Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B24B-057/00
B24B-057/02
출원번호
US-0218578
(2014-03-18)
등록번호
US-9770804
(2017-09-26)
발명자
/ 주소
Byers, Gary Allen
Derecskei, Bela
Bayer, Benjamin Patrick
출원인 / 주소
VERSUM MATERIALS US, LLC
대리인 / 주소
Kiernan, Anne B.
인용정보
피인용 횟수 :
0인용 특허 :
112
초록▼
A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend
A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.
대표청구항▼
1. A slurry and/or chemical blend supply apparatus comprising a bend module and a distribution module, said bend module and said distribution module being in fluid communication, said blend module comprises at least one blend train comprising at least three component pipes, each component pipe for f
1. A slurry and/or chemical blend supply apparatus comprising a bend module and a distribution module, said bend module and said distribution module being in fluid communication, said blend module comprises at least one blend train comprising at least three component pipes, each component pipe for flowing a different component stream therein and comprising at least one flow controller in each component pipe, said component pipes combine to form blended slurry or chemical blend in a single pipe in said blend module; said distribution module comprises at least two distribution tanks and at least two global loops wherein said blend module blends and supplies at least part of said blended slurry or said chemical blend to a first distribution tank of said at least two distribution tanks of said distribution module to supply said blended slurry or said chemical blend to a first global loop of said at least two global loops in fluid communication with the first distribution tank and said blend module blends and supplies at least part of a second chemical blend or a second blended slurry to a second distribution tank of said at least two distribution tanks to supply said second chemical blend or said second blended slurry to a second global loop in fluid communication with the second distribution tank; each of said global loops comprises a connection to an exit opening of each of said distribution tanks, at least one pump, connections to a plurality of tools, and global loop return pipe to each of said distribution tanks; wherein each of said global loops transports said first or second chemical blend or said first or second blended slurry from each of said distribution tanks to said plurality of tools that consumes at least a portion of said chemical blend or blended slurry and returns any unused said chemical blend or said blended slurry to each of said distribution tanks; and further wherein said first and second chemical blends may be the same or different, and said first and second blended slurries may be the same or different; and wherein said first global loop comprises at least one filter element located in said global loop upstream of said plurality tools. 2. The slurry and/or chemical blend supply apparatus of claim 1 wherein said blend module comprises first and second blend trains for blending the first chemical blend or first blended slurry in the first blend train and for blending the second chemical blend or second blended slurry in the second blend train. 3. The slurry and/or chemical blend supply apparatus of claim 1 wherein said first and second blended slurries are not the same. 4. A slurry and/or chemical blend supply apparatus comprising a bend module and a distribution module, said bend module and said distribution module being in fluid communication, said blend module comprises at least one blend train comprising at least three component pipes, each component pipe for flowing a different component stream therein and comprising at least one flow controller in each component pipe, said component pipes combine to form blended slurry or chemical blend in a single pipe in said blend module; said distribution module comprises at least two distribution tanks and at least two global loops wherein said blend module blends and supplies at least part of said blended slurry or said chemical blend to a first distribution tank of said at least two distribution tanks of said distribution module to supply said blended slurry or said chemical blend to a first global loop of said at least two global loops in fluid communication with the first distribution tank and said blend module blends and supplies at least part of a second chemical blend or a second blended slurry to a second distribution tank of said at least two distribution tanks to supply said second chemical blend or said second blended slurry to a second global loop in fluid communication with the second distribution tank; each of said global loops comprises a connection to an exit opening of each of said distribution tanks, at least one pump, connections to a plurality of tools, and global loop return pipe to each of said distribution tanks; wherein each of said global loops transports said first or second chemical blend or said first or second blended slurry from each of said distribution tanks to said plurality of tools that consumes at least a portion of said chemical blend or blended slurry and returns any unused said chemical blend or said blended slurry to each of said distribution tanks; and further wherein said first and second chemical blends may be the same or different, and said first and second blended slurries may be the same or different; wherein said blend train further comprises a split mixer wherein said split mixer comprises at least three feed pipes one for each of the three component streams, said feed pipes are each connected to a receiving pipe with a middle feed pipe located between the other two feed pipes, at least two split pipes connected to opposite ends of said receiving pipe and a rejoinder pipe connected where said at least two split pipes come together and connect to said single pipe. 5. The slurry and/or chemical blend supply apparatus of claim 1 wherein said first and second global loops are in fluid communication with the same said plurality of tools. 