hiroyuki, Dresser disk.

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13. Shinozaki, Hiroyuki, Dresser disk.

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14. Shinozaki, Hiroyuki; Maekawa, Toshiro, Dresser disk.

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15. Koike, Eijiro; Nakagawa, Yasutada; Higuchi, Masatoshi, Dresser, polishing apparatus and method for producing an article.

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16. Togawa, Tetsuji; Yamaguchi, Kuniaki; Takada, Nobuyuki; Wakabayashi, Satoshi, Dressing apparatus.

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17. Togawa, Tetsuji; Nabeya, Osamu, Dressing apparatus and polishing apparatus.

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18. Hsu Wei-Chieh,TWX, Dressing apparatus for chemical mechanical polishing pad.

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19. Nagakubo, Keiichi, Electrode member for a plasma processing apparatus.

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20. Kuwabara, Yusei; Nagakubo, Keiichi, Electrode plate for a plasma processing apparatus.

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21. Benner,Stephen J., Enhanced end effector arm arrangement for CMP pad conditioning.

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22. Chou,Samuel, Grinding wheel in combination with a grinding ring.

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23. Shi, Tai-Ping; Ke, Qi-Cai, Grinding wheel machining device.

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24. Uppendahl Elizabeth S. (108 N. Centre St. ; #12 San Pedro CA 90731), Horizontal T-square indicator.

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25. Lyon Garnet R. (Elmira NY), Index ring for a machine tool.

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26. Suzuki, Kouki; Toriya, Daisuke; Yamazaki, Koichi, Liner for plasma processing apparatus.

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27. Butler David M. (529 Chesapeake Ave. Stevensville MD 21666) Kirkpatrick Harold B. (830 W. 40th St. Baltimore MD 21217) Staehlin John H. (Mays Chapel Rd. Lutherville MD 21093), Measurement of blood coagulation time using infrared electromagnetic energy.

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28. Tobin, James F.; Weise, Greg, Method and apparatus for controlling a pad conditioning process of a chemical-mechanical polishing apparatus.

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29. Korovin, Nikolay; Stoya, Robert J., Methods and apparatuses for conditioning polishing surfaces utilized during CMP processing.

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30. Hisanori Matsuo JP; Hirokuni Hiyama JP; Yutaka Wada JP; Kazuto Hirokawa JP, Polishing apparatus.

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31. Satoshi Wakabayashi JP; Tetsuji Togawa JP; Nobuyuki Takada JP; Kuniaki Yamaguchi JP, Polishing apparatus.

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32. Suzuki, Hiroo, Polishing apparatus.

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33. Inaba Shoichi,JPX ; Katsuyama Takao,JPX ; Tanaka Morimitsu,JPX, Polishing apparatus and method.

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34. Shimokawa, Kimiaki, Polishing apparatus having a dresser and dresser adjusting method.

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35. Balagani,Venkata R.; Lazari,George; Ngan,Kenny King Tai, Polishing pad conditioner with shaped abrasive patterns and channels.

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36. Gillespie-Brown, Jon Simon; Meyerhoffer, Thomas Erik, Power charging ring.

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37. Shero, Eric; Halpin, Michael; Winkler, Jerry, Radiation shielding for a substrate holder.

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38. Markowski, John E.; Ruglio, Anthony G.; Patel, Dipakkumar S.; Lockyer, Keith E., Removing material from a workpiece with a water jet.

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39. Dunn, Todd; Alokozai, Fred; Winkler, Jerry; Halpin, Michael, Susceptor heater and method of heating a substrate.

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40. Dunn, Todd; White, Carl; Halpin, Michael; Shero, Eric; Winkler, Jerry, Susceptor heater shim.

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41. Tateno, Hideto; Hara, Daisuke; Okuno, Masahisa; Joda, Takuya, Vaporizer for substrate processing apparatus.

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