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Gas purge apparatus, load port apparatus, installation stand for purging container, and gas purge method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65B-031/00
  • B08B-005/00
  • H01L-021/67
  • H01L-021/673
  • H01L-021/677
  • B08B-009/00
출원번호 US-0087699 (2016-03-31)
등록번호 US-9895723 (2018-02-20)
우선권정보 JP-2015-071659 (2015-03-31)
발명자 / 주소
  • Iwamoto, Tadamasa
출원인 / 주소
  • TDK CORPORATION
대리인 / 주소
    Arent Fox LLP
인용정보 피인용 횟수 : 1  인용 특허 : 36

초록

In a gas purge apparatus, a load port apparatus, an installation stand for a purging container, and a gas purge method, the inside of the purging container is filled with a cleaning gas until just before transportation, and a placement failure does not happen to the next purging container to be plac

대표청구항

1. A gas purge apparatus capable of blowing a cleaning gas into a purging container with a purge port therethrough, comprising: a purge nozzle with a nozzle opening blowing out the cleaning gas;a table on which the purging container is detachably placed;a fixing mechanism capable of fixing the purgi

이 특허에 인용된 특허 (36)

  1. Natsume, Mitsuo, Attaching apparatus for load port apparatus.
  2. Miyajima Toshihiko,JPX, Clean box, clean transfer method and apparatus therefor.
  3. Fishkin Boris ; Sato Seiji ; Lowrance Robert B., Controlled environment enclosure and mechanical interface.
  4. Southworth Peter R. (Mission Viejo CA) Baxter Gregory R. (Orange CA), Conveyor system.
  5. Oyama, Katsuhiko; Takeuchi, Yasushi, Cover opening/closing apparatus, thermal processing apparatus using the same, and cover opening/closing method.
  6. Hecht Lewis C. (Vestal NY) Sulger ; deceased Merritt P. (late of Brackney PA by Ellen Sulger ; executrix) Thiele Ernst E. (Endicott NY) Pierson Mark V. (Binghamton NY) Williams Lawrence E. (Binghamto, Dockable interface airlock between process enclosure and interprocess transfer container.
  7. Schultz, Klaus; Schulz, Alfred; Mages, Marlies, Docking station for substrate transport containers.
  8. Iwamoto, Tadamasa, EFEM system and lid opening/closing method.
  9. Holliday James E. (75 “E.”Watchhill Dr. Colorado Springs CO 80906) Gallagher Gary M. (440F Autumn Ridge Cir. Colorado Springs CO 80906), Enclosed sealable purgible semiconductor wafer holder.
  10. Fosnight William J. ; Bonora Anthony C. ; Martin Raymond S. ; Tatro Jay, Evacuation-driven SMIF pod purge system.
  11. Frederick T. Rosenquist, FIMS interface without alignment pins.
  12. Chen, Kuan-Chou; Hu, Ping-Yu; Chen, Kuei-Jung; Wu, Tzong-Ming; Lin, Wu-Lang; Lee, Wen-Yo, Front-opening unified pod auto-loading structure.
  13. DeAngelis, Robert L.; Gallagher, Gary M., Gas purge system for isolation enclosure for contamination sensitive items.
  14. Sugawara, Yudo, Lid opening and closing device.
  15. Tokunaga, Kenji, Load port, wafer processing apparatus, and method of replacing atmosphere.
  16. Mages, Andreas; Scheler, Werner; Blaschitz, Herbert; Schulz, Alfred; Schneider, Heinz, Loading and unloading station for semiconductor processing installations.
  17. Swan, Alan J; Hafner, Thomas J.; Howells, John, Method and apparatus for detecting defects along the edge of electronic media.
  18. Cheng David, Method and apparatus for loading and unloading wafers from a wafer carrier.
  19. Brooks Ray G. (Irving TX) Brooks Timothy W. (Irving TX) Corris C. James (Elkmont AL), Method and apparatus for maintaining clean articles.
  20. Huang Hsin-Chieh,TWX ; Wann Yeh-Jye,TWX ; Kuo Hsi-Shan,TWX, Method and apparatus for storing wafers without moisture absorption.
  21. Bonora Anthony C. ; Neads Michael A. ; Oen Joshua T., Method and apparatus for vertical transfer of a semiconductor wafer cassette.
  22. Kaise, Seiichi; Amemiya, Shigeki; Onodera, Shinobu; Fujita, Hiroki; Nishino, Masaru; Rikukawa, Atsushi, Method for purging a substrate container.
  23. Paul Bacchi ; Paul S. Filipski, Pod load interface equipment adapted for implementation in a fims system.
  24. Fosnight William J. ; Shenk Joshua W., Pod to port door retention and evacuation system.
  25. Gilchrist, Ulysses; Fosnight, William; Hofmeister, Christopher; Friedman, Gerald M.; Bufano, Michael L., Reduced capacity carrier and method of use.
  26. Hirano, Makoto; Hayashi, Akinari; Tsuri, Makoto; Miyata, Haruyuki, Semiconductor manufacturing apparatus and semiconductor device manufacturing method.
  27. Martin, Raymond S., Smart load port with integrated carrier monitoring and fab-wide carrier management system.
  28. Bernard,Roland; Kambara,Hisanori; Favre,Amaud, Station for controlling and purging a mini-environment.
  29. Sumi,Atsushi; Toda,Junya; Nakayama,Takayuki, Substrate storage container.
  30. Ra, Byung-Koog; Yun, Tae-Sik; Lee, Kunhyung; Kim, Hyunjoon; Kim, Hyeogki; Kim, KiDoo, Substrate transfer container, gas purge monitoring tool, and semiconductor manufacturing equipment with the same.
  31. Obayashi, Tadahiro, Thin plate supporting container clamping device.
  32. Bonora Anthony C. ; Cortez Edward J. ; Kyffin John D. ; Ng Michael, Tilt and go load port interface alignment system.
  33. Bonora Anthony C. ; Wartenbergh Robert P. ; Gomes Christopher, Two stage valve for charging and/or vacuum relief of pods.
  34. Foster Leonard W. (Richardson TX) Millis Edwin G. (Dallas TX), Vented vacuum semiconductor wafer cassette.
  35. Takanabe Eiichiro (Sagamihara JPX) Suzuki Takeo (Iruma JPX) Noguchi Tadataka (Kitakyushu JPX), Vertical heat-treating apparatus and heat-treating process by using the vertical heat-treating apparatus.
  36. Komatsu,Shoji, Wafer mapping device and load port provided with same.

이 특허를 인용한 특허 (1)

  1. Murata, Masanao; Yamaji, Takashi; Onishi, Shinji, Purge device, purge system, purge method, and control method in purge system.
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