Wrinkled surfaces with tunable hierarchy and methods for the preparation thereof
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B32B-003/00
B29C-059/02
B29C-033/38
B29C-033/42
B29C-039/26
B29C-059/18
B29C-071/02
B29L-031/00
B29K-083/00
출원번호
US-0669925
(2015-03-26)
등록번호
US-10052811
(2018-08-21)
발명자
/ 주소
Saha, Sourabh Kumar
Culpepper, Martin Luther
출원인 / 주소
SORURABH KUMAR SAHA
인용정보
피인용 횟수 :
0인용 특허 :
5
초록▼
This invention relates to the low-cost manufacture of a tunable physical topographic pattern and more particularly to the manufacture of micro and nano scale hierarchical periodic wrinkle patterns that are generated upon compression of supported thin films. Disclosed herein is (i) a composite materi
This invention relates to the low-cost manufacture of a tunable physical topographic pattern and more particularly to the manufacture of micro and nano scale hierarchical periodic wrinkle patterns that are generated upon compression of supported thin films. Disclosed herein is (i) a composite material with tunable hierarchical wrinkle patterns, wherein the composite material comprises a stretched and pre-patterned base layer and a thin film that is conformally attached to the pre-patterned surface of the base layer, (ii) a method of fabricating the pre-patterned base via pattern replication, and (iii) a method of fabricating tunable hierarchical wrinkle patterns, wherein the pattern can be deterministically switched across the hierarchical and non-hierarchical states via strain control.
대표청구항▼
1. A strain-tunable composite material that demonstrates tunable hierarchy of wrinkle patterns, comprising: a bilayer in a state of strain with a topographically pre-patterned and pre-stretched base layer and a thin film on top of the base layer;wherein the topographical pre-pattern of the base laye
1. A strain-tunable composite material that demonstrates tunable hierarchy of wrinkle patterns, comprising: a bilayer in a state of strain with a topographically pre-patterned and pre-stretched base layer and a thin film on top of the base layer;wherein the topographical pre-pattern of the base layer is periodic with a period that is different from the natural period of the bilayer;wherein the thin film is joined to and forms a conformal coating on top of the pre-patterned surface of the base layer;wherein the bilayer has a predetermined state of strain in the configuration when no prestretch in the pre-patterned base layer has been released; andwherein the predetermined state of strain in the bilayer is a state in which the thin film is free of compressive strain and the tensile strain in the base layer along the direction of periodicity of the topographical pre-pattern is above a non-zero critical strain. 2. The composite material of claim 1, wherein the period of the pre-pattern is not equal to the natural period and is 0.01-100 times that of the natural period. 3. The composite material of claim 1, wherein the critical strain is determined by the mathematical relationship: εt=12m2(1+2m3)[πAp/{λp(1+2m3−3m2)}]2; andwherein ‘εt’ is the critical strain, ‘m’ is the ratio of period of pre-pattern to natural period, ‘Ap’ is amplitude of the pre-pattern and ‘λp’ is the period of the pre-pattern. 4. The composite material of claim 1, wherein the strain in the base layer is along a single axis. 5. The composite material of claim 1, wherein the periodic pre-pattern comprises sinusoidal patterns. 6. The composite material of claim 1, wherein the direction of periodicity of the topographical pre-pattern is aligned along a direction of stretch of the base layer. 7. The composite material of claim 1, wherein the direction of periodicity of the topographical pre-pattern is aligned at an angle to a direction of stretch of the base layer. 8. The composite material of claim 1, wherein the strain in the base layer is along two different axes. 9. A method of making a strain-tunable composite material that is in the form of a bilayer with a base layer and a top film and wherein the bilayer demonstrates tunable hierarchy of wrinkle patterns, comprising the steps of: providing a topographically pre-patterned base layer, wherein the topographical pattern is periodic with a period that is different from the natural period of the bilayer;stretching the pre-patterned base layer, wherein the strain in the base layer along the direction of periodicity of the topographical pattern is above a non-zero critical strain, thereby forming a pre-stretched and pre-patterned base layer;growing or attaching a thin film on top of the pre-stretched and pre-patterned base layer, wherein the film conforms to the pre-patterned surface and is free of compressive strain, thereby forming a composite pre-patterned material comprising a thin film on top of a pre-stretched and pre-patterned base layer; andreleasing the strain in the base layer along the direction of periodicity of the topographical pre-pattern, wherein releasing the strain by an amount less than the critical strain causes the amplitude of the pre-pattern to increase, whereas releasing the strain by an amount more than the critical strain causes the thin film to buckle into a periodic pattern with the same period as the natural period and with its direction of periodicity oriented along the direction of the released strain, thereby demonstrating tunable hierarchy of wrinkle patterns. 10. Method of claim 9, wherein the period of the pre-pattern is not equal to the natural period and is 0.01-100 times the natural period. 11. Method of claim 9, wherein the thin film is grown on top of the pre-patterned base layer by exposing it to plasma. 12. Method of claim 9, wherein the thin film is grown on top of the pre-patterned base layer by physical or chemical vapor deposition. 13. Method of claim 9, wherein the critical strain is determined by the mathematical relationship: εt=12m2(1+2m3)[πAp/{λp(1+2m3−3m2)}]2; andwherein ‘εt’ is the critical strain, ‘m’ is the ratio of period of pre-pattern to natural period, ‘Ap’ is amplitude of the pre-pattern and ‘λp’ is the period of the pre-pattern. 14. An article comprising tunable hierarchical wrinkle patterns formed by the method of claim 9. 15. The composite material of claim 1, wherein the base layer is a replica of a wrinkled surface. 16. The composite material of claim 1, wherein the material of the base layer is polydimethylsiloxane (PDMS). 17. The composite material of claim 1, wherein the thin film is in the form of a plasma exposed top layer of the base layer. 18. The composite material of claim 1, wherein the wrinkle patterns are reversible and revert back to the pre-pattern when the base layer is stretched back to its initial pre-stretched state. 19. The method of claim 9, wherein the topographically pre-patterned base layer is fabricated by replicating a wrinkled surface onto a base substrate. 20. The method of claim 9, further comprising the step of further releasing the stretch in the base layer or stretching the base layer, wherein further releasing the stretch causes an increase in the amplitude of the wrinkle pattern, whereas stretching the base layer back to its initial pre-stretched state causes the hierarchical wrinkle pattern to revert back to the pre-pattern. 21. The method of claim 9, wherein the material of the base layer is polydimethylsiloxane (PDMS). 22. The method of claim 9, wherein the base layer is stretched along a single axis. 23. The method of claim 9, wherein the periodic pre-pattern comprises sinusoidal patterns.
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이 특허에 인용된 특허 (5)
Rogers,John A.; Menard,Etienne, Composite patterning devices for soft lithography.
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