이 특허에 인용된 특허 (187)

1. Takemura Yasuhiko (Kanagawa JPX) Hamatani Toshiji (Kanagawa JPX) Konuma Toshimitsu (Kanagawa JPX) Koyama Jun (Kanagawa JPX) Kawasaki Yuji (Kanagawa JPX) Zhang Hongyong (Kanagawa JPX) Yamazaki Shunpei, Active matrix display and electrooptical device.

   상세보기
2. Yamazaki, Sunpei; Koyama, Jun; Takemura, Yasuhiko, Active matrix display device.

   상세보기
3. Ichikawa Takeshi,JPX ; Miyawaki Mamoru,JPX ; Kurematsu Katsumi,JPX ; Koyama Osamu,JPX, Active matrix display in which adjacent transistors share a common source region.

   상세보기
4. Stewart Roger G. (Neshanic Station NJ), Active matrix electroluminescent display and method of operation.

   상세보기
5. Mikoshiba Hiroaki (Tokyo JPX), Active matrix liquid crystal display cell with light blocking capacitor electrode above insulating layer.

   상세보기
6. Matsumoto Hiroshi (Hachioji JPX), Active matrix liquid crystal display having a peripheral driving circuit element.

   상세보기
7. Yudasaka Ichio (Suwa JPX) Matsuo Minoru (Suwa JPX) Takenaka Satoshi (Suwa JPX), Active matrix panel and manufacturing method including TFTs having variable impurity concentration levels.

   상세보기
8. Ohtani Hisashi,JPX ; Ogata Yasushi,JPX, Active matrix type display device and method of manufacturing the same.

   상세보기
9. Kobayashi Kazuhiro,JPX ; Masutani Yuichi,JPX ; Murai Hiroyuki,JPX, Active-matrix liquid crystal display and fabrication method thereof.

   상세보기
10. Zhang Hongyong,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Apparatus for laser ion doping.

    상세보기
11. Chien Sun-Chieh (Hsin-Chu TWX) Wu Tzong-Shien (Hsin-Chu TWX), Blanket N-LDD implantation for sub-micron MOS device manufacturing.

    상세보기
12. Ohtani, Hisashi, Camera having display device utilizing TFT.

    상세보기
13. Monsorno Richard (Jacksonville FL), Capacitor with buried isolated electrode.

    상세보기
14. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Yamamoto Takeshi,JPX ; Midorikawa Teruyuki,JPX, Color liquid crystal display apparatus.

    상세보기
15. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Yamamoto Takeshi,JPX ; Midorikawa Teruyuki,JPX, Color liquid crystal display apparatus.

    상세보기
16. Saito Tamio (Tokyo JPX) Nakai Toshio (Tokyo JPX), Contact color image sensor.

    상세보기
17. Hirakata Yoshiharu,JPX ; Yamazaki Shunpei,JPX, Contact structure.

    상세보기
18. Hirakata, Yoshiharu; Yamazaki, Shunpei, Contact structure.

    상세보기
19. Hirakata, Yoshiharu; Yamazaki, Shunpei, Contact structure.

    상세보기
20. Yoshiharu Hirakata JP; Shunpei Yamazaki JP, Contact structure.

    상세보기
21. Yamazaki Shunpei,JPX, Display device.

    상세보기
22. Yamazaki Shunpei,JPX, Display device.

    상세보기
23. Zhang Hongyong,JPX ; Yamazaki Shunpei,JPX ; Teramoto Satoshi,JPX ; Hirakata Yoshiharu,JPX, Display device or electronic device having liquid crystal display panel.

    상세보기
24. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Electro-optical device having silicon nitride interlayer insulating film.

    상세보기
25. Friend Richard H. (Cambridge NY GBX) Burroughes Jeremy H. (New York NY) Bradley Donal D. (Cambridge GBX), Electroluminescent devices.

    상세보기
26. Takano Tamae,JPX ; Ohtani Hisashi,JPX, Electronic apparatus having thin film transistors.

