초록 ▼

A method to apply nano-crystalline diamond onto a selected substrate, including preparing Nanodiamond slurry of Nanodiamond particles dispersed in a medium. The medium may include a liquid or a sol-gel. The selected substrate is immersed in the Nanodiamond slurry for a predetermined period of time.

A method to apply nano-crystalline diamond onto a selected substrate, including preparing Nanodiamond slurry of Nanodiamond particles dispersed in a medium. The medium may include a liquid or a sol-gel. The selected substrate is immersed in the Nanodiamond slurry for a predetermined period of time. Then the substrate is removed from the slurry. The substrate is then dried with a flow of inert gas. The substrate is left coated with a coating of the nanodiamond particles that are highly adherently held by van der Waals forces.

대표청구항 ▼

1. A method to apply nano-crystalline diamond onto a selected substrate, comprising preparing a nanodiamond slurry of nanodiamond particles dispersed in a medium;immersing the selected substrate in the nanodiamond slurry for a predetermined period of time;removing the substrate from the slurry; andd

1. A method to apply nano-crystalline diamond onto a selected substrate, comprising preparing a nanodiamond slurry of nanodiamond particles dispersed in a medium;immersing the selected substrate in the nanodiamond slurry for a predetermined period of time;removing the substrate from the slurry; anddrying the substrate and nanodiamond slurry that is adherent to the substrate with a flow of inert gas whereby the substrate is left coated with a coating of the nanodiamond particles that are adherently held by van der Waals forces; andselecting the medium in which the nanodiamond particles are dispersed to be a chemically functionalized carrier medium that includes a volatile component and an inorganic oxide, the volatile component being selected to evaporate at ambient room temperature or at elevated temperature and atmospheric pressure to leave behind the inorganic oxide. 2. The method as claimed in claim 1, further comprising performing sonication of the selected substrate during or after immersion in the slurry. 3. The method as claimed in claim 2, further comprising predetermining a duration of the sonication via experimentation for the selected substrate. 4. The method as claimed in claim 1, further comprising rinsing the substrate with solvent prior to drying the substrate with a flow on inert gas. 5. The method as claimed in claim 1, further comprising: placing the selected substrate under vacuum in an ion assisted plasma deposition system; anddepositing an optically transparent film of diamond like carbon over the coating of the nanodiamond particles. 6. The method as claimed in claim 1, further comprising: placing the selected substrate under vacuum in an ion assisted plasma deposition system; anddepositing an oxide or nitride layer over the coating of the nanodiamond particles. 7. The method as claimed in claim 1, further comprising selecting the medium to be a liquid. 8. The method as claimed in claim 1, further comprising selecting the medium to be a sol-gel medium. 9. The method as claimed in claim 8, further comprising selecting the sol-gel medium to include an organic component that is volatile at below 200 C to facilitate curing by volatilization. 10. The method as claimed in claim 1, further comprising: selecting the selected substrate to have fractures that are open to a substrate surface; andprecleaning the substrate with one or more cleaning agents. 11. The method as claimed in claim 10, further comprising selecting the one or more cleaning agents from a group consisting of alcohols, acetone, sulfuric acid, hydrogen peroxide, water and a combination of the foregoing. 12. The method as claimed in claim 10, further comprising: cleaning the substrate with caustics or acids; andrinsing the substrate between cleaning the substrate with the strong caustics or acids. 13. The method as claimed in claim 10, further comprising laser drilling, to facilitate access to the fractures. 14. The method as claimed in claim 1, further comprising placing the selected substrate immersed in the slurry into a pressure chamber that can be maintained at above fifty atmospheres pressure and pressurizing the pressure chamber to above fifty atmospheres pressure. 15. The method as claimed in claim 14, further comprising: removing the selected substrate from the slurry and the pressure chamber;immersing the selected substrate in a solvent;sonicating the selected substrate in the solvent;removing the selected substrate from the solvent; anddrying the selected substrate in the flow of the inert gas following removal of the selected substrate from the solvent. 16. The method as claimed in claim 1, further comprising: applying a layer of chemical vapor deposition diamond over the coating of the nanodiamond particles using the coating of nanodiamond particles as a seed layer. 17. The method as claimed in claim 16, further comprising: placing the substrate with coating of the nanodiamond particles in a chamber of a chemical vapor deposition system: evacuating the chamber to below 20 mTorr; andflowing reaction gases into the chamber including methane diluted with hydrogen. 18. The method as claimed in claim 17, further comprising: using cooling systems to maintain a temperature of the gemstone below 750 C. 19. The method as claimed in claim 17, further comprising: applying the layer of chemical vapor deposition diamond to a thickness of 10 to 12 microns to achieve a black colored coating. 20. The method as claimed in claim 1, further comprising: depositing a sub-20 nm layer of titanium, titanium oxide, graphite or silicon carbide over the substrate. 21. A method to apply nano-crystalline diamond onto a selected substrate, comprising preparing a nanodiamond slurry of nanodiamond particles dispersed in a medium;immersing the selected substrate in the nanodiamond slurry for a predetermined period of time;removing the substrate from the slurry; anddrying the substrate and nanodiamond slurry that is adherent to the substrate with a flow of inert gas whereby the substrate is left coated with a coating of the nanodiamond particles that are adherently held by van der Waals forces;applying a layer of chemical vapor deposition diamond over the coating of the nanodiamond particles using the coating of nanodiamond particles as a seed layer;placing the substrate with coating of the nanodiamond particles in a chamber of a chemical vapor deposition system:evacuating the chamber to below 20 mTorr; flowing reaction gases into the chamber including methane diluted with hydrogen; selecting the substrate to be a gemstone having a table side and a pavilion side;loading the gemstone onto a flat holder table side down such that the pavilion side of the gemstone is exposed;applying the layer of chemical vapor deposition diamond to a thickness of less than 100 nanometers to the exposed pavilion side;removing the gemstone from the flat holder;reloading the gemstone onto another fixture table side up such that the table side of the gemstone is exposed; andapplying the layer of chemical vapor deposition diamond to a thickness of less than 100 nanometers to the exposed table side. 22. The method as claimed in claim 21, further comprising selecting the medium to be a chemically functionalized carrier medium. 23. The method as claimed in claim 22, further comprising selecting the chemically functionalized carrier medium to include a volatile component and an inorganic oxide, the volatile component being selected to evaporate at ambient room temperature or at elevated temperature and atmospheric pressure to leave behind the inorganic oxide.