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Plasma spray coating for sealing a defect area in a workpiece 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B44C-001/22
  • C03C-015/00
  • C03C-025/68
  • C23F-001/00
  • C23C-004/134
  • C23C-004/01
  • H01J-037/32
  • C23C-004/18
출원번호 US-0423954 (2017-02-03)
등록번호 US-10041163 (2018-08-07)
발명자 / 주소
  • Offer, Henry Peter
  • Keck, David Jonathan
  • Horn, Ronald Martin
출원인 / 주소
  • GE-HITACHI NUCLEAR ENERGY AMERICAS LLC
대리인 / 주소
    Harness, Dickey & Pierce, P.L.C.
인용정보 피인용 횟수 : 0  인용 특허 : 65

초록

A method for applying a coating to a defect area of a reactor component includes forming a patch on the reactor component at the defect area using a plasma-spray coating process. The plasma-spray coating process includes grounding the reactor component and a power supply of a plasma gun to a common

대표청구항

1. A method for applying a coating to a defect area of a reactor component, the method comprising: arranging a plasma gun to face a region of the reactor component that includes at least a portion of the defect area such that the plasma gun and the region of the reactor component are separated by a

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