Methods for improving adhesion on dielectric substrates
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G11B-005/127
G11B-005/187
G11B-005/31
출원번호
US-0145205
(2016-05-03)
등록번호
US-9940950
(2018-04-10)
발명자
/ 주소
Zeng, Wanxue
Si, Weimin
Hong, Ying
Zhong, Lieping
출원인 / 주소
WESTERN DIGITAL (FREMONT), LLC
대리인 / 주소
Foley & Lardner LLP
인용정보
피인용 횟수 :
0인용 특허 :
599
초록▼
Various embodiments described herein provide for substrate structures including uniform plating seed layers, and that provide favorable adhesion on dielectric substrate layers. According to some embodiments, a methods for forming a magnetic recording pole is provided comprising: forming an insulator
Various embodiments described herein provide for substrate structures including uniform plating seed layers, and that provide favorable adhesion on dielectric substrate layers. According to some embodiments, a methods for forming a magnetic recording pole is provided comprising: forming an insulator layer; forming a trench in the insulator layer; forming an amorphous seed layer over the insulator layer; forming an adhesion layer over the amorphous seed layer, the adhesion layer comprising a physical vapor deposited (PVD) noble metal; forming a plating seed layer over the adhesion layer, the plating seed layer comprising chemical vapor deposited (CVD) Ru; and forming a magnetic material layer over the plating seed layer.
대표청구항▼
1. A method for forming magnetic recording pole, comprising: forming an insulator layer;forming a trench in the insulator layer;forming an amorphous seed layer over the insulator layer;forming an adhesion layer over the amorphous seed layer, the adhesion layer comprising a physical vapor deposited (
1. A method for forming magnetic recording pole, comprising: forming an insulator layer;forming a trench in the insulator layer;forming an amorphous seed layer over the insulator layer;forming an adhesion layer over the amorphous seed layer, the adhesion layer comprising a physical vapor deposited (PVD) noble metal;forming a plating seed layer over the adhesion layer, the plating seed layer comprising chemical vapor deposited (CVD) Ru; andforming a magnetic material layer over and in contact with the plating seed layer. 2. The method of claim 1, wherein forming the magnetic material layer involves a plating process. 3. The method of claim 1, wherein forming the trench in the insulator layer comprises removing a portion of the insulator. 4. The method of claim 3, wherein forming the trench in the insulator layer further comprises depositing a surface treatment material on the insulator layer. 5. The method of claim 1, wherein forming the amorphous seed layer over the insulator layer comprises depositing the amorphous seed layer over the trench and over areas of the insulator layer extending beyond the trench. 6. The method of claim 1, wherein forming the amorphous seed layer over the insulator layer comprises depositing a metal film over the insulator layer and oxidizing the metal film. 7. The method of claim 1, wherein the PVD noble metal comprises Ru, Rh, Pd, Ag, Os, Ir, Pt, or Au. 8. The method of claim 1, wherein the amorphous seed layer comprises a metal oxide, a metal nitride, or metal alloy. 9. The method of claim 1, wherein the amorphous seed layer comprises TaOx, TiOx, AlOx, SiOx, WOx, HfOx, NbOx, or ZrOx. 10. The method of claim 1, wherein the chemical vapor deposited (CVD) Ru comprises RuO4. 11. The method of claim 1, wherein the insulator layer comprises alumina. 12. The method of claim 1, wherein the magnetic material layer comprises NiFe or CoFe.
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이 특허에 인용된 특허 (599)
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He,Qing; Seagle,David John; Pham,Loi Dac; Lederman,Marcos Moises, Write head for improved manufacturability larger write field and reduced adjacent track erasure.
Chen, Yingjian; Dang, Xiaozhong; Liu, Francis H.; Stoev, Kroum; Jiang, Hai; Wang, Yugang; Shi, Xizeng, Write head having a recessed, magnetic adjunct pole formed atop a main pole, and method of making the same.
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