$\require{mediawiki-texvc}$
  • 검색어에 아래의 연산자를 사용하시면 더 정확한 검색결과를 얻을 수 있습니다.
  • 검색연산자
검색도움말
검색연산자 기능 검색시 예
() 우선순위가 가장 높은 연산자 예1) (나노 (기계 | machine))
공백 두 개의 검색어(식)을 모두 포함하고 있는 문서 검색 예1) (나노 기계)
예2) 나노 장영실
| 두 개의 검색어(식) 중 하나 이상 포함하고 있는 문서 검색 예1) (줄기세포 | 면역)
예2) 줄기세포 | 장영실
! NOT 이후에 있는 검색어가 포함된 문서는 제외 예1) (황금 !백금)
예2) !image
* 검색어의 *란에 0개 이상의 임의의 문자가 포함된 문서 검색 예) semi*
"" 따옴표 내의 구문과 완전히 일치하는 문서만 검색 예) "Transform and Quantization"

통합검색

도움말도움말
상세검색 다국어 입력

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

특허 상세정보

MyON담기
내보내기 페이스북 공유 카카오톡 공유

Methods and apparatus for material processing using atmospheric thermal plasma reactor

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) C03B-019/10    H01J-037/32    H05H-001/30    H05H-001/42   
출원번호 US-0235715 (2016-08-12)
등록번호 US-9908804 (2018-03-06)
발명자 / 주소
  • Boughton, Daniel Robert
출원인 / 주소
  • Corning Incorporated
인용정보 피인용 횟수 : 0  인용 특허 : 72
초록
▼

Methods and apparatus provide for: producing a plasma plume within a plasma containment vessel from a source of plasma gas; feeding an elongate feedstock material having a longitudinal axis into the plasma containment vessel such that at least a distal end of the feedstock material is heated within the plasma plume; and spinning the feedstock material about the longitudinal axis as the distal end of the feedstock material advances into the plasma plume, where the feedstock material is a mixture of compounds that have been mixed, formed into the elongate ...

대표
청구항
▼

1. A method, comprising: producing a plasma plume within a plasma containment vessel from a source of plasma gas;substantially continuously mixing, pressing, and at least partially sintering precursor compounds into an elongate feedstock material and feeding the elongate feedstock material having a longitudinal axis into the plasma containment vessel such that at least a distal end of the feedstock material is heated within the plasma plume; andspinning the feedstock material about the longitudinal axis as the distal end of the feedstock material advance...

이 특허에 인용된 특허 (72)

