초록

Devices that include a near field transducer (NFT); an amorphous gas barrier layer positioned on at least a portion of the NFT; and a wear resistance layer positioned on at least a portion of the gas barrier layer.

대표청구항 ▼

1. A device having an air bearing surface (ABS), the device comprising: a near field transducer (NFT) having at least some portion thereof at the ABS of the device;an amorphous gas barrier layer positioned on at least the portion of the NFT at the ABS of the device; anda wear resistance layer positi

1. A device having an air bearing surface (ABS), the device comprising: a near field transducer (NFT) having at least some portion thereof at the ABS of the device;an amorphous gas barrier layer positioned on at least the portion of the NFT at the ABS of the device; anda wear resistance layer positioned on at least a portion of the amorphous gas barrier layer. 2. The device according to claim 1, wherein the material of the amorphous gas barrier layer has an average grain size of not greater than 3 nm. 3. The device according to claim 1, wherein the amorphous gas barrier layer has a thickness from 0.1 nm to 10 nm. 4. The device according to claim 1, wherein the amorphous gas barrier layer comprises: tantalum oxide (TaO), chromium oxide (CrO), titanium oxide (TiO), zirconium oxide (ZrO), yttrium oxide (YO), niobioum oxide (NbO), hafnium oxide (HfO), aluminum oxide (AlO), magnesium oxide (MgO), iron oxide (FeO), cobalt oxide (CoO), nickel oxide (NiO), or some combination thereof,titanium nitride (TiN), zirconium nitride (ZrN), niobioum nitride (NbN), hafnium nitride (HfN), chromium nitride (CrN), or combinations thereof; orcombinations thereof. 5. The device according to claim 1, wherein the amorphous gas barrier layer comprises magnesium oxide (MgO), iron oxide (FeO), cobalt oxide (CoO), nickel oxide (NiO), indium tin oxide (ITO), or some combination thereof. 6. The device according to claim 1, wherein the amorphous gas barrier layer comprises titanium oxide (TiO), yttrium oxide (YO), or combinations thereof. 7. The device according to claim 1, wherein the amorphous gas barrier layer comprises a first amorphous gas barrier layer and a second amorphous gas barrier layer, wherein the first amorphous gas barrier layer is closer to the NFT than the second amorphous gas barrier layer. 8. The device according to claim 7, wherein the second amorphous gas barrier layer comprises silicon oxide (SiO), germanium oxide (GeO), aluminum oxide (AlO), chromium oxide (CrO), boron oxide (BO), boron nitride (BN), silicon nitride (SiN), aluminum nitride (AlN), germanium nitride (GeN), silicon oxy nitride (SiON), aluminum oxy nitride (AlON), chromium oxy nitride (CrON), germanium oxy nitride (GeON), boron oxy nitride (BON), tantalum oxy nitride (TaON), tantalum silicon oxy nitride (TaSiON), titanium oxy nitride (TiON), zirconium oxy nitride (ZrON), hafnium oxy nitride (HfON), yttrium oxy nitride (YON), yttrium silicon oxy nitride (YSiON), or combinations thereof. 9. The device according to claim 1, wherein the amorphous gas barrier layer comprises one or more network forming elements. 10. The device according to claim 9, wherein the one or more network forming elements are selected from: silicon (Si), germanium (Ge), boron (B), phosphorus (P), aluminum (Al), and chromium (Cr). 11. The device according to claim 9, wherein the one or more network forming elements are present in the amorphous gas barrier layer in an amount from 5 atomic percent (at %) to 90 at %. 12. The device according to claim 1 further comprising at least one of a NFT adhesion layer and a wear resistance adhesion layer, wherein the NFT adhesion layer is positioned between the NFT and the amorphous gas barrier layer and the wear resistance adhesion layer is positioned between the amorphous gas barrier layer and the wear resistance layer. 13. The device according to claim 1 further comprising both a NFT adhesion layer and a wear resistance adhesion layer, wherein the NFT adhesion layer is positioned between the NFT and the amorphous gas barrier layer and the wear resistance adhesion layer is positioned between the amorphous gas barrier layer and the wear resistance layer. 14. A device having an air bearing surface (ABS), the device comprising: a near field transducer (NFT) having at least some portion thereof at the ABS of the device;an amorphous gas barrier layer positioned on at least the portion of the NFT at the ABS of the device;a NFT adhesion layer positioned between the NFT and the amorphous gas barrier layer; anda wear resistance layer positioned on at least a portion of the amorphous gas barrier layer. 15. The device according to claim 14, wherein the material of the amorphous gas barrier layer has an average grain size of not greater than 3 nm. 16. The device according to claim 14, wherein the amorphous gas barrier layer has a thickness from 0.1 nm to 10 nm. 17. The device according to claim 14, wherein the amorphous gas barrier layer comprises: tantalum oxide (TaO), chromium oxide (CrO), titanium oxide (TiO), zirconium oxide (ZrO), yttrium oxide (YO), niobioum oxide (NbO), hafnium oxide (HfO), aluminum oxide (AlO), magnesium oxide (MgO), iron oxide (FeO), cobalt oxide (CoO), nickel oxide (NiO), or some combination thereof,titanium nitride (TiN), zirconium nitride (ZrN), niobioum nitride (NbN), hafnium nitride (HfN), chromium nitride (CrN), or combinations thereof; orcombinations thereof. 18. The device according to claim 14, wherein the amorphous gas barrier layer comprises titanium oxide (TiO), yttrium oxide (YO), or combinations thereof. 19. A method comprising: forming a near field transducer (NFT) having at least a portion thereof at an air bearing surface (ABS) of a device;forming an amorphous gas barrier layer on at least the portion of the NFT at the ABS of the device by depositing a metal layer and subsequently oxidizing at least part of the metal layer, the metal layer comprising: tantalum (Ta), titanium (Ti), chromium (Cr), zirconium (Zr), yttrium (Y), magnesium (Mg), niobium (Nb), hafnium (Hf), aluminum (Al), and combinations thereof; andforming a wear resistance layer on the gas barrier layer. 20. The method according to claim 19 further comprising repeating the steps of depositing a metal and subsequently oxidizing at least part of the metal layer.