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Kafe 바로가기국가/구분 | United States(US) Patent 등록 |
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국제특허분류(IPC7판) |
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출원번호 | US-0688945 (2012-11-29) |
등록번호 | US-10002981 (2018-06-19) |
발명자 / 주소 |
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 | 피인용 횟수 : 0 인용 특허 : 261 |
Solar cell structures including multiple sub-cells that incorporate different materials that may have different lattice constants. In some embodiments, solar cell devices include several photovoltaic junctions.
1. A structure comprising: a semiconductor substrate;a first dielectric layer on a first surface of the semiconductor substrate, the first dielectric layer having a first trench extending to the first surface of the semiconductor substrate;a first solar subcell disposed in the first trench, the firs
1. A structure comprising: a semiconductor substrate;a first dielectric layer on a first surface of the semiconductor substrate, the first dielectric layer having a first trench extending to the first surface of the semiconductor substrate;a first solar subcell disposed in the first trench, the first solar subcell comprising a first crystalline material comprising defects terminating at respective sidewalls of the first trench, the first solar subcell further comprising a second crystalline material, the first crystalline material being disposed between the first surface of the semiconductor substrate and the second crystalline material, the second crystalline material being substantially free from defects; anda first metallic contact on the first solar subcell, at least a portion of the first metallic contact being between and in physical contact with sidewalls of the first trench. 2. The structure of claim 1, wherein the first solar subcell comprises a wetting layer disposed between the first crystalline material and the first surface of the semiconductor substrate. 3. The structure of claim 1, wherein the semiconductor substrate comprises a second solar subcell. 4. The structure of claim 1 further comprising a second metallic contact on a second surface of the semiconductor substrate, the second surface being opposite from the first surface. 5. The structure of claim 1 further comprising: a second dielectric layer on a second surface of the semiconductor substrate, the second surface being opposite from the first surface, the second dielectric layer having a second trench extending to the second surface of the semiconductor substrate;a second solar subcell disposed in the second trench, the second solar subcell comprising a third crystalline material comprising defects terminating at respective sidewalls of the second trench, the second solar subcell further comprising a fourth crystalline material, the third crystalline material being disposed between the second surface of the semiconductor substrate and the fourth crystalline material, the fourth crystalline material being substantially free from defects; anda second metallic contact on the second solar subcell, at least a portion of the second metallic contact extending into the second trench. 6. The structure of claim 5, wherein the semiconductor substrate comprises a third solar subcell. 7. The structure of claim 5, wherein: the first crystalline material and the second crystalline material each comprise InGaP,the semiconductor substrate comprises silicon,the third crystalline material comprises InP, andthe fourth crystalline material comprises InGaAs. 8. The structure of claim 5, wherein the first solar subcell comprises a bandgap of 1.82 eV or greater, wherein the semiconductor substrate comprises a third solar subcell comprising a bandgap of 1.15 eV or greater, and wherein the second solar subcell comprises a bandgap of 0.61 eV or higher. 9. The structure of claim 1, wherein the first crystalline material and the second crystalline material each comprise InGaP, and the semiconductor substrate comprises silicon. 10. The structure of claim 1, wherein the first crystalline material comprises InP, the second crystalline material comprises InGaAs, and the semiconductor substrate comprises silicon. 11. A structure comprising: a first photovoltaic sub-cell including a first semiconductor material having a first lattice constant;a second photovoltaic sub-cell formed below the first photovoltaic sub-cell, the second photovoltaic sub-cell including a second semiconductor material having a second lattice constant different from the first lattice constant;a third photovoltaic sub-cell formed below the second photovoltaic sub-cell, the third photovoltaic sub-cell including a third semiconductor material having a third lattice constant different from the second lattice constant; anda defect-trapping layer disposed between the first and second photovoltaic sub-cells and/or between the second and third photovoltaic sub-cells, the defect-trapping layer including (i) a crystalline material comprising defects arising from lattice-mismatch of the crystalline material with the second semiconductor material and (ii) a non-crystalline material having a trench, the trench having a width and a length in a plane of a surface of the second semiconductor material and a height perpendicular to the plane of the surface of the second semiconductor material, the length and the height being greater than the width, the crystalline material being disposed at least partially in the trench, the defects extending laterally and contacting sidewalls of the trench such that a portion of the crystalline material within the trench is substantially free from defects. 12. The structure of claim 11 comprising the defect-trapping layer disposed between the first and second photovoltaic sub-cells and an addition defect-trapping layer disposed between the second and third photovoltaic sub-cells. 13. A structure comprising: a semiconductor substrate;a first dielectric layer on a first surface of the semiconductor substrate, the first dielectric layer having a first plurality of trenches extending to the first surface of the semiconductor substrate;a first trapping region comprising a first crystalline material disposed in each of the first plurality of trenches, the first crystalline material comprising defects arising from a lattice-mismatch terminating at respective sidewalls of the first plurality of trenches;a second crystalline material on the first trapping region, the first trapping region being disposed between the first surface of the semiconductor substrate and the second crystalline material, the second crystalline material being substantially free from defects, the second crystalline material being at least partially below a topmost surface of the first dielectric layer, the first crystalline material and the second crystalline material forming a first solar subcell; anda first contact on the first solar subcell, the first contact comprising a first metallic material, the first contact physically contacting the respective sidewalls of the first plurality of trenches. 14. The structure of claim 13, wherein the first crystalline material and the second crystalline material are a same material. 15. The structure of claim 13 further comprising wetting regions disposed in respective ones of the first plurality of trenches and disposed between the first crystalline material and the first surface of the semiconductor substrate. 16. The structure of claim 13, wherein the semiconductor substrate comprises a second solar subcell. 17. The structure of claim 13 further comprising: a second dielectric layer on a second surface of the semiconductor substrate, the second surface being opposite from the first surface, the second dielectric layer having a second plurality of trenches extending to the second surface of the semiconductor substrate;a second trapping region comprising a third crystalline material disposed in each of the second plurality of trenches, the third crystalline material comprising defects arising from a lattice-mismatch terminating at respective sidewalls of the second plurality of trenches;a fourth crystalline material on the second trapping region, the second trapping region being disposed between the second surface of the semiconductor substrate and the fourth crystalline material, the fourth crystalline material being substantially free from defects, the third crystalline material and the fourth crystalline material forming a second solar subcell; anda second contact on the second solar subcell, the second contact comprising a second metallic material, at least a portion of the second contact extending into the second plurality of trenches. 18. The structure of claim 17, wherein the semiconductor substrate comprises a third solar subcell. 19. The structure of claim 17, wherein: the first crystalline material and the second crystalline material each comprise InGaP,the semiconductor substrate comprises silicon,the third crystalline material comprises InP, andthe fourth crystalline material comprises InGaAs. 20. The structure of claim 17, wherein the first solar subcell comprises a bandgap of 1.82 eV or greater, wherein the semiconductor substrate comprises a third solar subcell comprising a bandgap of 1.15 eV or greater, and wherein the second solar subcell comprises a bandgap of 0.61 eV or higher.
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