In making an optical component, one or more portions of a substrate's surface are patterned. At least a region of the substrate's surface is coated in negative photoresist, the region encompassing said portions. The negative photoresist becomes undevelopable when exposed to light. Light which forms
In making an optical component, one or more portions of a substrate's surface are patterned. At least a region of the substrate's surface is coated in negative photoresist, the region encompassing said portions. The negative photoresist becomes undevelopable when exposed to light. Light which forms a grating structure is projected over each of the portions. Light of substantially uniform intensity over the entirety of the region but for the portions, thereby leaving the negative photoresist outside of the portions undevelopable. The negative photoresist is developed so as to embody the grating structure in the photoresist covering the portions. The substrate's surface is patterned to impose the grating structure on the substrate's surface from the developed photoresist; the undevelopable photoresist inhibits patterning of the surface region outside of the portions. The optical component comprises the patterned substrate.
대표청구항▼
1. A microfabrication process for making an optical component, the process comprising a patterning stage in which one or more first portions of a substrate's surface are patterned by at least: coating at least a region of the substrate's surface in negative photoresist, said region encompassing said
1. A microfabrication process for making an optical component, the process comprising a patterning stage in which one or more first portions of a substrate's surface are patterned by at least: coating at least a region of the substrate's surface in negative photoresist, said region encompassing said first portions, whereby the negative photoresist becomes undevelopable when exposed to light;projecting light which forms a first grating structure over each of said first portions;projecting light of substantially uniform intensity over the entirety of said region but for said first portions, thereby leaving the negative photoresist outside of said first portions undevelopable;developing the negative photoresist so as to embody the grating structure in the photoresist covering said first portions;patterning the substrate's surface to impose the grating structure on the substrate's surface from the developed photoresist, the undevelopable photoresist inhibiting patterning of the surface region outside of said first portions, wherein the optical component comprises the patterned substrate; andfollowing a first such patterning stage that forms the first grating structure with a second such patterning stage that patterns one or more second portions to form a second grating structure, the first grating structure and the second grating structure being separated by 50 to 100 micrometers along an entire common arcuate border between the first grating structure and the second grating structure. 2. A microfabrication process according to claim 1, wherein the second grating structure imposed on the substrate's surface at the second stage is offset from the first grating structure imposed on the substrate's surface at the first stage by a non-zero angle. 3. A microfabrication process according to claim 2, wherein the projecting steps of the first stage are performed with the substrate supported in a first orientation in an exposure system, and wherein the second stage comprises: prior to the projecting steps of the second stage, rotating the substrate relative to the exposure system to a second orientation before performing the projecting steps of the second stage, wherein the second orientation is offset from the first orientation by said non-zero angle. 4. A microfabrication process according to claim 3 wherein the substrate is removed from the exposure system following the projecting steps of the first stage and re-loaded in the exposure system prior to performing the projecting steps of the second stage, wherein the second stage comprises: after re-loading the substrate but before rotating the substrate to the second orientation, creating a fringe pattern by projecting light which forms a grating structure onto a portion of the substrate's surface already patterned at the first stage, wherein the fringe pattern is used when rotating the substrate to the second orientation to account for any unintended rotation of the substrate away from the first orientation caused by removing and re-loading the substrate. 5. A microfabrication process according to claim 2 wherein the first grating structure has a period different from the second grating structure. 6. A microfabrication process according to claim 2 wherein at the first stage a first shadow mask is used to restrict light which forms the first grating structure to a first area larger than and encompassing that first portion, wherein at the second stage a second shadow mask is used to restrict light which forms the second grating structure onto a second area larger than and encompassing that second portion, and wherein the first and second areas are large enough that those first and second portions are free from edge distortion created by the first and second mask respectively at least in the vicinity of the common border. 7. A microfabrication process according to claim 1, wherein, for at least one of said first portions, a shadow mask is used in the first projecting step to restrict the light which forms the first grating structure to an area larger than and encompassing that portion, the area sufficiently large for that portion to be entirely free from edge distortion created by the mask. 8. A microfabrication process according to claim 1, wherein the substrate initially comprises a master plate on which a metallic film is deposited, wherein the metallic film is patterned in the patterning step of claim 1 to impose the first and second grating structures on the metallic film from the photoresist. 9. A microfabrication process according to claim 8, comprising patterning the plate to impose the first and second grating structures on the plate from the metallic film, and subsequently removing the metallic film, wherein the optical component comprises the patterned plate with the metallic film removed. 