    상세보기
27. Miyazaki Minoru,JPX ; Murakami Akane,JPX ; Cui Baochun,JPX ; Yamamoto Mutsuo,JPX, Electronic circuit.

    상세보기
28. Miyazaki Minoru,JPX ; Murakami Akane,JPX ; Cui Baochun,JPX ; Yamamoto Mutsuo,JPX, Electronic circuit.

    상세보기
29. Miyazaki Minoru,JPX ; Murakami Akane,JPX ; Cui Baochun,JPX ; Yamamoto Mutsuo,JPX, Electronic circuit.

    상세보기
30. Yamazaki,Shunpei; Adachi,Hiroki, Ferroelectric liquid crystal and goggle type display devices.

    상세보기
31. Adan Alberto Oscar,JPX ; Kaneko Seiji,JPX, Field effect transistor and CMOS element having dopant exponentially graded in channel.

    상세보기
32. Takemura Yasuhiko (Kanagawa JPX), Gate insulated semiconductor device.

    상세보기
33. Ferrin Frank J. (Plymouth MN) Droessler Justin G. (Fridley MN), Head gear display system using off-axis image sources.

    상세보기
34. Murouchi Katsunori,JPX, LCD cell having two supporting gap members different in height.

    상세보기
35. Zhang Hongyong,JPX ; Takenouchi Akira,JPX ; Miyamoto Tadayoshi,JPX ; Yoshinouchi Atsushi,JPX, LCD device having coupling capacitances and shielding films.

    상세보기
36. Fukunaga Yoko,JPX ; Tsuji Yoshiko ; Ikeda Mitsushi,JPX ; Nikaido Masaru,JPX ; Kurauchi Shoichi,JPX, LCD having an organic-inorganic hybrid glass functional layer.

    상세보기
37. Kurauchi Shoichi,JPX ; Miyazaki Daisuke,JPX ; Hatoh Hitoshi,JPX ; Midorikawa Teruyuki,JPX, LCD having stacked color filter spacers in which some spacers are continuous with a color filter layer and others are not.

    상세보기
38. Yamazaki, Shunpei; Ohtani, Hisashi; Tanaka, Koichiro; Kasahara, Kenji; Kawasaki, Ritsuko, Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device.

    상세보기
39. Yamazaki, Shunpei; Ohtani, Hisashi; Tanaka, Koichiro; Kasahara, Kenji; Kawasaki, Ritsuko, Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device.

    상세보기
40. Yamazaki, Shunpei; Ohtani, Hisashi; Tanaka, Koichiro; Kasahara, Kenji; Kawasaki, Ritsuko, Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device.

    상세보기
41. Yamazaki,Shunpei; Ohtani,Hisashi; Tanaka,Koichiro; Kasahara,Kenji; Kawasaki,Ritsuko, Laser apparatus, laser annealing method, and manufacturing method of a semiconductor device.

    상세보기
42. Tanaka, Koichiro; Yamazaki, Shunpei; Kawasaki, Ritsuko, Laser irradiation apparatus laser irradiation method, semiconductor device and method of manufacturing a semiconductor device.

    상세보기
43. Tanaka,Koichiro; Yamazaki,Shunpei; Kawasaki,Ritsuko, Laser irradiation apparatus, laser irradiation method, semiconductor device, and method of manufacturing a semiconductor device.

    상세보기
44. Fujimaki Eriko,JPX ; Yamamoto Yuji,JPX, Latitudinal LCD with cylindrical and eliptical spacers at intersection of signal and gate lines.

    상세보기
45. Takasu Hiroaki,JPX ; Kojima Yoshikazu,JPX ; Takahashi Kunihiro,JPX, Light valve having a semiconductor film and a fabrication process thereof.

    상세보기
46. Sato Masahiko (Atsugi JPX) Konuma Toshimitsu (Atsugi JPX) Odaka Seiichi (Kisakata JPX) Yamaguchi Toshiharu (Zama JPX) Watanabe Toshio (Atsugi JPX) Aoyagi Osamu (Atsugi JPX) Tabata Kaoru (Atsugi JPX) , Liquid crystal device and method for manufacturing same with spacers formed by photolithography.

