Insulating glass unit transparent conductive coating technology
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
E06B-003/67
C03C-017/34
B32B-017/10
E06B-003/66
E06B-003/677
출원번호
US-0934664
(2015-11-06)
등록번호
US-10000965
(2018-06-19)
발명자
/ 주소
Burrows, Keith James
Myli, Kari B.
출원인 / 주소
Cardinal CG Company
대리인 / 주소
Fredrikson & Byron, P.A.
인용정보
피인용 횟수 :
0인용 특허 :
181
초록▼
The invention provides flash-treated transparent conductive coatings based on indium tin oxide. Some embodiments provide a multiple-pane insulating glazing unit that includes two glass panes and a between-pane space. The two glass panes respectively define two opposed external pane surfaces. At leas
The invention provides flash-treated transparent conductive coatings based on indium tin oxide. Some embodiments provide a multiple-pane insulating glazing unit that includes two glass panes and a between-pane space. The two glass panes respectively define two opposed external pane surfaces. At least one of the two external pane surfaces has a flash-treated transparent conductive oxide coating.
대표청구항▼
1. A multiple-pane insulating glazing unit comprising two glass panes and a between-pane space, the two glass panes respectively defining two opposed external pane surfaces, a desired one of the two external pane surfaces having a flash-treated transparent electrically conductive coating such that a
1. A multiple-pane insulating glazing unit comprising two glass panes and a between-pane space, the two glass panes respectively defining two opposed external pane surfaces, a desired one of the two external pane surfaces having a flash-treated transparent electrically conductive coating such that a desired one of the two glass panes is a coated glass pane, said coated glass pane being annealed glass having a surface stress of less than 3,500 psi, the flash-treated transparent electrically conductive coating comprising a flash-treated indium tin oxide film and an overcoat film on the flash-treated indium tin oxide film, wherein the overcoat film comprises silicon nitride and/or silicon oxynitride, the overcoat film comprising silicon nitride and/or silicon oxynitride being in contact with the flash-treated indium tin oxide film, the flash-treated transparent electrically conductive coating being exposed such that the overcoat film comprising silicon nitride and/or silicon oxynitride is an outermost film, the flash-treated indium tin oxide film having a thickness of less than 1,800Å, the flash-treated indium tin oxide film being a sputtered film having a surface roughness of less than 3 nm, the flash-treated indium tin oxide film having a sheet resistance of less than 15Ω/square in combination with said coated glass pane having a monolithic visible transmittance of greater than 0.82, the flash-treated indium tin oxide film having an optical bandgap of 370 nm or shorter and being characterized by a pre-flash optical bandgap of 400 nm or longer, the flash-treated indium tin oxide film having a morphology characterized by ultra-high-power flash treatment at 15-45 kW/cm2, the flash-treated indium tin oxide film having a carrier concentration of 9-13 ×1020/cm3. 2. The multiple-pane insulating glazing unit of claim 1 wherein the flash-treated indium tin oxide film is characterized by a carrier concentration factor of at least 5. 3. The multiple-pane insulating glazing unit of claim 2 wherein the carrier concentration factor is at least 7.5. 4. The multiple-pane insulating glazing unit of claim 1 wherein the flash-treated indium tin oxide film is characterized by a ΔA of five percent or more. 5. The multiple-pane insulating glazing unit of claim 4 wherein the ΔA is seven percent or more. 6. The multiple-pane insulating glazing unit of claim 1 wherein the thickness of the flash-treated indium tin oxide film is less than 1,500Å and the sheet resistance is less than 13 Ω/square. 7. The multiple-pane insulating glazing unit of claim 6 wherein the thickness of the flash-treated indium tin oxide film is between 1,050Å and 1,450Å in combination with the monolithic visible transmittance of said coated glass pane being greater than 0.86 but less than 0.92 and the sheet resistance of the flash-treated indium tin oxide film being greater than 10 Ω/square but less than 13Ω/square. 8. The multiple-pane insulating glazing unit of claim 1 wherein the flash-treated indium tin oxide film is non-porous. 9. The multiple-pane insulating glazing unit of claim 1 wherein the overcoat film has a thickness of between 100Å and 1,300Å. 10. The multiple-pane insulating glazing unit of claim 1 wherein the flash-treated indium tin oxide film is in contact with said desired external pane surface, such that the flash-treated transparent electrically conductive coating is devoid of any sodium ion blocker layer between the flash-treated indium tin oxide film and the underlying glass pane, the flash-treated indium tin oxide film having a sodium concentration of less than 100 ppm. 11. The multiple-pane insulating glazing unit of claim 1 wherein the multiple-pane insulating glazing unit has an internal pane surface bearing a low-emissivity coating that includes at least one film comprising silver, the low-emissivity coating being exposed to the between-pane space, the multiple-pane insulating glazing unit having a U value of less than 0.25 together with an IGU visible transmittance of greater than 0.60. 