초록 ▼

A machine includes a machine substrate and a dielectric layer formed over at least a portion of the machine substrate. A monitoring system for the machine includes a sensor subsystem that includes a first portion of the machine substrate and a portion of the machine dielectric layer formed over the

A machine includes a machine substrate and a dielectric layer formed over at least a portion of the machine substrate. A monitoring system for the machine includes a sensor subsystem that includes a first portion of the machine substrate and a portion of the machine dielectric layer formed over the first portion of the machine substrate. The monitoring system also includes a sensor electromagnetic structure disposed on the portion of the machine dielectric layer. The sensor electromagnetic structure includes at least one sensor conducting subcomponent. The sensor electromagnetic structure is configured to regulate electromagnetic fields incident thereto in response to at least one measurement characteristic of a machine measurand. The sensor subsystem is configured to obtain at least one measurement characteristic of the machine measurand proximate a machine sensing position.

대표청구항 ▼

1. A monitoring system for a machine, the machine including a machine substrate and a dielectric layer formed over at least a portion of the machine substrate, said monitoring system comprising a sensor subsystem comprising: a first portion of said machine substrate;a portion of said machine dielect

1. A monitoring system for a machine, the machine including a machine substrate and a dielectric layer formed over at least a portion of the machine substrate, said monitoring system comprising a sensor subsystem comprising: a first portion of said machine substrate;a portion of said machine dielectric layer formed over said first portion of said machine substrate; anda plurality of sensor subassemblies positioned at predetermined sensing positions on the dielectric layer, wherein each of the sensor subassembly includes a sensor electromagnetic structure disposed on said portion of said machine dielectric layer, said sensor electromagnetic structure comprising at least one sensor conducting subcomponent, said sensor electromagnetic structure configured to regulate electromagnetic fields incident thereto in response to at least one measurement characteristic of a machine measurand, said sensor subsystem configured to obtain at least one measurement characteristic of the machine measurand proximate a machine sensing position. 2. The monitoring system in accordance with claim 1, wherein said sensor subsystem further comprises: a delay component coupled to said sensor electromagnetic structure; anda sensor component coupled to said delay component. 3. The monitoring system in accordance with claim 2, wherein said sensor component comprises a loading element and said at least one sensor subsystem further comprises a matching element coupled to said sensor electromagnetic structure and said loading element, said matching element configured to facilitate impedance matching between said loading element and said sensor electromagnetic structure. 4. The monitoring system in accordance with claim 3, wherein said sensor component is an electromagnetic field-responsive component configured to radiate in close proximity of said first portion of said machine substrate. 5. The monitoring system in accordance with claim 4, wherein said electromagnetic field-responsive component and said loading element are coupled in series or are in parallel. 6. The monitoring system in accordance with claim 1 further comprising a reader subsystem operatively coupled to said sensor subsystem, said reader subsystem comprising: a second portion of said machine substrate;at least one reader electromagnetic subassembly comprising at least one reader conducting subcomponent configured to measure the regulated electromagnetic fields; anda reader processor coupled to said at least one reader electromagnetic subassembly, said reader processor configured to determine values for the measurement characteristics of the machine measurand based on at least one property of the regulated electromagnetic fields. 7. The monitoring system in accordance with claim 6, wherein said reader subsystem further comprises a reader dielectric layer coupled to said second portion of said machine substrate. 8. The monitoring system in accordance with claim 6, wherein said reader subsystem further comprises a passivation subcomponent configured to at least partially protect said reader electromagnetic subassembly from environmental conditions including oxidation and reduction reactions within the machine. 9. The monitoring system in accordance with claim 6 further comprising a plurality of metallic interferers positioned proximate said at least one reader electromagnetic subassembly and proximate said sensor electromagnetic structure. 10. The monitoring system in accordance with claim 6, wherein: said at least one reader conducting subcomponent defines at least one reader antenna configured to transmit energy in the radio-frequency (RF) spectrum to said sensor electromagnetic structure and at least one reader antenna configured to receive energy in the RF spectrum from said sensor component; andsaid at least one sensor conducting subcomponent defines a sensor antenna configured to respond to the RF energy transmitted from said reader electromagnetic subassembly. 11. The monitoring system in accordance with claim 10, wherein said at least one reader antenna comprises one of: a first bistatic reader antenna configured to transmit energy in the RF spectrum to said sensor electromagnetic structure and a second bistatic reader antenna configured to receive energy in the RF spectrum from said sensor component; anda monostatic reader antenna configured to both transmit energy in the RF spectrum to said sensor electromagnetic structure and receive energy in the RF spectrum from said sensor component. 