    상세보기
47. Fukui Takeshi (Atsugi JPX) Watanabe Toshio (Atsugi JPX), Liquid crystal device wherein the most optimum ratio of spacing between substrates in which the liquid crystal is dispos.

    상세보기
48. Ishiwata Kazuya (Yokosuka JPX) Enomoto Takashi (Zama JPX) Yoshioka Toshifumi (Hiratsuka JPX), Liquid crystal device with metal oxide masking films with breaks between films under metal lead electrodes.

    상세보기
49. Colgan Evan G. ; Lu Minhua ; Melcher Robert Lee ; Sanford James Lawrence ; Yang Kei-Hsiung, Liquid crystal display.

    상세보기
50. Nishi Takeshi,JPX ; Konuma Toshimitsu,JPX ; Tsuji Takahiro,JPX ; Yamamoto Yoshitaka,JPX ; Adachi Masahiro,JPX ; Ogishima Kiyoshi,JPX, Liquid crystal display and method of manufacturing the same.

    상세보기
51. Watanabe Yoshihiro (Yokohama JPX) Nakamura Hiroki (Chigasaki JPX) Sugawara Takako (Kawasaki JPX), Liquid crystal display apparatus having gap adjusting means under the sealing region.

    상세보기
52. Hirakata Yoshiharu,JPX ; Yamazaki Shunpei,JPX, Liquid crystal display contact structure having conducting spacers and plural conducting films.

    상세보기
53. Daisuke Miyazaki JP; Shoichi Kurauchi JP; Hitoshi Hatoh JP; Akiko Ueno JP; Teruyuki Midorikawa JP; Makoto Hasegawa JP, Liquid crystal display device.

    상세보기
54. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Midorikawa Teruyuki,JPX, Liquid crystal display device.

    상세보기
55. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Ueno Akiko,JPX ; Midorikawa Teruyuki,JPX ; Hasegawa Makoto,JPX, Liquid crystal display device.

    상세보기
56. Miyazaki, Daisuke; Kurauchi, Shoichi; Hatoh, Hitoshi; Ueno, Akiko; Midorikawa, Teruyuki; Hasegawa, Makoto, Liquid crystal display device.

    상세보기
57. Yamada Nobuaki (Higashiosaka JPX) Kondo Masahiko (Kitakatsuragi-gun JPX) Kohzaki Shuichi (Nara JPX) Ohue Makoto (Tenri JPX) Shimada Shinji (Kashihara JPX) Adachi Masahiro (Nara JPX), Liquid crystal display device and a method for producing the same.

    상세보기
58. Uda Mitsuru,JPX ; Shinohara Masami,JPX ; Nishida Mamoru,JPX, Liquid crystal display device and a method of fabricating same.

    상세보기
59. Kurauchi Shoichi,JPX ; Miyazaki Daisuke,JPX ; Hatoh Hitoshi,JPX ; Akiyoshi Muneharu,JPX ; Midorikawa Teruyuki,JPX, Liquid crystal display device comprising switching elements of reverse stagger type and common electrode formed over th.

    상세보기
60. Hirakata, Yoshiharu; Nishi, Takeshi; Yamazaki, Shunpei, Liquid crystal display device having a gap retaining member made of resin formed directly over the driver circuit.

    상세보기
61. Matsushima Yasuhiro,JPX, Liquid crystal display device having an insulation film made of organic material between an additional capacity and a bu.

    상세보기
62. Nakamura Hiroki,JPX, Liquid crystal display device having the driving circuit disposed in the seal area, with different spacer density in driving circuit area than display area.

    상세보기
63. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Midorikawa Teruyuki,JPX, Liquid crystal display device spacers formed from stacked color layers.

    상세보기
64. Hasegawa Rei (Yokohama JPX) Mori Miki (Yokohama JPX), Liquid crystal display device with acrylic polymer spacers and method of manufacturing the same.