  1. Gadkaree, Kishor Purushottam; Mach, Joseph Frank, Activated carbon materials for high energy density ultracapacitors.
  2. Wennerberg ; Arnold N. ; O'Grady ; Thomas M., Active carbon process and composition.
  3. Neil H. Brooks ; Torkil H. Jensen ; Charles P. Moeller, Apparatus and method for forming a high pressure plasma discharge column.
  4. Oh Seung-Hun,KRX ; Namkoong Ki-Un,KRX ; Seo Man-Seok,KRX ; Paek Un-Chul,KRX ; Oh Kyung-Hwan,KRX ; Song Ghie-Hugh,KRX ; Do Mun-Hyun,KRX ; Chung Young-Joo,KRX, Apparatus and method for overcladding optical fiber preform rod and optical fiber drawing method.
  5. Kholodenko, Arnold; Husain, Anwar, Apparatus for an optimized plasma chamber grounded electrode assembly.
  6. Ueda Setsuo (Chigasaki JPX) Yasuda Takashi (Aichi JPX) Yamada Tokuyoshi (Nagoya JPX) Kobayashi Shigeki (Tokai JPX), Apparatus for producing spherical particles and fibers with a specially fixed size from melts.
  7. Liang Dong C. (Vancouver CAX) Blades Michael W. (Surrey CAX), Atmospheric pressure capacitively coupled plasma atomizer for atomic absorption and source for atomic emission spectrosc.
  8. Abe Kunio (Bizen JPX), Carbon molecular sieve.
  9. Lang Robert J. (Baytown TX) Pabst Joanne K. (Crosby TX), Catalytic coal gasification process.
  10. McFarland, Michael D.; Krishnan, Mahadevan; Wright, Jason D.; Gerhan, Andrew N.; Tang, Benjamin, Coaxial plasma arc vapor deposition apparatus and method.
  11. Hwang, Soon Mo; Kim, Young Suk; Doh, Cheal Jin, Cyclonic plasma pyrolysis/vitrification system.
  12. Gutsol, Alexander F.; Fridman, Alexander; Polevich, Anatoly; Gallagher, Michael J., Cyclonic reactor with non-equilibrium gliding discharge and plasma process for reforming of solid hydrocarbons.
  13. Shinada, Kei; Horiike, Shigeyoshi; Nishimoto, Takahiro, Discharge ionization current detector.
  14. Shinada, Kei; Horiike, Shigeyoshi; Nishimoto, Takahiro; Kitano, Katsuhisa, Discharge ionization current detector.
  15. Shinada, Kei; Horiike, Shigeyoshi; Nishimoto, Takahiro; Kitano, Katsuhisa, Discharge ionization current detector.
  16. Yang, Ralph T.; Li, Yingwel; Lachawiec, Jr., Anthony J., Enhancing hydrogen spillover and storage.
  17. Hiroji Hanawa ; Yan Ye ; Kenneth S Collins ; Kartik Ramaswamy ; Andrew Nguyen ; Tsutomu Tanaka, Externally excited multiple torroidal plasma source.
  18. Hanawa,Hiroji; Collins,Kenneth S; Ramaswamy,Kartik; Nguyen,Andrew; Tanaka,Tsutomu; Ye,Yan, Externally excited torroidal plasma source.
  19. Hiroji Hanawa ; Yan Ye ; Kenneth S Collins ; Kartik Ramaswamy ; Andrew Nguyen ; Tsutomu Tanaka, Externally excited torroidal plasma source using a gas distribution plate.
  20. Hanawa, Hiroji; Ye, Yan; Collins, Kenneth S.; Ramaswamy, Kartik; Nguyen, Andrew; Tanaka, Tsutomu, Externally excited torroidal plasma source with a gas distribution plate.
  21. Collins, Kenneth S.; Hanawa, Hiroji; Ye, Yan; Ramaswamy, Kartik; Nguyen, Andrew; Barnes, Michael S.; Nguyen, Huong Thanh, Externally excited torroidal plasma source with magnetic control of ion distribution.
  22. Maydan, Dan; Thakur, Randir P. S.; Collins, Kenneth S.; Al-Bayati, Amir; Hanawa, Hiroji; Ramaswamy, Kartik; Gallo, Biagio; Nguyen, Andrew, Fabrication of silicon-on-insulator structure using plasma immersion ion implantation.
  23. Buchberger, Jr.,Douglas A.; Hoffman,Daniel J.; Ramaswamy,Kartik; Nguyen,Andrew; Hanawa,Hiorji; Collins,Kenneth S.; Al Bayati,Amir, Gasless high voltage high contact force wafer contact-cooling electrostatic chuck.
  24. Weide Carl Vander, Graphite rotary tube furnace.
  25. Campbell Gregor A. (Glendale CA) Conn Robert W. (Los Angeles CA) Katz Dan (Beverly Hills CA) Parker N. William (Fairfield CA) Pearson David I. C. (Los Angeles CA), High density plasma deposition and etching apparatus.
  26. Hanawa,Hiroji; Ramaswamy,Kartik; Collins,Kenneth S.; Al Bayati,Amir; Gallo,Biagio; Nguyen,Andrew, Low temperature CVD process with selected stress of the CVD layer on CMOS devices.
  27. Roth John Reece, Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure.
  28. Roth John Reece (Knoxville TN), Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof.
  29. Roth John R. (Knoxville TN) Tsai Peter P. (Knoxville TN), Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure.
  30. Roth John R. (Knoxville TN) Tsai Peter P. (Knoxville TN) Wadsworth Larry C. (Knoxville TN) Liu Chaoya (Knoxville TN) Spence Paul D. (Knoxville TN), Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure.
  31. Biberger, Maximilian A., Method and apparatus for making recyclable catalysts.
  32. Yoshihiro Nakata JP; Shinji Ochi JP, Method for adhering polyolefin materials.
  33. Al Bayati,Amir; Roberts,Rick J.; Collins,Kenneth S.; MacWilliams,Ken; Hanawa,Hiroji; Ramaswamy,Kartik; Gallo,Biagio; Nguyen,Andrew, Method for ion implanting insulator material to reduce dielectric constant.
  34. Sugo, Nozomu; Iwasaki, Hideharu; Kitamura, Takanori; Morotomi, Tatsuo; Kowaka, Tsuyoshi; Okada, Teruhiro; Nishimura, Shushi; Fujino, Takeshi; Oyama, Shigeki; Kawabuchi, Yuji, Method for manufacturing activated carbon, polarizable electrode, and electric double-layered capacitor.
  35. Foret, Todd, Method for treating liquids with wave energy from an electrical arc.
