Process gas analyzer and method for analyzing a process gas
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G01N-021/39
G01N-021/27
G01N-021/3504
G01N-021/15
G01N-021/85
G01N-033/00
출원번호
US-0176367
(2016-06-08)
등록번호
US-9927357
(2018-03-27)
우선권정보
EP-15171901 (2015-06-12)
발명자
/ 주소
Bitter, Ralf
출원인 / 주소
Siemens Aktiengesellschaft
대리인 / 주소
Cozen O'Connor
인용정보
피인용 횟수 :
0인용 특허 :
4
초록▼
A process gas analyzer and method for analyzing a process gas carried in a plant section, wherein light from a light source is passed through the process gas and detected via a detector, evaluated in an evaluation unit to produce an analysis result with respect to the absorption in the process gas,
A process gas analyzer and method for analyzing a process gas carried in a plant section, wherein light from a light source is passed through the process gas and detected via a detector, evaluated in an evaluation unit to produce an analysis result with respect to the absorption in the process gas, where chambers or purging pipes, present between the light source and the plant section and also between the detector and the plant section, are flushed with a purge gas to analyze the process gas, and where the volume flow rate of the purge gas is periodically modulated and the effect of the purge gas on the analysis result is determined based on changes in the detected absorption caused by the modulation and removed from the analysis result to enable a high degree of compensation for measurement errors caused by the purging.
대표청구항▼
1. A process gas analyzer for analyzing a process gas carried in a plant section, comprising: a detector;an evaluation unit arranged downstream of the detector;a light source, light from said light source passing through the process gas and being detected by said detector and evaluated with respect
1. A process gas analyzer for analyzing a process gas carried in a plant section, comprising: a detector;an evaluation unit arranged downstream of the detector;a light source, light from said light source passing through the process gas and being detected by said detector and evaluated with respect to absorption in the process gas in the evaluation unit to produce an analysis result; anda purge gas system including a first chamber provided between the light source and the plant section and a second chamber provided between the detector and the plant section, the first and second chambers being open towards an interior of the plant section and being flushed with a purge gas such that the light passes a total absorption path comprising an absorption path purged by the purge gas and a measuring path in the process gas;wherein the purge gas system further includes a flow rate modulator for periodic modulation of a volume flow rate of the purge gas provided to the purge gas system such that a resulting modulation of the total absorption path purged by the purge gas is less than 100%; andwherein the evaluation unit is configured to determine an effect of the purge gas on the analysis result based on changes in a detected absorption caused by the periodic modulation and to remove said determined effect from the analysis result. 2. The process gas analyzer as claimed in claim 1, wherein the evaluation unit contains a lock-in demodulator which ascertains an amplitude of changes in the detected absorption at a modulation frequency of the volume flow rate. 3. The process gas analyzer as claimed in claim 2, wherein the flow rate modulator for modulating the volume flow rate of the purge gas comprises a variable-speed fan. 4. The process gas analyzer as claimed in claim 2, wherein the flow rate modulator for modulating the volume flow rate of the purge gas comprises a controllable regulator valve arranged in a purge gas feed system which feeds each respective chamber. 5. The process gas analyzer as claimed in claim 2, wherein the flow rate modulator for modulating the volume flow rate of the purge gas comprises a buffer volume which is modifiable via a controller arranged in the purge gas feed system which feeds each respective chamber. 6. The process gas analyzer as claimed in claim 1, wherein the flow rate modulator for modulating the volume flow rate of the purge gas comprises a variable-speed fan. 7. The process gas analyzer as claimed in claim 1, wherein the flow rate modulator for modulating the volume flow rate of the purge gas comprises a controllable regulator valve arranged in a purge gas feed system which feeds each respective chamber. 8. The process gas analyzer as claimed in claim 1, wherein the flow rate modulator for modulating the volume flow rate of the purge gas comprises a buffer volume which is modifiable via a controller arranged in the purge gas feed system which feeds each respective chamber. 9. A method for analyzing a process gas carried in a plant section, comprising: detecting light from a light source via a detector after said light is passed through the process gas;evaluating said light with respect to absorption in the process gas in an evaluation unit arranged downstream to produce an analysis result;flushing chambers included in a purge gas system with a purge gas such that the light passes a total absorption path comprising an absorption path purged by the purge gas and a measuring path in the process gas, the chambers being open towards an interior of the plant section and present between the light source and the plant section and between the detector and the plant section;modulating periodically, by a flow rate modulator, a volume flow rate of the purge gas provided to the purge gas system;determining, by the flow rate modulator, based on changes in the detected absorption caused by said periodic modulation gas, an effect of the purge gas on the analysis result; andremoving by the evaluation unit, said effect of the purge gas on the analysis result from the analysis result based on the changes in the detected absorption caused by said periodic modulation;wherein the purge gas system further includes the flow rate modulator for periodic modulation of the volume flow rate of the purge gas provided to the purge gas system such that a resulting modulation of the total absorption path purged by the purge gas is less than 100%. 10. The method as claimed in claim 9, wherein amplitude of the changes in the detected absorption is ascertained at the modulation frequency of the volume flow rate via lock-in demodulation. 11. The method as claimed in claim 10, wherein the flow rate modulator which modulates the volume flow rate of the purge gas comprises a variable-speed fan. 12. The method as claimed in claim 10, wherein the volume flow rate of the purge gas is modulated via a controllable regulator valve arranged in a purge gas feed system. 13. The method as claimed in claim 10, wherein the volume flow rate of the purge gas is modulated via a modifiable buffer volume arranged in a purge gas feed system. 14. The method as claimed in claim 9, wherein the flow rate modulator which modulates the volume flow rate of the purge gas comprises a variable-speed fan. 15. The method as claimed in claim 9, wherein the flow rate modulator which modulates the volume flow rate of the purge gas comprises a controllable regulator valve arranged in a purge gas feed system. 16. The method as claimed in claim 9, wherein the volume flow rate of the purge gas is modulated via a modifiable buffer volume arranged in a purge gas feed system.
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이 특허에 인용된 특허 (4)
Eckstrom Donald J., NDIR apparatus and method for measuring isotopic ratios in gaseous samples.
Fasching George E. (Morgantown WV) Smith ; Jr. Nelson S. (Morgantown WV), Phased-array ultrasonic surface contour mapping system and method for solids hoppers and the like.
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