    상세보기
65. Onishi Noriaki,JPX ; Yamada Nobuaki,JPX, Liquid crystal display device with at least 7.degree. C. liquid crystal to isotropic phase transition temperature differ.

    상세보기
66. Tamai Kazuhiko,JPX ; Koden Mitsuhiro,JPX, Liquid crystal display element with a portion of an alignment layer covers spacer is directly bonded to the alignment la.

    상세보기
67. Zhang Hongyong,JPX ; Teramoto Satoshi,JPX, Liquid crystal display panel.

    상세보기
68. Zhang, Hongyong; Teramoto, Satoshi, Liquid crystal display panel.

    상세보기
69. Kim Jeong-Hyun,KRX ; Kim Woong-Kwon,KRX ; Lyu Ki-Hyun,KRX ; Park Sung-Il,KRX ; Lim Kyoung-Nam,KRX ; Lee Hoo-Young,KRX, Liquid crystal display with planarizing organic gate insulator and organic planarization layer and method for manufacturing.

    상세보기
70. Smith ; Jr. Willis H. ; Erdmann John H. ; Reif Philip G., Liquid crystal light valves using internal, fixed spacers and method of incorporating same.

    상세보기
71. Baron Yair (Southfield MI) Vijan Meera (Troy MI), Liquid crystal matrix display having improved spacers and method of making same.

    상세보기
72. Konuma Toshimitsu (Kanagawa JPX) Nishi Takeshi (Kanagawa JPX) Shimizu Michio (Chiba JPX) Mori Harumi (Kanagawa JPX) Moriya Kouji (Kanagwa JPX) Murakami Satoshi (Kanagawa JPX), Liquid-crystal electro-optical apparatus and method of manufacturing the same.

    상세보기
73. Hwang Jeong-Mo (Plano TX), Local thinning of channel region for ultra-thin film SOI MOSFET with elevated source/drain.

    상세보기
74. Chang Kuang-Yeh ; Rao Ramachandr A., Low voltage CMOS process and device with individually adjustable LDD spacers.

    상세보기
75. Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, MIS semiconductor device and method for fabricating the same.

    상세보기
76. Abecassis Max (19020 NE. 20 Ave. Miami FL 33179), Method and system for automatically tracking a zoomed video image.

    상세보기
77. Koyama Jun,JPX ; Kawasaki Yuji,JPX, Method for driving active matrix display device.

    상세보기
78. Yamazaki, Shunpei; Arai, Yasuyuki, Method for fabricating a semiconductor device.

    상세보기
79. Huang Tiao-Yuan (Cupertino CA), Method for fabricating double implanted LDD transistor self-aligned with gate.

    상세보기
80. Zhang Hongyong (Kanagawa JPX) Ohnuma Hideto (Kanagawa JPX) Yamaguchi Naoaki (Kanagawa JPX) Takemura Yasuhiko (Kanagawa JPX), Method for fabricating thin film transistor using anodic oxidation.

    상세보기
81. Pollack Gordon P. (Richardson TX), Method for forming a mesa-isolated SOI transistor having a split-process polysilicon gate.

    상세보기
82. West John L. ; Bos Philip J., Method for forming uniformly-spaced plastic substrate liquid crystal displays.

    상세보기
83. Foschaar James A. ; Garvin Hugh L., Method for making topographic projections.

    상세보기
84. Ohtani Hisashi (Kanagawa JPX) Miyanaga Akiharu (Kanagawa JPX) Fukunaga Takeshi (Kanagawa JPX) Zhang Hongyong (Kanagawa JPX), Method for manufacturing a semiconductor device.

    상세보기
85. Ohtani Hisashi,JPX ; Miyanaga Akiharu,JPX ; Fukunaga Takeshi,JPX ; Zhang Hongyong,JPX, Method for manufacturing a semiconductor device.

