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Low temperature fluoride glasses and glazes 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03C-017/22
  • C03C-010/00
  • C03C-010/16
  • C03C-008/06
  • C03C-004/18
  • C03C-017/245
출원번호 US-0418611 (2017-01-27)
등록번호 US-9957192 (2018-05-01)
발명자 / 주소
  • Lee, Chengtsin
  • Sun, Jennifer Y.
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Lowenstein Sandler LLP
인용정보 피인용 횟수 : 0  인용 특허 : 38

초록

An article comprises a body having a coating. The coating comprising a eutectic system having a super-lattice of a first fluoride and a second fluoride. The coating includes a glaze on a surface of the coating, the glaze comprising the eutectic system having the super-lattice of the first fluoride a

대표청구항

1. A method comprising: mixing a first fluoride having a first melting temperature with a second fluoride having a second melting temperature that is lower than the first melting temperature to form a mixture comprising the first fluoride and the second fluoride, wherein the second fluoride is ZrF4;

이 특허에 인용된 특허 (38)

  1. Boulos Edward N. (Troy MI) Best Mark F. (Taylor MI) Simmons Joseph H. (Gainsville FL) Pagano Stephen J. (Gainsville FL), Anti-reflective coatings comprising light metal fluorides.
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  5. Sun, Jennifer Y.; Duan, Ren-Guan; Collins, Kenneth S., Corrosion-resistant bonding agents for bonding ceramic components which are exposed to plasmas.
  6. Ohashi Tsuneaki,JPX ; Araki Kiyoshi,JPX ; Shimura Sadanori,JPX ; Katsuda Yuji,JPX, Corrosion-resistant member, wafer-supporting member, and method of manufacturing the same.
  7. Kaushal, Tony S.; Dam, Chuong Quang; Ashkin, Daniel, Elements having erosion resistance.
  8. Zurbuchen, Mark A., Epitaxial layer structures, precursors for topotactic anion exchange films.
  9. Zurbuchen, Mark A., Epitaxial layers on oxidation-sensitive substrates and method of producing same.
  10. Mantkowski, Thomas E., Fluoride ion cleaning method.
  11. Carman Lee A. ; Liu Shuyuan, Glass-ceramic bonded abrasive tools.
  12. Yamada, Hirotake; Katsuda, Yuji; Ohashi, Tsuneaki; Masuda, Masaaki; Harada, Masashi; Iwasaki, Hiroyuki; Ito, Shigenori, Halogen gas plasma-resistive members and method for producing the same, laminates, and corrosion-resistant members.
  13. Yumiki, Naoto, Imaging device.
  14. Sanada, Kazutoshi, Infrared reflecting blue pigment, infrared reflecting green pigment, paint and resin composition using the infrared reflecting blue pigment, and paint and resin composition using the infrared reflecting green pigment.
  15. Ohwaki Junichi (Mito JPX) Wang Yuhu (Chiyoda-Ku JPX) Shibukawa Atsushi (Higashi-Igaraki-gun JPX) Sawanobori Naruhito (Chiyoda-ku JPX) Nagahama Shinobu (Chiyoda-ku JPX), Infrared-to-visible up-conversion material.
  16. Okuda Kouji (Kobe JPX) Nishi Tokumitsu (Osaka JPX) Hoshino Hisakiyo (Settsu JPX) Takai Hiroshi (Nishinomiya JPX) Miyake Natsumi (Toyonaka JPX), Joining method for joining electrically ceramic bodies and a joining apparatus and joining agent for use in the joining.
  17. Okuda Kouji (Kobe JPX) Nishi Tokumitsu (Osaka JPX) Takai Hiroshi (Nishinomiya JPX) Hoshino Hisakiyo (Settsu JPX), Joining method of ceramics and insertion member for heating and joining for use in the method.
  18. Wallace Eric Robert (Cambridge EN) Dewing Ernest William (Arvida CA), Joining of metal surfaces.
  19. Mori Yoshiaki,JPX ; Aoki Yasutsugu,JPX ; Miyakawa Takuya,JPX, Method and apparatus for solid bonding, a conductor bonding method, a packaging method, and a bonding agent and a method for manufacturing a bonding agent.
  20. Mori, Yoshiaki; Aoki, Yasutsugu; Miyakawa, Takuya, Method and apparatus for solid bonding, a conductor bonding method, a packaging method, and a bonding agent and a method for manufacturing a bonding agent.
  21. Sun, Jennifer Y.; Duan, Ren-Guan; Yuan, Jie; Xu, Li; Collins, Kenneth S., Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas.
  22. Shoher Itzhak (50 Shlomo Hamelech St. Tel-Aviv ILX) Whiteman Aharon (13 I.L. Perez St. Pethah-Tikvah ILX), Method for bonding ceramic to noble based metals and product.
  23. Garimella, Balaji Rao; Ng, Sor Tin; Ping, Yap Wai, Methods for repairing gas turbine engine components.
  24. Nishino, Masaru; Makabe, Masatsugu; Nagayama, Nobuyuki; Handa, Tatsuya; Midorikawa, Ryotaro; Kobayashi, Keigo; Niya, Tetsuya, Plasma processing apparatus and method.
  25. Pellenc, Roger, Process for balanced charging of a lithium ion or lithium polymer battery.
  26. Szuecs, Frigyes; Stankowski, Alexander, Process for extending the cyclic service life of thermal barrier coatings, in particular on gas turbine components.
  27. Boulos Edward N. (Troy MI) Best Mark F. (Taylor MI) Simmons Joseph H. (Gainsville FL) Pagano Stephen J. (Gainsville FL), Process for forming anti-reflective coatings comprising light metal fluorides.
  28. Troczynski Tomasz,CAX ; Yang Quanzu,CAX, Process for making chemically bonded sol-gel ceramics.
  29. Sun, Jennifer Y.; Duan, Ren-Guan; Collins, Kenneth S., Protective coatings resistant to reactive plasma processing.
  30. Fulton John L. ; Hoffmann Markus M., Rare earth oxide fluoride nanoparticles and hydrothermal method for forming nanoparticles.
  31. Sun, Jennifer Y.; Duan, Ren-Guan; Yuan, Jie; Xu, Li; Collins, Kenneth S., Semiconductor processing apparatus comprising a coating formed from a solid solution of yttrium oxide and zirconium oxide.
  32. Sun, Jennifer Y.; Duan, Ren-Guan; Yuan, Jie; Xu, Li; Collins, Kenneth S., Semiconductor processing apparatus which is formed from yttrium oxide and zirconium oxide to produce a solid solution ceramic apparatus.
  33. Aoki, Isao; Ibe, Hiroyuki; Kitamura, Junya, Thermal spray powder and method for forming thermal spray coating.
  34. Zurbuchen,Mark A., Topotactic anion exchange oxide films and method of producing the same.
  35. Dejneka Matthew John, Transparent oxyflouride glass-ceramic composition and process of making.
  36. Sun, Jennifer Y; Wu, Shun Jackson; Thach, Senh; Kumar, Ananda H; Wu, Robert W; Wang, Hong; Lin, Yixing; Stow, Clifford C, Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers.
  37. Kobayashi, Yoshimasa; Katsuda, Yuji, Yttrium oxide material, member for semiconductor-manufacturing apparatus, and method for producing yttrium oxide material.
  38. Kobayashi, Yoshimasa; Katsuda, Yuji; Sakai, Hiroaki; Niihara, Koichi; Nakayama, Tadachika, Yttrium oxide-containing material, component of semiconductor manufacturing equipment, and method of producing yttrium oxide-containing material.
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