12. The multiple-pane insulating glazing unit of claim 11 wherein the multiple-pane insulating glazing unit exhibits an exterior reflected color characterized by an “ah” color coordinate of between −7 and 2 and a “bh” color coordinate of between −9 and 0. 13. The multiple-pane insulating glazing unit of claim 1 wherein the surface roughness of the flash-treated indium tin oxide film is between 1.5 and 3.0. 14. A multiple-pane insulating glazing unit comprising two glass panes and a between-pane space, the two glass panes respectively defining two opposed external pane surfaces, a desired one of the two external pane surfaces having a flash-treated transparent electrically conductive coating such that a desired one of the two glass panes is a coated glass pane, said coated glass pane being annealed glass having a surface stress of less than 3,500 psi, the transparent electrically conductive coating comprising a flash-treated indium tin oxide film and an overcoat film on the flash-treated indium tin oxide film, wherein the overcoat film comprises silicon nitride and/or silicon oxynitride, the overcoat film comprising silicon nitride and/or silicon oxynitride being in contact with the flash-treated indium oxide film, the flash-treated transparent electrically conductive coating being exposed such that the overcoat film comprising silicon nitride and/or silicon oxynitride is an outermost film, the flash-treated indium tin oxide film having a thickness of between 1,050Å and 1,800Å, the flash-treated indium tin oxide film being a sputtered film having a surface roughness of between 1.5 nm and 3 nm, the flash-treated indium tin oxide film having a sheet resistance of greater than 10Ω/square but less than 15Ω/square in combination with said coated glass pane having a monolithic visible transmittance of greater than 0.86 but less than 0.92, the flash-treated indium tin oxide film having an optical bandgap of 370 nm or shorter and being characterized by a pre-flash optical bandgap of 400 nm or longer, the flash-treated indium tin oxide film having a morphology characterized by ultra-high-power flash treatment at 15-45 kW/cm2, the flash-treated indium tin oxide film having a carrier concentration of 9-13 ×1020/cm3. 15. The multiple-pane insulating glazing unit of claim 14 wherein the flash-treated indium tin oxide film is characterized by a carrier concentration factor of at least 5. 16. The multiple-pane insulating glazing unit of claim 15 wherein the carrier concentration factor is at least 7.5. 17. The multiple-pane insulating glazing unit of claim 14 wherein the flash-treated indium tin oxide film is characterized by a ΔA of nine percent or more. 18. The multiple-pane insulating glazing unit of claim 14 wherein the flash-treated indium tin oxide film is in contact with said desired external pane surface such that the flash-treated transparent electrically conductive coating is devoid of any sodium ion blocker layer between the flash-treated indium tin oxide film and the underlying glass pane, the flash-treated indium tin oxide film having a sodium concentration of less than 100 ppm.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (181)
Yokogawa, Hiroshi; Yokoyama, Masaru; Tsubaki, Kenji; Kawano, Kenji; Sonoda, Kenji, Aerogel substrate and method for preparing the same.
Buffat Bernard (Paris FRX) Defendini Francis (Rueil Malmaison FRX) Padoy Christian (Gonesse FRX) Beaufays Jean-Pierre (Jemeppe sur Sambre BEX) Labbe Jean-Marie (Aische en Refail BEX), Architectural electrochromic pane.
Lemmer, Jean-Marc; Murphy, Nestor P.; McLean, David D.; Blacker, Richard, Articles including anticondensation and/or low-E coatings and/or methods of making the same.
Lemmer, Jean-Marc; Murphy, Nestor P.; McLean, David D.; Blacker, Richard, Articles including anticondensation and/or low-E coatings and/or methods of making the same.
Ruiz, Luis Antonio; Matallana, Eduardo, Controllable liquid crystal matrix mask particularly suited for performing ophthamological surgery, a laser system with said mask and a method of using the same.
Nakayama, Tokuyuki; Abe, Yoshiyuki, Ga-In-O amorphous oxide transparent conductive film, and transparent conductive base material comprising this conductive film formed thereon.
Boire Philippe,FRX ; Didier Fabrice,FRX ; Grimal Jean-Michel,FRX, Glazing assembly comprising a substrate provided with a stack of thin layers for solar protection and/or thermal insulation.
Myli, Kari B.; Pfaff, Gary L.; Vance, Greg; Hartig, Klaus H. W., High quality emission control coatings, emission control glazings, and production methods.
Myli, Kari B.; Pfaff, Gary L.; Vance, Greg; Hartig, Klaus H. W., High quality emission control coatings, emission control glazings, and production methods.
Tran Nang T. (Cottage Grove MN) Gilbert James R. (Maplewood MN), Light transmissive electrically conductive oxide electrode formed in the presence of a stabilizing gas.
Myli, Kari B.; Krisko, Annette J.; Brownlee, James Eugene; Pfaff, Gary L., Low-maintenance coatings, and methods for producing low-maintenance coatings.
Schroder, Kurt A.; Martin, Karl M.; Jackson, Doug K.; McCool, Steven C., Method and apparatus for curing thin films on low-temperature substrates at high speeds.