    상세보기
86. Sato Masahiko (Atsugi JPX) Konuma Toshimitsu (Atsugi JPX) Odaka Seiichi (Kisakata JPX) Yamaguchi Toshiharu (Zama JPX) Watanabe Toshio (Atsugi JPX) Aoyagi Osamu (Atsugi JPX) Tabata Kaoru (Atsugi JPX) , Method for manufacturing liquid crystal device with spacers formed by photolithography.

    상세보기
87. Lee Joo-hyung (Seoul KRX), Method for manufacturing offset polysilicon thin-film transistor.

    상세보기
88. Zhang Hongyong (Kanagawa JPX) Uochi Hideki (Kanagawa JPX) Takayama Toru (Kanagawa JPX) Fukunaga Takeshi (Kanagawa JPX) Takemura Yasuhiko (Kanagawa JPX), Method for manufacturing semiconductor device.

    상세보기
89. Zhang Hongyong,JPX ; Takayama Toru,JPX, Method for producing a semiconductor device including doping with a catalyst that is a group IV element.

    상세보기
90. Yamazaki Shunpei,JPX ; Nakajima Setsuo,JPX ; Arai Yasuyuki,JPX, Method for producing display device.

    상세보기
91. Umeda Akira,JPX, Method for testing frequency response characteristics of laser displacement/vibration meters.

    상세보기
92. Umeda Akira,JPX, Method for testing frequency response characteristics of laser displacement/vibration meters.

    상세보기
93. Racanelli Marco (Phoenix AZ) Hwang Bor-Yuan C. (Tempe AZ) Foerstner Juergen (Mesa AZ) Huang Wen-Ling M. (Phoenix AZ), Method of adjusting a threshold voltage for a semiconductor device fabricated on a semiconductor on insulator substrate.

    상세보기
94. Beinglass Israel (Sunnyvale CA) Borland John (San Jose CA), Method of constructing lightly doped drain (LDD) integrated circuit structure.

    상세보기
95. Mase Akira (Aichi JPX) Hiroki Masaaki (Kanagawa JPX) Takemura Yasuhiko (Kanagawa JPX) Yamazaki Shunpei (Tokyo JPX), Method of driving an LCD employing an active matrix with short pulses for gray scale.

    상세보기
96. Kenji Kasahara JP, Method of fabricating a semiconductor device.

    상세보기
97. Kobayashi Kazuhiro,JPX ; Masutani Yuichi,JPX ; Murai Hiroyuki,JPX, Method of fabricating an active-matrix liquid crystal display.

    상세보기
98. Shimizu Masahiro (Hyogo JPX) Mitsui Katsuyoshi (Hyogo JPX) Yama Yomiyuki (Hyogo JPX) Yasunaga Masatoshi (Hyogo JPX), Method of fabricating semiconductor device having sidewall spacers and oblique implantation.

    상세보기
99. Kim Jin Young (Daegu KRX), Method of making a liquid crystal display.

    상세보기
100. Shibuya Tsukasa,JPX ; Yoshinouchi Atsushi,JPX ; Zhang Hongyong,JPX ; Takenouchi Akira,JPX, Method of making an active matrix type display.

     상세보기
101. Yamazaki,Shunpei; Ohtani,Hisashi; Ohnuma,Hideto, Method of manufacturing a semiconductor device.

     상세보기
102. Friend Richard H. (Cambridge NY GBX) Burroughes Jeremy H. (New York NY) Bradley Donal D. (Cambridge GBX), Method of manufacturing of electrolumineschent devices.

     상세보기
103. Morikawa Masahiko,JPX ; Shimada Shinji,JPX, Method of manufacturing spacing layer for liquid crystal display using light shielding layer as a mask.

     상세보기
104. Fukuda Kaichi,JPX ; Uemoto Tsutomu,JPX ; Hirayama Hideo,JPX ; Kawamura Shinichi,JPX ; Toriyama Shigetaka,JPX, Method of manufacturing thin film transistor.

     상세보기
105. Whetten Nathan R. (Ballston Lake NY), Multi-layer address lines for amorphous silicon liquid crystal display devices.

     상세보기
106. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Shibata Hiroshi,JPX ; Fukunaga Takeshi,JPX, Pixel TFT and driver TFT having different gate insulation width.