10. A microfabrication process according to claim 1 wherein one of said first and second grating structures is substantially circular. 11. A microfabrication process according to claim 1 wherein one of said first and second grating structures has a height that increases in a direction along its width and away from the other of said first and second grating structures. 12. A microfabrication process according to claim 1 wherein the projecting the light of substantially uniform intensity removes a record of edge distortion including non-uniformity of the first grating structure outside said first portions. 13. A microfabrication process according to claim 1 wherein first grating structure and the second grating structure are separated along the entire common arcuate border by a constant width. 14. A microfabrication process according to claim 1 wherein the first grating structure and the second grating structure are separated along the entire common arcuate border by 50 micrometers when the patterned substrate thickness is 0.6 millimeters and by 100 micrometers when the patterned substrate thickness is 1 millimeter. 15. A manufacturing process comprising using an optical component to make at least one further optical component, the optical component made using a microfabrication process comprising a patterning stage in which one or more first portions of a substrate's surface are patterned by at least: coating at least a region of the substrate's surface in negative photoresist, said region encompassing said first portions, whereby the negative photoresist becomes undevelopable when exposed to light;projecting light which forms a first grating structure over each of said first portions;projecting light of substantially uniform intensity over the entirety of said region but for said first portions, thereby leaving the negative photoresist outside of said first portions undevelopable;developing the negative photoresist so as to embody the first grating structure in the photoresist covering said first portions;patterning the substrate's surface to impose the first grating structure on the substrate's surface from the developed photoresist, the undevelopable photoresist inhibiting patterning of the surface region outside of said first portions, wherein the optical component comprises the patterned substrate; andfollowing a first such patterning stage that forms the first grating structure with a second such patterning stage that patterns one or more second portions to form a second grating structure, the first grating structure and the second grating structure being separated by 50 to 100 micrometers along an entire common arcuate border between the first grating structure and the second grating structure. 16. A manufacturing process according to claim 15 wherein the further optical component is moulded from polymer using the optical component and/or the further optical component is for use in a display system. 17. A manufacturing process according to claim 15 comprising using the further optical component to make at least one yet further optical component. 18. A manufacturing process according to claim 17 wherein the yet further optical component is moulded from polymer using the further optical component. 19. A manufacturing process according to claim 15 wherein the first grating structure and the second grating structure are separated along the entire common arcuate border by a constant width. 20. A manufacturing process according to claim 15 wherein the first grating structure and the second grating structure are separated along the entire common arcuate border by 50 micrometers when the patterned substrate thickness is 0.6 millimeters and by 100 micrometers when the patterned substrate thickness is 1 millimeter.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (304)
Kamath,Vinod; Loebach,Beth Frayne; Makley,Albert Vincent, Acoustic and thermal energy management system.
Knowles Terence J. (7525 Taft Cir. Hanover Park IL 60103) Bremigan ; III Charles F. (Rte. 1 ; Box 189R Jarrell TX 76537), Acoustic wave touch panel with inlayed, etched arrays and method of making the panel.
Galarneau Lynn (Golden Valley MN) Rogers Daniel J. (White Bear Lake MN), Apparatus for use in high fidelty replication of diffractive optical elements.
Wong, Lyon King-Fook; Hoefnagels, Stephan; Ivanovic, Relja B.; De Vorchik, David G.; Cutsinger, Paul L., Carousel control for metadata navigation and assignment.
Rosenzweig,Elizabeth; Prabhu,Prasad V.; Beaudet,Douglas B., Comprehensive, multi-dimensional graphical user interface using picture metadata for navigating and retrieving pictures in a picture database.
Tissot, Serge; Demonchaux, Thierry; Oconte, Philippe; Vanneuville, Guy, Device for cooling an electronic card by conduction comprising heat pipes, and corresponding method of fabrication.
Chard, Jeffrey A.; Bao, Junwei; Wen, Youxian; Yedur, Sanjay, Evaluating a profile model to characterize a structure to be examined using optical metrology.
Shau, James; Meiyyappan, Krishnan; Tran, Hung; Krishnamurthy, Ravi; Surlaker, Kapil; Branscome, Jeremy; Chamdani, Joseph I., Fast batch loading and incremental loading of data into a database.
Koch Thomas L. (Holmdel NJ) Ostermayer ; Jr. Frederick W. (Berkeley Heights NJ) Tennant Donald M. (Freehold NJ) Verdiell Jean-Marc (Matawan NJ), Grating fabrication using electron beam lithography.
Ishihara,Katsuyoshi; Hamamoto,Tatsuo, Liquid crystal display device including an electrode constituting pixel electrode connected to another electrode through opening formed in color filter.
Brueck Steven R. J. (5601 Cometa Ct. NE. Albuquerque NM 87111) Zaidi Saleem H. (6020 Kathryn SE. ; Apt. #24 Albuquerque NM 87108), Method and apparatus for alignment and overlay of submicron lithographic features.
Belliveau, Richard S., Method and apparatus for controlling the temperature of a multiparameter light and/or a component thereof using orientation and/or parameter information.
Fang, Ye; Ferrie, Ann M.; Fontaine, Norman H.; Frutos, Anthony G.; Mozdy, Eric J.; Wang, Chuan-Che; Yuen, Po Ki, Method for eliminating crosstalk between waveguide grating-based biosensors located in a microplate and the resulting microplate.
