초록 ▼

Disclosed are solar-reflective roofing and other building materials having high reflectance of near-infrared radiation and high transmission of radiation in the visible light range and a substantial emissivity so as to reduce the heat island effects experienced by the articles while also maintaining

Disclosed are solar-reflective roofing and other building materials having high reflectance of near-infrared radiation and high transmission of radiation in the visible light range and a substantial emissivity so as to reduce the heat island effects experienced by the articles while also maintaining an aesthetically pleasing appearance. Also disclosed are related methods for fabrication of such materials.

대표청구항 ▼

1. A method of fabricating a building material, comprising: applying a plasma to an opaque substrate so as to give rise to a treated region of the substrate;applying a fluid film-forming material to the treated region of the substrate;curing the fluid film-forming material so as to give rise to a th

1. A method of fabricating a building material, comprising: applying a plasma to an opaque substrate so as to give rise to a treated region of the substrate;applying a fluid film-forming material to the treated region of the substrate;curing the fluid film-forming material so as to give rise to a thin film; andforming the building material comprising the thin film surmounting the treated region of the substrate,wherein the thin film has a thickness in a range of about 5 nm to about 10 nm;wherein the substrate comprises an asphalt shingle, a roofing membrane, a ceramic roofing tile, painted metal coil stock, a metal shake, a concrete roofing tile, a wood shake, a slate roofing tile, a siding material, a fencing material, a rail material, or a decking material; andwherein the thin film (a) transmits from about 25% to about 80% of radiation having a wavelength of between about 300 nm and about 700 nm, and (b) reflects from about 25% to about 60% of radiation having a wavelength of between about 700 nm and about 2500 nm. 2. The method of claim 1, wherein applying the fluid film-forming material and curing the fluid film-forming material are performed at around atmospheric pressure. 3. The method of claim 1, wherein applying the fluid film-forming material and curing the fluid film-forming material are performed at above atmospheric pressure. 4. The method of claim 1, wherein applying the fluid film-forming material and curing the fluid film-forming material are performed at less than about 100° C. 5. The method of claim 1, wherein the fluid film-forming material comprises tetraethyl orthosilicate. 6. The method of claim 1, wherein the plasma is applied so as to clean a portion of the substrate. 7. The method of claim 1, wherein applying the fluid film-forming material comprises spraying. 8. The method of claim 1, further comprising applying a first gas while applying the fluid film-forming material. 9. The method of claim 1, wherein the substrate comprises a bituminous material. 10. The method of claim 9, wherein a plurality of roofing granules are embedded in the bituminous material prior to applying the plasma to the substrate. 11. The method of claim 1, wherein the thin film comprises a metal oxide. 12. A method of fabricating a building material, comprising: disposing a film-forming material onto an opaque substrate;processing the film-forming material so as to give rise to a thin film surmounting at least a portion of the substrate, wherein processing the film-forming material includes exposing the film-forming material to a plasma, which exposure gives rise to a reactive material forming the thin film; andforming the thin film surmounting at least the portion of the substrate, the thin film having a thickness in a range of from about 5 nm to about 1000 nm, the thin film transmitting from about 25% to about 80% of radiation having a wavelength of between about 300 nm and about 700 nm, and the thin film reflecting from about 25% to about 60% of radiation having a wavelength of between about 700 nm and about 2500 nm. 13. The method of claim 12, wherein the film-forming material is selected so as to provide a building material having an L* of less than about 85. 14. The method of claim 12, wherein the substrate comprises a shingle, a roofing membrane, a shake, a tile, coil stock, or any combination thereof. 15. The method of claim 12, wherein the substrate comprises a plurality of granules disposed atop the substrate prior to disposing the film forming material on the substrate. 16. The method of claim 12, wherein the building material is selected from the group consisting of a roofing material, a siding material, a fencing material, a rail material, or a decking material. 17. The method of claim 12, wherein the substrate, film-forming material, or both are selected such that the building material has an emissivity of at least about 75% for radiation having a wavelength of between about 700 nm and about 2500 nm. 18. The method of claim 17, wherein the substrate, film-forming material, or both are selected such that the building material has an emissivity of at least about 90% for radiation having a wavelength of between about 700 nm and about 2500 nm. 19. The method of claim 12, wherein processing the film-forming material is performed after disposing the film-forming material onto the opaque substrate.