     상세보기
107. Katada Mitsutaka (Kariya JPX) Muramoto Hidetoshi (Nagoya JPX) Fuzino Seizi (Toyota JPX) Hattori Tadashi (Okazaki JPX) Abe Katsunori (Obu JPX), Process for fabricating a complementary MIS transistor.

     상세보기
108. Zhang Hongyong,JPX ; Uochi Hideki,JPX ; Takayama Toru,JPX ; Yamazaki Shunpei,JPX ; Takemura Yasuhiko,JPX, Process for fabricating a thin film transistor semiconductor device.

     상세보기
109. Lucas Kevin D. ; Pettinato Christopher D. ; Clark Wayne D. ; Filipiak Stanley M. ; Lii Yeong Jyh, Process for forming a combination hardmask and antireflective layer.

     상세보기
110. Zhang Hongyong (Kanagawa JPX) Yamazaki Shunpei (Tokyo JPX) Takemura Yasuhiko (Kanagawa JPX), Process for laser processing and apparatus for use in the same.

     상세보기
111. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Kitakado Hidehito,JPX, Process of fabricating a semiconductor device.

     상세보기
112. Fukunaga Takeshi,JPX, Reflection type display device and electronic device.

     상세보기
113. Takeshi Fukunaga JP, Reflection type display device having display part covered with insulating layer in which carbon-based material or pigment is dispersed.

     상세보기
114. Fukunaga,Takeshi, Reflection type display device using a light shading film with a light shading material evenly dispersed throughout.

     상세보기
115. Murakami,Satoshi; Hirakata,Yoshiharu; Fujimoto,Etsuko; Yamazaki,Yu; Yamazaki,Shunpei, Semiconductor device.

     상세보기
116. Shunpei Yamazaki JP, Semiconductor device.

     상세보기
117. Yamazaki Shunpei,JPX ; Koyama Jun,JPX ; Ohtani Hisashi,JPX, Semiconductor device.

     상세보기
118. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.

     상세보기
119. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.

     상세보기
120. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and fabrication method thereof.

     상세보기
121. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito; Ohnuma, Hideto, Semiconductor device and fabrication method thereof.

     상세보기
122. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.

     상세보기
123. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.

     상세보기
124. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.

     상세보기
125. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.

     상세보기
126. Yamazaki, Shunpei, Semiconductor device and manufacturing method thereof.

     상세보기
127. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and manufacturing method thereof.

     상세보기
128. Yamazaki, Shunpei; Arai, Yasuyuki; Koyama, Jun, Semiconductor device and manufacturing method thereof.

     상세보기
129. Yamazaki, Shunpei; Kuwabara, Hideaki, Semiconductor device and manufacturing method thereof.

     상세보기
130. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.

     상세보기
131. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.

     상세보기
132. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.

     상세보기
133. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.

     상세보기
134. Yamazaki, Shunpei; Suzawa, Hideomi; Ono, Koji; Arai, Yasuyuki, Semiconductor device and manufacturing method thereof.

     상세보기
135. Yamazaki,Shunpei, Semiconductor device and manufacturing method thereof.

     상세보기
136. Yamazaki,Shunpei; Arai,Yasuyuki; Koyama,Jun, Semiconductor device and manufacturing method thereof.

     상세보기
137. Yamazaki,Shunpei; Suzawa,Hideomi; Ono,Koji; Arai,Yasuyuki, Semiconductor device and manufacturing method thereof.

     상세보기
138. Yamazaki,Shunpei; Suzawa,Hideomi; Ono,Koji; Arai,Yasuyuki, Semiconductor device and manufacturing method thereof.

     상세보기
139. Park Chan Kwang,KRX, Semiconductor device and method for fabricating the same.

     상세보기
140. Zhang Hongyong,JPX ; Ohnuma Hideto,JPX ; Yamaguchi Naoaki,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for fabricating the same.

     상세보기
141. Zhang Hongyong,JPX ; Ohnuma Hideto,JPX ; Yamaguchi Naoaki,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for fabricating the same.