Phillips William (Princeton NJ) Neil Clyde C. (Levittown PA) Hammer Jacob M. (Plainsboro NJ), Method for making planar optical waveguide comprising thin metal oxide film incorporating a relief phase grating.
Barksdale, Molly K.; Kessen, Bethany L.; Moore, Martin T.; Plurad, Jason C., Method for providing window snap control for a split screen computer program GUI.
Crawford,Gregory P.; Eakin,James N.; Radcliffe,Marc D., Method of alignment of liquid crystals comprising exposing an alignment material to an interference pattern.
Ootsu,Kenji; Murakami,Keiji; Tai,Tomishige, Method of processing end portions of optical fibers and optical fibers having their end portions processed.
Park, Chang-Soo; Kim, Tae-Young; Hanawa, Masanori, Methods and apparatuses for manufacturing fiber gratings, and optical fibers having fiber gratings formed thereby.
Wack, Daniel C.; Veldman, Andrei; Ratner, Edward R.; Hench, John; Bareket, Noah, Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction.
Payette, Vincent; Desmarais, Richard Roger; Price, James Marik; Weaver, Michael C.; Corbett, Richard J.; Bodell, Barton W.; Pernsteiner, William P., Network-based system and method for accessing and processing emails and other electronic legal documents that may include duplicate information.
Robbins, Steven J.; Stanley, James H.; Raynal, Francois; Brown, Robert D.; Tedesco, James M.; Hendrick, Wyatt L.; Popovich, Milan M.; Waldern, Jonathan D.; Grant, Alastair J., Optical displays.
Adams Laura Ellen ; Eggleton Benjamin John ; Espindola Rolando Patricio ; Jin Sungho ; Mavoori Hareesh ; Rogers John A. ; Strasser Thomas Andrew, Optical grating device with variable coating.
Wu, Wei; Robinett, Warren; Wang, Shih Yuan; Gao, Jun; Yu, Zhaoning, Optical gratings, lithography tools including such optical gratings and methods for using same for alignment.
Lading Lars,DKX ; Hanson Steen Gruner,DKX ; Lindvold Lars,DKX, Optical measurement method and apparatus which determine a condition based on quasi-elastic-interaction.
Nordin,Gregory; Cardenas Gonzalez,Jaime; George,Michael A., Optical waveguide microcantilever with differential output and associated methods of cantilever sensing.
LaChapelle, Kevin Leigh; Walker, Brian James; Mercer, Ian Cameron; Kase, Hiroshi; Miyamoto, Harutoshi; Yagi, Tomotaka; Torii, Yasuyuki; Takeguchi, Nobuyasu, Playlist structure for large playlists.
Weinberger, Benjamin; Plakal, Manoj; Robinson, Will, Querying multidimensional data with independent fact and dimension pipelines combined at query time.
Tomoshi Takigawa JP; Tsutomu Osaka JP, Stereoscopic image display apparatus for detecting viewpoint and forming stereoscopic image while following up viewpoint position.
Tuceryan, Mihran; Navab, Nassir; Genc, Yakup, System and method for calibrating a stereo optical see-through head-mounted display system for augmented reality.
Bush, Alan; Pelyushenko, Valeriy V.; Ahmed, Zahid N.; Galpin, Michael; Stiel, Herbert Wayne; Suravarapu, Shashi P.; Hoexter, Robert Saran; Brunaugh, Joshua, System and method for defining application definition functionality for general purpose web presences.
McCleary, Jacob D.; Smith, Brian; Dodd, Curtis W., Systems and methods for sensing and indicating orientation of electrical equipment with active cooling.
Katoh,Takayuki; Miyashita,Atsushi; Yamazaki,Mitsuhiro; Uchida,Hiroyuki; Shimotono,Susumu; Tadokoro,Mizuho, Thermal management of a personal computing apparatus.
Metsätähti, Vesa; Huhtela-Bremer, Laura; Hakari, Tomi; Finke-Anlauff, Andrea; Macke, Annika; Bäckgren, Tommi; Schybergson, Olof, Time bar navigation in a media diary application.
Bisset Stephen (Palo Alto CA) Miller Robert J. (Fremont CA) Allen Timothy P. (Los Gatos CA) Steinbach Gunter (Palo Alto CA 4), Touch pad driven handheld computing device.
Thorpe, Jonathan Richard; Kydd, Andrew David; McGrath, Mark John; Miller, Alexander John James; Roberts, Timothy Stuart; Williams, Michael John; Govan, Barney, Video metadata data structure.
Vranjes, Miron; Jones, Oliver R.; Sundelin, Nils Anders; Sareen, Chaitanya Dev; Frederickson, Steven J., Adaptive sizing and positioning of application windows.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.