6. A slurry and/or chemical blend supply apparatus comprising a bend module and a distribution module, said bend module and said distribution module being in fluid communication, said blend module comprises at least one blend train comprising at least two component pipes, each component pipe for flowing a component stream therein and comprising at least one flow controller in each component pipe, said component pipes combine to form blended slurry or chemical blend in a single pipe in said blend module; said distribution module comprises at least two distribution tanks and at least two global loops wherein said blend module blends and supplies at least part of said blended slurry or said chemical blend to a first distribution tank of said at least two distribution tanks of said distribution module to supply said blended slurry or said chemical blend to a first global loop of said at least two global loops in fluid communication with the first distribution tank and said blend module blends and supplies at least part of a second chemical blend or a second blended slurry to a second distribution tank of said at least two distribution tanks to supply said second chemical blend or said second blended slurry to a second global loop in fluid communication with the second distribution tank; each of said global loops comprises a connection to an exit opening of each of said distribution tanks, at least one pump, connections to a plurality of tools, and global loop return pipe to each of said distribution tanks; wherein each of said global loops transports said first or second chemical blend or said first or second blended slurry from each of said distribution tanks to said plurality of tools that consumes at least a portion of said chemical blend or blended slurry and returns any unused said chemical blend or said blended slurry to each of said distribution tanks; and further wherein said first and second chemical blends may be the same or different, and said first and second blended slurries may be the same or different; further comprising one or more additional pipes and at least one valve in each of said one or more pipes connecting at least one of said component pipes in said blend module to said distribution tank for dosing at least one of said components directly into said distribution tank as needed. 7. The slurry and/or chemical blend supply apparatus of claim 6 wherein said at least one valve and said one or more additional pipes for dosing the distribution tank are connected downstream of said at least one flow controller in said at least one of said component pipes. 8. The slurry and/or chemical blend supply apparatus of claim 6 further comprising an analytical module and a sample tube in fluid communication between the single pipe in the blend module and the analytical module, wherein at least part of the blended slurry or chemical blend from the blend module is directed from the blend module to the analytical module by the sample tube and further wherein the analytical module comprises one or more of the group consisting of one or more pH sensors, one or more hydrogen peroxide sensors, one or more density sensors, one or more conductivity sensors, one or more liquid particle counters and one or more particle size distribution analyzers. 9. The slurry and/or chemical blend supply apparatus of claim 8 further comprising a second sample tube in fluid communication with the first global loop wherein at least part of the blended slurry or chemical blend from the distribution module is directed to the analytical module by the second sample tube. 10. The slurry and/or chemical blend supply apparatus of claim 6 further comprising a controller for controlling the dosing based on the time that the blended slurry or chemical blend is present in said distribution tank. 11. The slurry and/or chemical blend supply apparatus of claim 6 wherein said one or more additional pipes for dosing each have flow controllers therein for controlling an amount of said component dosed into the distribution tank. 12. A slurry and/or chemical blend supply apparatus comprising a bend module and a distribution module, said bend module and said distribution module being in fluid communication, said blend module comprises at least one blend train comprising at least two component pipes, each component pipe for flowing a component stream therein and comprising at least one flow controller in each component pipe, said component pipes combine to form blended slurry or chemical blend in a single pipe in said blend module; said distribution module comprises at least two distribution tanks and at least two global loops wherein said blend module blends and supplies at least part of said blended slurry or said chemical blend to a first distribution tank of said at least two distribution tanks of said distribution module to supply said blended slurry or said chemical blend to a first global loop of said at least two global loops in fluid communication with the first distribution tank and said blend module blends and supplies at least part of a second chemical blend or a second blended slurry to a second distribution tank of said at least two distribution tanks to supply said second chemical blend or said second blended slurry to a second global loop in fluid communication with the second distribution tank; each of said global loops comprises a connection to an exit opening of each of said distribution tanks, at least one PUMP, connections to a plurality of tools, and global loop return pipe to each of said distribution tanks; wherein each of said global loops transports said first or second chemical blend or said first or second blended slurry from each of said distribution tanks to said plurality of tools that consumes at least a portion of said chemical blend or blended slurry and returns any unused said chemical blend or said blended slurry to each of said distribution tanks; and further wherein said first and second chemical blends may be the same or different, and said first and second blended slurries may be the same or different; further comprising an analytical module, said analytical module comprising at least one dilution means comprising at least one dilution fixture comprising a tube and a T-shaped pipe connector to introduce slurry or diluted slurry into ultra pure water (UPW) to create a diluted sample prior to analyzing the diluted sample in said analytical module, wherein the analytical module comprises one or more of the group consisting of one or more pH sensors, one or more hydrogen peroxide sensors, one or more density sensors, one or more conductivity sensors, one or more liquid particle counters and one or more particle size distribution analyzers. 13. The slurry and/or chemical blend supply apparatus of claim 12 wherein said at least one dilution means comprises single dilution means, said single dilution means further comprising at least one peristaltic pump, at least one flow sensor and at least one needle valve. 14. The slurry and/or chemical blend supply apparatus of claim 12 wherein said at least one dilution means further comprises more than one flow sensor, more than one needle valve and more than one pneumatically controlled valve to dilute the slurry sample prior to analyzing the diluted sample. 