     상세보기
142. Yamazaki Shunpei (Tokyo JPX) Zhang Hongyong (Kanagawa JPX) Takemura Yasuhiko (Kanagawa JPX), Semiconductor device and method for forming the same.

     상세보기
143. Yamazaki Shunpei,JPX ; Zhang Hongyong,JPX ; Takemura Yasuhiko,JPX, Semiconductor device and method for forming the same.

     상세보기
144. Inumiya Seiji,JPX ; Hieda Katsuhiko,JPX ; Matsuda Tetsuo,JPX ; Ozawa Yoshio,JPX, Semiconductor device and method for manufacturing same.

     상세보기
145. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.

     상세보기
146. Hirakata, Yoshiharu; Goto, Yuugo; Kobayashi, Yuko; Yamazaki, Shunpei, Semiconductor device and method of fabricating the same.

     상세보기
147. Hirakata,Yoshiharu; Goto,Yuugo; Kobayashi,Yuko; Yamazaki,Shunpei, Semiconductor device and method of fabricating the same.

     상세보기
148. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device and method of fabricating the same.

     상세보기
149. Fujimoto, Etsuko; Murakami, Satoshi; Yamazaki, Shunpei; Eguchi, Shingo, Semiconductor device and method of manufacturing the same.

     상세보기
150. Yamazaki, Shunpei; Adachi, Hiroki, Semiconductor device and method of manufacturing the same.

     상세보기
151. Yamazaki, Shunpei; Adachi, Hiroki, Semiconductor device and method of manufacturing the same.

     상세보기
152. Yamazaki,Shunpei; Adachi,Hiroki, Semiconductor device and method of manufacturing the same.

     상세보기
153. Zhang Hongyong (Kanagawa JPX) Koyama Jun (Kanagawa JPX) Teramoto Satoshi (Kanagawa JPX), Semiconductor device and process for fabricating the same.

     상세보기
154. Takemura Yasuhiko (Kanagawa JPX), Semiconductor device having a crystallized silicon thin film in which the crystallization direction is oriented either v.

     상세보기
155. Yamazaki, Shunpei; Koyama, Jun, Semiconductor device having a gate wiring comprising laminated wirings.

     상세보기
156. Miyazaki Minoru (Kanagawa JPX) Murakami Akane (Kanagawa JPX) Cui Baochun (Kanagawa JPX) Yamamoto Mutsuo (Kanagawa JPX), Semiconductor device having a lead including aluminum.

     상세보기
157. Pfiester James R. (Austin TX), Semiconductor device having an MOS transistor with overlapped and elevated source and drain.

     상세보기
158. Yamazaki, Shunpei; Tanaka, Yukio; Koyama, Jun; Osame, Mitsuaki; Murakami, Satoshi; Ohnuma, Hideto; Fujimoto, Etsuko; Kitakado, Hidehito, Semiconductor device having at least a pixel unit and a driver circuit unit over a same substrate.

     상세보기
159. Ohtani,Hisashi, Semiconductor device having display device.

     상세보기
160. Ohtani Hisashi,JPX ; Yamazaki Shunpei,JPX ; Itoh Masataka,JPX, Semiconductor device having multilayered gate electrode and impurity regions overlapping therewith.

     상세보기
161. Shunpei Yamazaki JP; Yasuyuki Arai JP, Semiconductor device having single crystal grains with hydrogen and tapered gate insulation layer.

     상세보기
162. Suzawa Hideomi,JPX, Semiconductor device including active matrix circuit.

     상세보기
163. Suzawa Hideomi,JPX, Semiconductor device including active matrix circuit.

     상세보기
164. Suzawa Hideomi,JPX, Semiconductor device including active matrix circuit.

     상세보기
165. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito, Semiconductor display device and method of manufacturing therefor.

     상세보기
166. Ohtani Hisashi,JPX, Semiconductor integrated circuit and fabrication method thereof.

