A light emitting device package includes a cell array including a plurality of semiconductor light emitting units, and having a first surface and a second surface opposite the first surface, each of the plurality of semiconductor light emitting units having a first conductive semiconductor layer, an
A light emitting device package includes a cell array including a plurality of semiconductor light emitting units, and having a first surface and a second surface opposite the first surface, each of the plurality of semiconductor light emitting units having a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer stacked on each other. The light emitting device package may further include a plurality of wavelength conversion units disposed on the first surface of the cell array to correspond to the plurality of semiconductor light emitting units, respectively, each configured to convert a wavelength of light, emitted by a respective one of the plurality of semiconductor light emitting units, into a different wavelength of light, and a partition structure disposed in a space between the plurality of wavelength conversion units, and a plurality of switching units spaced apart from the plurality of wavelength conversion units within the partition structure, and electrically connected to the plurality of semiconductor light emitting units.
대표청구항▼
1. A method of manufacturing a light emitting device package comprising: forming a light emitting structure by stacking a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer on a substrate for growth;forming a plurality of semiconductor light emitting u
1. A method of manufacturing a light emitting device package comprising: forming a light emitting structure by stacking a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer on a substrate for growth;forming a plurality of semiconductor light emitting units by etching a region of the light emitting structure such that a separation region in which the substrate for growth is exposed is formed;forming a plurality of switching units by doping, with impurities, portions of the substrate for growth exposed by the separation region, each of the plurality of switching units including a source region and a drain region;forming a plurality of through holes, in which the light emitting structure is exposed, by etching portions of a region of the substrate for growth, corresponding to the plurality of semiconductor light emitting units; andforming a plurality of wavelength conversion units by filling the plurality of through holes with a wavelength conversion material. 2. The method of claim 1, further comprising: forming an insulating layer to cover the plurality of semiconductor light emitting units and the separation region before forming the plurality of switching units. 3. The method of claim 2, further comprising: forming a photoresist layer to cover the insulating layer and forming a plurality of openings in which the separation region is exposed. 4. The method of claim 3, wherein a doping region is formed by doping, with the impurities, the separation region exposed to a lower surface of each of the plurality of openings. 5. The method of claim 4, wherein the impurities are a p-type impurity, and the doping region is a p-well region. 6. The method of claim 5, further comprising: forming an n-well region by doping an n-type impurity before forming the p-well region. 7. The method of claim 1, wherein the forming the plurality of switching units includes: forming a source electrode and a drain electrode electrically connected to the source region and the drain region, respectively;forming a gate insulating layer on the source region and the drain region; andforming a gate electrode on the gate insulating layer. 8. The method of claim 6, wherein the insulating layer includes a material having the same composition as a composition of the gate insulating layer. 9. The method of claim 1, wherein each of the plurality of switching units is a field-effect transistor (FET). 10. The method of claim 1, wherein the forming the plurality of switching units includes: forming a plurality of first electrodes and a plurality of second electrodes respectively connected to a first conductive semiconductor layer and a second conductive semiconductor layer of each of the plurality of semiconductor light emitting units, the plurality of second electrodes extending to a source electrode of each of the plurality of switching units. 11. The method of claim 1, wherein the plurality of semiconductor light emitting units are parallel on the substrate for growth, and the plurality of switching units are parallel to the plurality of semiconductor light emitting units, respectively. 12. The method of claim 1, wherein an inner wall of at least one of the plurality of through holes has a protruding region. 13. The method of claim 12, wherein at least one of the plurality of switching units is formed in the protruding region. 14. The method of claim 1, wherein the substrate for growth includes a material containing Si. 15. A method of manufacturing a light emitting device package comprising: forming a plurality of semiconductor light emitting units spaced apart from each other by stacking a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer on a substrate for growth and by etching the substrate for growth to be exposed;forming an insulating layer to cover the plurality of semiconductor light emitting units and an exposed region of the substrate for growth;forming a plurality of switching units by doping, with impurities, certain portions of the exposed region of the substrate for growth, each of the plurality of switching units including a source region and a drain region;forming a plurality of through holes, in which the plurality of semiconductor light emitting units are respectively exposed, by etching portions of a region of the substrate for growth contacting the plurality of semiconductor light emitting units; andforming a plurality of wavelength conversion units by filling the plurality of through holes with a wavelength conversion material. 16. The method of claim 1, wherein the forming the plurality of switching units includes: forming a source electrode and a drain electrode electrically connected to the source region and the drain region, respectively;forming a gate insulating layer on the source region and the drain region; andforming a gate electrode on the gate insulating layer. 17. The method of claim 16, further comprising: forming a molding unit to cover the plurality of semiconductor light emitting units and the plurality of switching units. 18. A method of manufacturing a light emitting device package comprising: forming a first semiconductor light emitting unit, a second semiconductor light emitting unit, and a third semiconductor light emitting unit spaced apart from each other by stacking a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer on a substrate for growth and by etching the first conductive semiconductor layer, the active layer, and the second conductive semiconductor layer such that the substrate for growth is exposed;forming an insulating layer to cover the first semiconductor light emitting unit, the second semiconductor light emitting unit, and the third semiconductor light emitting unit and an exposed region of the substrate for growth;forming a first switching unit, a second switching unit, and a third switching unit by doping, with impurities, certain portions of the exposed region of the substrate for growth, each of the first switching unit, the second switching unit, and the third switching unit including a source region and a drain region;forming a first through hole, a second through hole, and a third through hole, in which the first semiconductor light emitting unit, the second semiconductor light emitting unit, and the third semiconductor light emitting unit are respectively exposed, by etching portions of a region of the substrate for growth contacting the first semiconductor light emitting unit, the second semiconductor light emitting unit, and the third semiconductor light emitting unit; andforming a first wavelength conversion unit, a second wavelength conversion unit, and a third wavelength conversion unit by filling the first through hole, the second through hole, and the third through hole with a wavelength conversion material. 19. The method of claim 18, wherein the forming the first wavelength conversion unit, the second wavelength conversion unit, and the third wavelength conversion unit includes filling the first through hole, the second through hole, and the third through hole with wavelength conversion materials having different compositions, respectively. 20. The method of claim 19, wherein the active layer emits blue light, and each of the first wavelength conversion unit, the second wavelength conversion unit, and the third wavelength conversion unit converts blue light into one of red and green light.
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