Methods of bonding superabrasive particles in an organic matrix
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B24B-053/017
B24B-053/12
B24B-007/22
B24D-018/00
출원번호
US-0793871
(2013-03-11)
등록번호
US-9902040
(2018-02-27)
발명자
/ 주소
Sung, Chien-Min
출원인 / 주소
Sung, Chien-Min
대리인 / 주소
Thorpe North & Western, LLP
인용정보
피인용 횟수 :
0인용 특허 :
73
초록▼
Superabrasive tools and their methods of manufacture are disclosed. In one aspect, a method of improving retention of superabrasive particles held in a solidified organic material layer of an abrading tool, a portion of each of said superabrasive particles protruding out of the solidified organic ma
Superabrasive tools and their methods of manufacture are disclosed. In one aspect, a method of improving retention of superabrasive particles held in a solidified organic material layer of an abrading tool, a portion of each of said superabrasive particles protruding out of the solidified organic material layer is provided. The method may include securing a plurality of superabrasive particles in the solidified organic material layer in an arrangement that minimizes mechanical stress impinging on the protruding portion of any individual superabrasive particle when used to abrade a work piece. As an example, the arrangement of the plurality of superabrasive particles may be configured to uniformly distribute frictional forces across substantially each superabrasive particle.
대표청구항▼
1. A CMP pad dresser comprising: a support substrate;a solidified organic material layer attached to the substrate; anda plurality of superabrasive particles ranging from about 30 microns to about 500 microns in size attached to the support substrate with the organic material layer;said particles ea
1. A CMP pad dresser comprising: a support substrate;a solidified organic material layer attached to the substrate; anda plurality of superabrasive particles ranging from about 30 microns to about 500 microns in size attached to the support substrate with the organic material layer;said particles each having a working end with a tip that aligns along a designated profile and varies from the profile by about 1 micron to about 150 microns,said plurality of superabrasive particles being arranged in a configuration to uniformly distribute drag forces substantially across each superabrasive particle. 2. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by about 5 microns to about 100 microns. 3. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by about 10 microns to about 75 microns. 4. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by about 10 microns to about 50 microns. 5. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by about 50 microns to about 150 microns. 6. The CMP pad dresser of claim 1, wherein the tips the superabrasive particles vary from the profile by about 20 microns to about 100 microns. 7. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by about 20 microns to about 50 microns. 8. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by about 20 microns to about 40 microns. 9. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by less than about 20 microns. 10. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by less than about 10 microns. 11. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by less than about 5 microns. 12. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by less than about 1 micron. 13. The CMP pad dresser of claim 1, wherein the tips of the superabrasive particles vary from the profile by less than about 10% of an average size of the superabrasive particles. 14. The CMP pad dresser of claim 1, wherein the profile is a plane. 15. The CMP pad dresser of claim 1, wherein the profile is sloped. 16. The CMP pad dresser of claim 1, wherein the profile is curved. 17. The CMP pad dresser of claim 1, wherein the profile is dome shaped. 18. The CMP pad dresser of claim 1, wherein the solidified organic material is a member selected from the group consisting of: amino resins, acrylate resins, alkyd resins, polyester resins, polyamide resins, polyimide resins, polyurethane resins, phenolic resins, phenolic/latex resins, epoxy resins, isocyanate resins, isocyanurate resins, polysiloxane resins, reactive vinyl resins, polyethylene resins, polypropylene resins, polystyrene resins, phenoxy resins, perylene resins, polysulfone resins, acrylonitrile-butadiene-styrene resins, acrylic resins, polycarbonate resins, polyimide resins, and mixtures thereof. 19. The CMP pad dresser of claim 18, wherein the solidified organic material is a continuous layer. 20. The CMP pad dresser of claim 19, wherein the superabrasive particles protrude for less than about 30 microns above the solidified organic material layer.
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