     상세보기
167. Ohtani, Hisashi, Semiconductor integrated circuit and fabrication method thereof.

     상세보기
168. Ohtani, Hisashi, Semiconductor integrated circuit and fabrication method thereof.

     상세보기
169. Inoue Shunsuke (Yokohama JPX) Koizumi Toru (Yokohama JPX) Miyawaki Mamoru (Tokyo JPX) Sugawa Shigetoshi (Atsugi JPX), Silicon-on-insulator CMOS device and a liquid crystal display with controlled base insulator thickness.

     상세보기
170. Vu Duy-Phach (Taunton MA) Dingle Brenda D. (Mansfield MA) Dingle Jason E. (Mansfield MA) Cheong Ngwe (Boston MA), Single crystal silicon tiles for liquid crystal display panels including light shielding layers.

     상세보기
171. Crawford Gregory P. ; Ho Jackson, Smart spacers for active matrix liquid crystal projection light valves.

     상세보기
172. Katayama Shigenori,JPX ; Yasukawa Masahiro,JPX, Substrate for electro-optical apparatus, electro-optical apparatus, method for driving electro-optical apparatus, electronic device and projection display device.

     상세보기
173. Inoue Yasuo (Hyogo JPX) Nishimura Tadashi (Hyogo JPX) Ashida Motoi (Hyogo JPX), Thin film field effect element having an LDD structure.

     상세보기
174. Takemura Yasuhiko (Kanagawa JPX) Zhang Hongyong (Kanagawa JPX) Konuma Toshimitsu (Kanagawa JPX), Thin film semiconductor device with gate metal oxide and sidewall spacer.

     상세보기
175. Konuma Toshimitsu (Kanagawa JPX) Hiroki Masaaki (Kanagawa JPX) Zhang Hongyong (Kanagawa JPX) Yamamoto Mutsuo (Kanagawa JPX) Takemura Yasuhiko (Kanagawa JPX), Thin film semiconductor integrated circuit and method of fabricating the same.

     상세보기
176. Wakai Haruo (Fussa JPX) Yamamura Nobuyuki (Hachioji JPX) Sato Syunichi (Kawagoe JPX) Kanbara Minoru (Hachioji JPX), Thin film transistor array.

     상세보기
177. Shunpei Yamazaki JP, Thin film transistor having lightly doped regions.

     상세보기
178. Yamamoto Hideaki (Tukorozawa JPX) Matsumaru Haruo (Tokyo JPX) Tanaka Yasuo (Koganei JPX) Tsutsui Ken (Tokyo JPX) Tsukada Toshihisa (Musashino JPX) Shirahashi Kazuo (Mobara JPX) Sasano Akira (Tokyo JP, Thin film transistor substrate, manufacturing method thereof, liquid crystal display panel and liquid crystal display eq.

     상세보기
179. Furuta Mamoru,JPX, Thin film transistor, manufacturing method therefor and liquid crystal display unit using the same.

     상세보기
180. Jung Byung-Hoo,KRX ; Jin Yong-Suk,KRX ; Lee Joo-Hyung,KRX ; Hwang Chang-Won,KRX, Thin film transistor-liquid crystal display and a manufacturing method thereof.

     상세보기
181. Kawasaki Ritsuko,JPX ; Kitakado Hidehito,JPX ; Kasahara Kenji,JPX ; Yamazaki Shunpei,JPX, Thin film transistors having ldd regions.

     상세보기
182. Yen Ting-Pwu (Fremont CA), Transistor fabrication methods using overlapping masks.

     상세보기
183. Takayama, Toru; Sato, Keiji; Yamazaki, Shunpei, Wiring material semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.

     상세보기
184. Takayama, Toru; Sato, Keiji; Yamazaki, Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.

     상세보기
185. Takayama, Toru; Sato, Keiji; Yamazaki, Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.

     상세보기
186. Takayama,Toru; Sato,Keiji; Yamazaki,Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.

     상세보기
187. Takayama,Toru; Sato,Keiji; Yamazaki,Shunpei, Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof.

     상세보기
더보기