  36. Hiroji Hanawa ; Yan Ye ; Kenneth S Collins ; Kartik Ramaswamy ; Andrew Nguyen ; Tsutomu Tanaka, Method of processing a workpiece using an externally excited torroidal plasma source.
  37. Hanawa,Hiroji; Ramaswamy,Kartik; Collins,Kenneth S.; Nguyen,Andrew; Monroy,Gonzalo Antonio, Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements.
  38. Boughton, Daniel Robert, Methods and apparatus for material processing using dual source cyclonic plasma reactor.
  39. Gadkaree, Kishor Purushottam; Mach, Joseph Frank, Methods for forming activated carbon material for high energy density ultracapacitors.
  40. Kawase Toru,JPX ; Nagano Yoshinobu,JPX ; Kimura Tadashi,JPX ; Yoshida Yoshikazu,JPX ; Mizuguchi Shinichi,JPX, Microwave plasma torch having discretely positioned gas injection holes and method for generating plasma.
  41. Boulos, Maher; Jurewicz, Jerzy, Multi-coil induction plasma torch for solid state power supply.
  42. Roth John R. (Knoxville TN) Tsai Peter P. (Knoxville TN) Liu Chaoyu (Knoxville TN) Laroussi Mounir (Knoxville TN) Spence Paul D. (Knoxville TN), One atmosphere, uniform glow discharge plasma.
  43. Oh Shin M. (Roanoke VA) Nath Dilip K. (Roanoke VA) Pureza Pablo C. (Burke VA), Optical fiber drawing using plasma torch.
  44. Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Nguyen,Andrew; Al Bayati,Amir; Gallo,Biagio; Monroy,Gonzalo Antonio, Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage.
  45. Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Nguyen,Andrew; Al Bayati,Amir; Gallo,Biagio, Plasma immersion ion implantation process.
  46. Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Nguyen,Andrew; Al Bayati,Amir; Gallo,Biagio, Plasma immersion ion implantation process.
  47. Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Nguyen,Andrew; Al Bayati,Amir; Gallo,Biagio, Plasma immersion ion implantation process.
  48. Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Nguyen,Andrew; Al Bayati,Amir; Gallo,Biagio; Monroy,Gonzalo Antonio, Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage.
  49. Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Nguyen,Andrew; Al Bayati,Amir; Gallo,Biagio; Monroy,Gonzalo Antonio, Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage.
  50. Collins, Kenneth S.; Hanawa, Hiroji; Ramaswamy, Kartik; Nguyen, Andrew; Al-Bayati, Amir; Gallo, Biagio; Monroy, Gonzalo Antonio, Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage.
  51. Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Nguyen,Andrew; Al Bayati,Amir; Gallo,Biagio; Monroy,Gonzalo Antonio, Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage.
  52. Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Nguyen,Andrew; Al Bayati,Amir; Gallo,Biagio; Monroy,Gonzalo Antonio, Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage.
  53. Hana Barankova SE; Ladislav Bardos SE, Plasma processing apparatus having rotating magnets.
  54. Kitano, Katsuhisa; Hamaguchi, Satoshi; Aoki, Hironori, Plasma producing apparatus and method of plasma production.
  55. Paterson,Alexander; Todorow,Valentin N.; Panagopoulos,Theodoros; Hatcher,Brian K.; Katz,Dan; Hammond, IV,Edward P.; Holland,John P.; Matyushkin,Alexander, Plasma reactor apparatus with independent capacitive and toroidal plasma sources.
  56. Boulos, Maher I.; Kogelschatz, Ulrich; Nessim, Christine, Plasma surface treatment using dielectric barrier discharges.
  57. Foret, Todd, Plasma whirl reactor apparatus and methods of use.
  58. Foret, Todd, Plasma whirl reactor apparatus and methods of use.
  59. Foret, Todd L., Plasma whirl reactor apparatus and methods of use.
  60. Walter Flurschutz DE; Alexander Klein DE; Rudi Horn DE; Simon Zakharian DE, Process for producing spheroidized hard material powder.
  61. Gotovchikov Vitaly T.,RUX ; Ivanov Alexander V.,RUX ; Filippov Eugene A.,RUX, Processing of solid mixed waste containing radioactive and hazardous materials.
  62. Lynum Steinar (Oslo NOX) Hox Ketil (Trondheim NOX) Hugdahl Jan (Trondheim NOX), Production of carbon black.
  63. Stewart Clive Edward Ernest (Bishops Stortford EN), Radio frequency preparation of pure glass.
  64. Hiroji Hanawa ; Yan Ye ; Kenneth S Collins ; Kartik Ramaswamy ; Andrew Nguyen ; Tsutomu Tanaka, Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate.
  65. Jegou Claude,FRX ; Kassabji Fayez,FRX ; Renaux Charley,FRX, Rotary melting furnace.
  66. Al Bayati,Amir; Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Gallo,Biagio; Nguyen,Andrew, Semiconductor on insulator vertical transistor fabrication and doping process.
  67. Al-Bayati, Amir; Collins, Kenneth S.; Hanawa, Hiroji; Ramaswamy, Kartik; Gallo, Biagio; Nguyen, Andrew, Semiconductor on insulator vertical transistor fabrication and doping process.
  68. Al Bayati,Amir; Collins,Kenneth S.; Hanawa,Hiroji; Ramaswamy,Kartik; Gallo,Biagio; Nguyen,Andrew, Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement.
  69. Ueda, Toshiaki, Synthetic amorphous silica powder and method for producing same.
  70. Roberts Peter R. (Groton MA) Blout James E. (Concord MA), Techniques for producing fine metal powder.
  71. Foret, Todd, Treatment of fluids with wave energy from a carbon arc.
  72. Hanawa,Hiroji; Ramaswamy,Kartik; Collins,Kenneth S.; Al Bayati,Amir; Gallo,Biagio; Nguyen,Andrew, Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer.

IPC 상위 출원인