15. A slurry and/or chemical blend supply apparatus comprising a bend module and a distribution module, said bend module and said distribution module being in fluid communication, said blend module comprises at least one blend train comprising at least two component pipes, each component pipe for flowing a component stream therein and comprising at least one flow controller in each component pipe, said component pipes combine to form blended slurry or chemical blend in a single pipe in said blend module; said distribution module comprises at least two distribution tanks and at least two global loops wherein said blend module blends and supplies at least part of said blended slurry or said chemical blend to a first distribution tank of said at least two distribution tanks of said distribution module to supply said blended slurry or said chemical blend to a first global loop of said at least two global loops in fluid communication with the first distribution tank and said blend module blends and supplies at least part of a second chemical blend or a second blended slurry to a second distribution tank of said at least two distribution tanks to supply said second chemical blend or said second blended slurry to a second global loop in fluid communication with the second distribution tank; each of said global loops comprises a connection to an exit opening of each of said distribution tanks, at least one pump, connections to a plurality of tools, and global loop return pipe to each of said distribution tanks; wherein each of said global loops transports said first or second chemical blend or said first or second blended slurry from each of said distribution tanks to said plurality of tools that consumes at least a portion of said chemical blend or blended slurry and returns any unused said chemical blend or said blended slurry to each of said distribution tanks; and further wherein said first and second chemical blends may be the same or different, and said first and second blended slurries may be the same or different; further comprising an analytical module comprising one or more of the group consisting of one or more pH sensors, one or more hydrogen peroxide sensors, one or more density sensors, one or more conductivity sensors, one or more liquid particle counters and one or more particle size distribution analyzers, said analytical module in fluid communication with the blend module and the distribution module and analyzes samples from the blend module and the distribution module. 16. A slurry and/or chemical blend supply apparatus comprising a bend module and a distribution module, said bend module and said distribution module being in fluid communication, said blend module comprises at least one blend train comprising at least two component pipes, each component pipe for flowing a component stream therein and comprising at least one flow controller in each component pipe, said component pipes combine to form blended slurry or chemical blend in a single pipe in said blend module; said distribution module comprises at least two distribution tanks and at least two global loops wherein said blend module blends and supplies at least part of said blended slurry or said chemical blend to a first distribution tank of said at least two distribution tanks of said distribution module to supply said blended slurry or said chemical blend to a first global loop of said at least two global loops in fluid communication with the first distribution tank and said blend module blends and supplies at least part of a second chemical blend or a second blended slurry to a second distribution tank of said at least two distribution tanks to supply said second chemical blend or said second blended slurry to a second global loop in fluid communication with the second distribution tank; each of said global loops comprises a connection to an exit opening of each of said distribution tanks, at least one pump, connections to a plurality of tools, and global loop return pipe to each of said distribution tanks; wherein each of said global loops transports said first or second chemical blend or said first or second blended slurry from each of said distribution tanks to said plurality of tools that consumes at least a portion of said chemical blend or blended slurry and returns any unused said chemical blend or said blended slurry to each of said distribution tanks; and further wherein said first and second chemical blends may be the same or different, and said first and second blended slurries may be the same or different; further comprising a feed module comprising a pump for pumping raw slurry from a raw slurry supply container and transporting said raw slurry to said blend module, said blend module makes a blended slurry comprising said raw slurry as one of said component streams in one of said component pipes, said feed module further comprises at least one particle size distribution analyzer or at least one liquid particle counter, and a treatment means, wherein said raw slurry or said blended slurry is directed to the treatment means for the removal of large or small particles from said slurry when said large or small particles are detected by said at least one distribution analyzer or at least one liquid particle counter. 17. The apparatus of claim 16 wherein said feed module comprises said at least one liquid particle counter and/or said at least one particle size distribution analyzer and said said at least one liquid particle counter and/or said at least one particle size distribution analyzer further comprises more than one sample tube in fluid communication with more than one of said feed module, said blend module and said distribution module for analyzing a sample of the slurry from more than one of the feed module, the blend module and the distribution module. 18. The apparatus of claim 17 wherein said treatment means is selected from the group consisting of one or more filter elements or one or more membranes. 19. The slurry and/or chemical blend supply apparatus of claim 16 wherein said feed module comprises a feed tank, and a filter loop in fluid communication with said raw slurry supply container, said filter loop comprising a pump, one or more filters and a pipe loop for filtering the raw slurry in the raw slurry supply container before pumping it to the feed tank. 20. The slurry and/or chemical blend supply apparatus of claim 16 further comprising a strainer component upstream of said flow controller in said component pipe in said blend module for said raw slurry. 21. The slurry and/or chemical blend supply apparatus of claim 1 further comprising an analytical module and a sample tube in fluid communication between the single pipe in the blend module and the analytical module, wherein at least part of the blended slurry or chemical blend from the blend module is directed from the blend module to the analytical module by the sample tube and further wherein the analytical module comprises one or more of the group consisting of one or more pH sensors, one or more hydrogen peroxide sensors, one or more density sensors, one or more conductivity sensors, one or more liquid particle counters and one or more particle size distribution analyzers. 22. The slurry and/or chemical blend supply apparatus of claim 21 further comprising a second sample tube in fluid communication with the first global loop wherein at least part of the blended slurry or chemical blend from the distribution module is directed to the analytical module by the second sample tube.
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Ferri ; Jr. Edward T. (Gilroy CA) Geatz J. Tobin (Durham NC), Process and apparatus for electronic control of the transfer and delivery of high purity chemicals.
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