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특허 상세정보

Antimicrobial fabric application system

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) A61L-009/00    A61L-002/00    B08B-003/00    D06F-039/02    D06M-023/10    A01N-059/16    D06F-035/00   
출원번호 US-0629282 (2017-06-21)
등록번호 US-10087568 (2018-10-02)
발명자 / 주소
출원인 / 주소
대리인 / 주소
    McDonnell Boehnen Hulbert & Berghoff LLP
인용정보 피인용 횟수 : 0  인용 특허 : 72
초록

An antimicrobial supply system employs a process water supply and incorporates a metallic ion supply connected to the process water supply to provide a high ion concentrate to an output. A dilution reservoir is connected to the metallic ion supply output and has an input from the process water supply. A pump is connected to an output of the reservoir. A manifold connected to the pump provides a dilute concentrate to at least one washing system. An electronics control module is connected to a first flow controller between the process water supply and the ...

대표
청구항

1. A method for infusing a metallic ion into a textile, comprising: supplying, from a metallic ion supply, a high ion concentrate to a dilution reservoir connected to the metallic ion supply,wherein supplying the high ion concentrate comprises: receiving, by a metering pump, the high ion concentrate from a feed line of the metallic ion supply extending from a receiver of metallic ion supply, which engages a connection interface of a leak proof container, andoutputting, using the metering pump via a conduit of the metallic ion supply, a metered quantity o...

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