Schroder, Kurt A; Martin, Karl M; Jackson, Doug K.; McCool, Steven C, Method and apparatus for curing thin films on low-temperature substrates at high speeds.
Schroder, Kurt A; Martin, Karl M; Jackson, Doug K.; McCool, Steven C, Method and apparatus for curing thin films on low-temperature substrates at high speeds.
Shroder, Kurt A.; Martin, Karl M.; Jackson, Doug K.; McCool, Steven C., Method and apparatus for curing thin films on low-temperature substrates at high speeds.
Peterson, Dennis Roger; Wilson, Dennis Eugene; Willauer, Darrin Lee, Method and apparatus for direct electrothermal-physical conversion of ceramic into nanopowder.
Schroder, Kurt A.; Jackson, Douglas Keith; Schmidt, Stephen James, Method and apparatus for initiating a pulsed arc discharge for nanopowder synthesis.
Peterson, Dennis Roger; Wilson, Dennis Eugene; Willauer, Darrin Lee, Method and apparatus for producing bulk quantities of nano-sized materials by electrothermal gun synthesis.
Robinson McDonald (Paradise Valley AZ) Behee Ronald D. (Tempe AZ) deBoer Wiebe B. (Amersfoort AZ NLX) Johnson Wayne L. (Phoenix AZ), Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus.
Robinson McDonald (Paradise Valley AZ) Behee Ronald D. (Tempe AZ) deBoer Wiebe B. (Amersfoort AZ NLX) Johnson Wayne L. (Phoenix AZ), Method and apparatus for substrate heating in an axially symmetric epitaxial deposition apparatus.
Endo Yoshihiro (Nara JPX) Yamashita Yoshito (Nara JPX) Kishishita Hiroshi (Nara JPX) Uede Hisashi (Wakayama JPX), Method for fabricating an indium tin oxide film for a transparent electrode.
Szczyrbowski Joachim (Goldbach DEX) Braatz Christoph (Hainburg DEX) Zmelty Anton (Hoesbach DEX), Method for manufacturing panes with high transmissivity in the visible range of the spectrum and with high reflectivity.
Szczyrbowski Joachim (Goldbach) Dietrich Anton (Wiesenfelden) Hartig Klaus (Ronneburg DEX), Method for the production of coated glass with a high transmissivity in the visible spectral range and with a high refle.
Sheets Ronald E. (Santa Ana CA), Method of heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation la.
Blacker, Richard; Worley, Gerald; Disteldorf, Bernd, Method of making coated article using rapid heating for reducing emissivity and/or sheet resistance, and corresponding product.
Krasnov, Alexey, Method of making thermally tempered coated article with transparent conductive oxide (TCO) coating in color compression configuration, and product made using same.
Blacker, Richard; Richardson, Cory; Krasnov, Alexey, Method of thermally tempering coated article with transparent conductive oxide (TCO) coating using flame(s) in tempering furnace adjacent TCO to burn off oxygen and product made using same.
Finley James J. (O\Hara Township PA) Arbab Mehran (Pittsburgh PA) Waynar Thomas J. (New Kensington PA), Multilayer heat processable vacuum coatings with metallic properties.
Hartig Klaus W. ; Larson Steve L. ; Lingle Philip J., Neutral, high visible, durable low-e glass coating system and insulating glass units made therefrom.
Brochot Jean-Pierre (Paris FRX) Pillias Danielle (Aulnay Sous Bois FRX) Wuest Isabelle (Paris FRX) Beaufays Jean-Pierre (Jemeppe Sur Sambre BEX) Darmont Maurice (Sambreville BEX), Process for producing a transparent layer with low resistivity.
Arfsten Nanning J. (Bischofsheim DEX) Kaufmann Reinhard (Mainz DEX) Dislich Helmut (Budenheim DEX), Process for the producing of indium oxide-tin oxide layers and the resultant coated substrates.
Timans, Paul J.; Devine, Daniel J.; Lee, Young Jai; Hu, Yao Zhi; Bordiga, Peter C., Selective reflectivity process chamber with customized wavelength response and method.
Timans, Paul J.; Devine, Daniel J.; Lee, Young Jai; Hu, Yao Zhi; Bordiga, Peter C., Selective reflectivity process chamber with customized wavelength response and method.
Yamanaka,Hideo, Semiconductor thin film forming method, production methods for semiconductor device and electrooptical device, devices used for these methods, and semiconductor device and electrooptical device.
Eshima Kohichiro,JPX ; Toishi Kouki,JPX ; Okabe Katsuaki,JPX ; Nishimura Tsuyoshi,JPX ; Sato Shinji,JPX ; Nagata Choju,JPX, Sintered ITO and an ITO sputtering target.
Inoue Katsumi,JPX ; Akao Yasuhiko,JPX ; Takaki Satoru,JPX ; Hayashi Yasuo,JPX ; Fujiwara Teruo,JPX, Transparent conductive film and method of making the film.
Joret Laurent,FRX, Transparent substrate provided with at least one thin layer based on silicone nitride or oxynitride and the process for obtaining it.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.