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특허 상세정보

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Regulated vacuum off-gassing of gas filter for fluid processing system and related methods

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B01D-005/00    C12M-001/00    B01D-046/00    B01D-046/44    B01D-019/00    B01D-053/26    C12M-001/34    C12M-001/36   
출원번호 US-0249781 (2016-08-29)
등록번호 US-10059916 (2018-08-28)
발명자 / 주소
  • Jones, Nephi D.
  • Brau, Christopher D.
출원인 / 주소
  • Life Technologies Corporation
대리인 / 주소
    Workman Nydegger
인용정보 피인용 횟수 : 0  인용 특허 : 55
초록

A method for filtering a gas includes delivering a gas into a compartment of a gas filter, the compartment being at least partially bounded by a casing comprised of a flexible sheet of polymeric film. A partial vacuum is applied to the gas filter so that the partial vacuum assists in drawing the gas through a porous filter body of the gas filter that is at least partially disposed within the compartment of the gas filter.

대표
청구항
▼

1. A method for filtering a gas, the method comprising: delivering a gas into a compartment of a gas filter assembly, the compartment being at least partially bounded by a casing comprised of a flexible sheet of polymeric film; andapplying a partial vacuum to the gas filter assembly so that the partial vacuum assists in drawing the gas through a porous filter body of the gas filter assembly that is at least partially disposed within the compartment of the gas filter assembly. 2. The method for filtering as recited in claim 1, further comprising sparging ...

인용문헌 (55)

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