Chelating base product for use in water-based system treatments
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C02F-001/68
C05D-009/00
C05C-003/00
C05D-005/00
C05D-009/02
C05G-003/00
C02F-001/50
C02F-101/10
C02F-103/42
출원번호
US-0184523
(2016-06-16)
등록번호
US-9938171
(2018-04-10)
발명자
/ 주소
Nicholas, David
Bowman, Reid Henry
Singleton, Freddie L.
출원인 / 주소
Earth Science Laboratories
대리인 / 주소
Kilpatrick Townsend & Stockton LLP
인용정보
피인용 횟수 :
2인용 특허 :
9
초록▼
A base product fluid is produced by adding anhydrous liquid ammonia and a first portion of sulfuric acid to water in a process line to form a mixed fluid. The mixed fluid may be cooled and a second portion of sulfuric acid may be added to the mixed fluid to form the base product fluid. The base prod
A base product fluid is produced by adding anhydrous liquid ammonia and a first portion of sulfuric acid to water in a process line to form a mixed fluid. The mixed fluid may be cooled and a second portion of sulfuric acid may be added to the mixed fluid to form the base product fluid. The base product fluid may include a molecular compound that is a chelating compound. The molecular compound may have the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x. In the formula, a may be between 1 and 5, b may be between 1 and 5, c may be between 1 and 5, and x may be between 1 and 10.
대표청구항▼
1. A chelating compound having the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x;wherein a is between 1 and 5, b is between 1 and 5, c is between 1 and 5, and x is between 1 and 10. 2. The chelating compound of claim 1, wherein the chelating compound is crystalline. 3. The chelating compound of c
1. A chelating compound having the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x;wherein a is between 1 and 5, b is between 1 and 5, c is between 1 and 5, and x is between 1 and 10. 2. The chelating compound of claim 1, wherein the chelating compound is crystalline. 3. The chelating compound of claim 1, wherein the chelating compound is hydroscopic. 4. The chelating compound of claim 1, wherein the chelating compound is capable of chelating a metal salt. 5. The chelating compound of claim 4, wherein the metal salt comprises a salt of zinc, magnesium, manganese, selenium, molybdenum, iron, boron, cobalt, copper, or combinations thereof. 6. The chelating compound of claim 1, wherein the chelating compound has a pH below about 2 when mixed with water. 7. The chelating compound of claim 1, wherein a is 1, b is 1, c is 1, and x is between 1 and 6. 8. The chelating compound of claim 1, wherein the nitrogen atoms in the chelating compound have an oxidation state of −3. 9. The chelating compound of claim 1, wherein the sulfur atoms in the chelating compound have an oxidation state of +6. 10. A chelating compound having the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x;wherein a is at least 1, b is at least 1, c is at least 1, and x is between 1 and 10; andwherein the chelating compound comprises an elemental composition of: between about 3% and about 6% hydrogen;between about 10% and about 15% nitrogen;between about 25% and about 30% sulfur; andbetween about 52% and about 60% oxygen. 11. The chelating compound of claim 10, wherein the chelating compound is crystalline. 12. The chelating compound of claim 10, wherein a is between 1 and 5, b is between 1 and 5, c is between 1 and 5, and x is between 1 and 10. 13. The chelating compound of claim 10, wherein the chelating compound is hydroscopic. 14. The chelating compound of claim 10, wherein the chelating compound is capable of chelating a metal salt. 15. The chelating compound of claim 14, wherein the metal salt comprises a salt of zinc, magnesium, manganese, selenium, molybdenum, iron, boron, cobalt, copper, or combinations thereof. 16. The chelating compound of claim 10, wherein the chelating compound has a pH below about 2 when mixed with water. 17. The chelating compound of claim 10, wherein a is 1, b is 1, c is 1, and x is between 1 and 6. 18. The chelating compound of claim 10, wherein the nitrogen atoms in the molecule have an oxidation state of −3. 19. The chelating compound of claim 10, wherein the sulfur atoms in the molecule have an oxidation state of +6. 20. A chelating compound having the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x;wherein a is at least 1, b is at least 1, c is at least 1, and x is between 1 and 10; andwherein the chelating compound has a pH below about 2 when mixed with water. 21. A chelating fluid, comprising: a plurality of chelating compounds in a water solution, the chelating compounds having the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x;wherein a varies between 1 and 5 in the plurality of chelating compounds, b varies between 1 and 5 in the plurality of chelating compounds, c varies between 1 and 5 in the plurality of chelating compounds, and x varies between 1 and 10 in the plurality of chelating compounds. 22. The chelating fluid of claim 21, wherein the chelating compounds are crystalline. 23. The chelating fluid of claim 21, wherein the chelating compounds are hydroscopic. 24. The chelating fluid of claim 21, wherein the chelating fluid is capable of chelating metal salts. 25. The chelating fluid of claim 24, wherein the metal salt comprises a salt of zinc, magnesium, manganese, selenium, molybdenum, iron, boron, cobalt, copper, or combinations thereof. 26. The chelating fluid of claim 21, wherein the chelating fluid has a pH below about 2. 27. The chelating fluid of claim 21, wherein a is 1, b is 1, c is 1, and x is between 1 and 6. 28. The chelating fluid of claim 21, wherein the nitrogen atoms in the chelating compounds have an oxidation state of −3. 29. The chelating fluid of claim 21, wherein the sulfur atoms in the chelating compounds have an oxidation state of +6.
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이 특허에 인용된 특허 (9)
Cummins Barry W., Acidic composition of matter for use to destroy microorganisms.
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