Inorganic filler, resin composition comprising the same and heat radiation substrate using the same
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C08K-009/06
C08K-003/38
B05D-003/02
H05K-001/03
H01L-033/64
출원번호
US-0587185
(2017-05-04)
등록번호
US-9902841
(2018-02-27)
우선권정보
KR-10-2015-0014570 (2015-01-29)
발명자
/ 주소
Ju, Sang A
Im, Hyun Gu
Park, Jae Man
출원인 / 주소
LG INNOTEK CO., LTD.
대리인 / 주소
Birch, Stewart, Kolasch & Birch, LLP
인용정보
피인용 횟수 :
0인용 특허 :
15
초록▼
An inorganic filler according to an embodiment of the present invention includes a boron nitride agglomerate and a coating layer formed on the boron nitride agglomerate and including a —Si—R—NH2 group, and R is selected from the group consisting of an alkyl group having 1 to 3 carbon atoms, an alken
An inorganic filler according to an embodiment of the present invention includes a boron nitride agglomerate and a coating layer formed on the boron nitride agglomerate and including a —Si—R—NH2 group, and R is selected from the group consisting of an alkyl group having 1 to 3 carbon atoms, an alkene group having 2 to 3 carbon atoms, and an alkyne group having 2 to 3 carbon atoms.
대표청구항▼
1. A method of preparing an inorganic filler, the method comprising: mixing a boron nitride agglomerate that is formed by agglomerating plate-shaped boron nitrides with a polysilazane, an amino silane and a solvent;forming a coating layer on the boron nitride agglomerate; andcuring and sintering,whe
1. A method of preparing an inorganic filler, the method comprising: mixing a boron nitride agglomerate that is formed by agglomerating plate-shaped boron nitrides with a polysilazane, an amino silane and a solvent;forming a coating layer on the boron nitride agglomerate; andcuring and sintering,wherein the coating layer comprises the following functional group: wherein R is selected from the group consisting of an alkylene group having 1 to 3 carbon atoms, an alkenylene group having 2 to 3 carbon atoms, and an alkynylene group having 2 to 3 carbon atoms. 2. The method of claim 1, wherein the polysilazane has the following formula 1: [formula 1] wherein R is selected from the group consisting of an alkyl group having 1 to 3 carbon atoms, an alkene group having 2 to 3 carbon atoms, and an alkyne group having 2 to 3 carbon atoms, and n is a positive integer. 3. The method of claim 1, wherein a condensation reaction occurs between the aminosilane and the hydrolyzed polysilazan in the process of forming of the coating layer. 4. The method of claim 3, wherein a polymer that is formed by the condensation reaction permeates at least a portion of pores in the boron nitride agglomerate. 5. The method of claim 4, wherein the polymer that is formed by the condensation reaction has the following functional group: 6. The method of claim 5, wherein the polymer has the following formula: wherein R is selected from the group consisting of an alkylene group having 1 to 3 carbon atoms, an alkenylene group having 2 to 3 carbon atoms, and an alkynylene group having 2 to 3 carbon atoms, andwherein at least one of R1, R2, R3 and R4 is selected from the group consisting of an alkyl group having 1 to 3 carbon atoms, an alkene group having 2 to 3 carbon atoms, and an alkyne group having 2 to 3 carbon atoms. 7. The method of claim 4, wherein the polymer that is formed by the condensation reaction has a liquid phase in the process of forming the coating layer. 8. The method of claim 1, wherein the curing and sintering comprises: heating at a first temperature; andprocessing pyrolysis at a second temperature higher than the first temperature. 9. The method of claim 8, wherein at least one of CH4, C2H4, C2H6 and NH3 is emitted as a result of the pyrolysis process. 10. The method of claim 8, wherein the pyrolysis process is performed in a nitrogen atmosphere. 11. The method of claim 1, wherein at least a portion of the solvent is volatilized in the process of forming the coating layer. 12. The method of claim 1, wherein a thickness of the coating layer is 1 μm to 21 μm. 13. The method of claim 1, wherein the coating layer has the following formula: wherein R is selected from the group consisting of an alkylene group having 1 to 3 carbon atoms, an alkenylene group having 2 to 3 carbon atoms, and an alkynylene group having 2 to 3 carbon atoms, andwherein at least one of R1, R2, R3 and R4 is selected from the group consisting of an alkyl group having 1 to 3 carbon atoms, an alkene group having 2 to 3 carbon atoms, and an alkyne group having 2 to 3 carbon atoms.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (15)
Cumberland, Robert W.; Roper, Christopher S.; Gross, Adam; Moss, Randall J.; Carter, William Bernard, Boron nitride nano-platelete based materials.
Hill Richard Frank (Chagrin Falls OH) DaVanzo Stephen Phillip (Chagrin Falls OH), Enhanced boron nitride composition and polymer based high thermal conductivity molding compound.
Lin, Pui-Yan; Rajendran, Govindasamy Paramasivam; Zahr, George Elias, Film prepared from a casting composition comprising a polymer and surface modified hexagonal boron nitride particles.
Merrill, Gary Brian; Lane, Jay Edgar, Method for making a high temperature erosion resistant coating and material containing compacted hollow geometric shapes.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.