12. The monitoring system in accordance with claim 6, wherein said sensor subsystem and said reader subsystem are separated by a distance, wherein the distance is in a range between about 10 centimeters (cm) and about 125 cm. 13. The monitoring system in accordance with claim 6, wherein said sensor subsystem and said reader subsystem are separated by a distance, wherein the distance is in a range between about 2 wavelengths to about 5 wavelengths. 14. The monitoring system in accordance with claim 1, wherein said sensor subsystem further comprises a passivation subcomponent configured to at least partially protect said sensor electromagnetic structure from environmental conditions within the machine. 15. The monitoring system in accordance with claim 1, wherein said machine dielectric layer is formed from materials including one or more of yttria-stabilized zirconia, a high-temperature ceramic material, alumina, aluminum oxide, forsterite, spinel, mullite, corderite, glass, silicon dioxide, and barium strontium titanate. 16. A method of operating a machine including a monitoring system, said method comprising: generating, with a reader subsystem, an electromagnetic field proximate a sensor subsystem, thereby illuminating a sensor conducting subcomponent with the electromagnetic field;regulating the electromagnetic field with the sensor subsystem in response to changes of at least one measurement characteristic of a machine measurand as determined through a machine dielectric layer extending over a portion of a first portion of a machine substrate, wherein the sensor subsystem is disposed on the machine dielectric layer;sensing changes in the regulated electromagnetic field at the reader subsystem; andtransmitting signals representative of the changes in the regulated electromagnetic field to a reader processor;wherein the reader subsystem is printed and positioned on a non-planar metallic surface using maskless patterning and manufacturing with no electronic components embedded thereon. 17. The method in accordance with claim 16, wherein transmitting signals representative of the changes in the regulated electromagnetic field to a reader processor comprises: generating signals representative of values of the at least one measurement characteristic of the machine measurand within the reader processor; andtransmitting the signals representative of values of the at least one measurement characteristic to at least one of a recording device and an indicating device. 18. The method in accordance with claim 16, wherein generating an electromagnetic field proximate a sensor subsystem comprises generating the electromagnetic field with a predetermined frequency within a predetermined portion of the radiofrequency (RF) spectrum. 19. The method in accordance with claim 18, wherein generating the electromagnetic field with a predetermined frequency comprises generating the electromagnetic field with a frequency within a predetermined wideband range of the RF frequency spectrum, the wideband range of the RF frequency spectrum including predetermined resonant frequencies of the sensor subsystem. 20. The method in accordance with claim 18, wherein generating the electromagnetic field with a predetermined frequency comprises generating the electromagnetic field with time-varying frequencies that sweep through a range of frequencies that encompass predetermined resonant frequencies of the sensor subsystem. 21. A turbomachine comprising: at least one rotatable component comprising a first machine substrate and a first dielectric layer formed over at least a portion of said first substrate;at least one stationary component comprising a second substrate and a second dielectric layer formed over at least a portion of said second substrate, said at least one stationary component proximate said at least one rotatable component; anda sensor subsystem comprising a plurality of sensor subassemblies positioned at predetermined sensing positions on the first dielectric layer, wherein each of the sensor subassembly includes a sensor electromagnetic structure, said sensor electromagnetic structure comprising at least one sensor conducting subcomponent, said sensor electromagnetic structure configured to regulate electromagnetic fields incident thereto in response to at least one measurement characteristic of a measurand of said at least one rotatable component, said sensor subsystem configured to obtain the at least one measurement characteristic of the measurand of said at least one rotatable component. 22. The turbomachine in accordance with claim 21, wherein said at least one sensor subsystem further comprises: a delay component coupled to said sensor electromagnetic structure; anda sensor component coupled to said delay component. 23. The turbomachine in accordance with claim 21 further comprising a reader subsystem operatively coupled to said sensor subsystem, wherein said second dielectric layer comprises a reader dielectric layer, said reader subsystem comprising: at least one reader electromagnetic subassembly coupled to said reader dielectric layer, said at least one reader electromagnetic subassembly comprising at least one reader conducting subcomponent, said at least one reader electromagnetic subassembly configured to measure the regulated electromagnetic fields; anda reader processor coupled to said at least one reader electromagnetic subassembly, said reader processor configured to determine values for the measurement characteristics of the measurand of said at least one rotatable component based on at least one property of the regulated electromagnetic fields. 24. The turbomachine in accordance with claim 23, wherein: said at least one reader conducting subcomponent defines at least one reader antenna configured to transmit energy in the radio-frequency (RF) spectrum to said sensor electromagnetic structure and at least one reader antenna configured to receive energy in the RF spectrum from said sensor component; andsaid at least one sensor conducting subcomponent defines a sensor antenna configured to respond to the RF energy transmitted from said reader electromagnetic subassembly.