Chelating base product for use in water-based system treatments
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
C02F-001/68
C02F-101/10
출원번호
US-0388767
(2016-12-22)
등록번호
US-10093564
(2018-10-09)
발명자
/ 주소
Nicholas, David
Bowman, Reid Henry
Singleton, Freddie L.
출원인 / 주소
Earth Science Laboratories
대리인 / 주소
Kilpatrick Townsend & Stockton LLP
인용정보
피인용 횟수 :
0인용 특허 :
13
초록▼
A base product fluid is produced by adding anhydrous liquid ammonia and a first portion of sulfuric acid to water in a process line to form a mixed fluid. The mixed fluid may be cooled and a second portion of sulfuric acid may be added to the mixed fluid to form the base product fluid. The base prod
A base product fluid is produced by adding anhydrous liquid ammonia and a first portion of sulfuric acid to water in a process line to form a mixed fluid. The mixed fluid may be cooled and a second portion of sulfuric acid may be added to the mixed fluid to form the base product fluid. The base product fluid may include a molecular compound that is a chelating compound. The molecular compound may have the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x. In the formula, a may be between 1 and 5, b may be between 1 and 5, c may be between 0 and 5, and x may be between 1 and 20.
대표청구항▼
1. A chelating compound having the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x;wherein a is between 1 and 5, b is between 1 and 5, c is between 0 and 5, and x is between 1 and 20. 2. The chelating compound of claim 1, wherein the chelating compound is crystalline. 3. The chelating compound of c
1. A chelating compound having the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x;wherein a is between 1 and 5, b is between 1 and 5, c is between 0 and 5, and x is between 1 and 20. 2. The chelating compound of claim 1, wherein the chelating compound is crystalline. 3. The chelating compound of claim 1, wherein the chelating compound is hydroscopic. 4. The chelating compound of claim 1, wherein the chelating compound is capable of chelating a metal salt. 5. The chelating compound of claim 4, wherein the metal salt comprises a salt of zinc, magnesium, manganese, selenium, molybdenum, iron, boron, cobalt, copper, bismuth, or combinations thereof. 6. The chelating compound of claim 1, wherein the chelating compound has a pH below about 2 when mixed with water. 7. The chelating compound of claim 1, wherein the nitrogen atoms in the chelating compound have an oxidation state of −3. 8. The chelating compound of claim 1, wherein the sulfur atoms in the chelating compound have an oxidation state of +6. 9. A chelating compound having the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x;wherein a is at least 1, b is at least 1, c is at least 0, and x is between 1 and 20; andwherein the chelating compound comprises an elemental composition of: between about 3% and 6% hydrogen;between about 10% and about 15% nitrogen;between about 25% and about 30% sulfur; andbetween about 52% and about 60% oxygen. 10. The chelating compound of claim 9, wherein the chelating compound is crystalline. 11. The chelating compound of claim 9, wherein a is between 1 and 5, b is between 1 and 5, c is between 0 and 5, and x is between 1 and 20. 12. The chelating compound of claim 9, wherein the chelating compound is hydroscopic. 13. The chelating compound of claim 9, wherein the chelating compound is capable of chelating a metal salt. 14. The chelating compound of claim 13, wherein the metal salt comprises a salt of zinc, magnesium, manganese, selenium, molybdenum, iron, boron, cobalt, copper, bismuth, or combinations thereof. 15. The chelating compound of claim 9, wherein the chelating compound has a pH below about 2 when mixed with water. 16. The chelating compound of claim 9, wherein the nitrogen atoms in the chelating compound have an oxidation state of −3. 17. The chelating compound of claim 9, wherein the sulfur atoms in the chelating compound have an oxidation state of +6. 18. A chelating compound having the formula: ((NH4)2SO4)a.(H2SO4)b.(H2O)c.(NH4HSO4)x;wherein a is at least 1, b is at least 1, c is at least 0, and x is between 1 and 20; andwherein the chelating compound has a pH below about 2 when mixed with water.
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이 특허에 인용된 특허 (13)
Cummins Barry W., Acidic composition of matter for use to destroy microorganisms.
Achorn Frank P. (Florence AL) Lewis ; Jr. Josiah S. (Florence AL), Granular ammonium phosphate sulfate and monoammonium phosphate using common pipe-cross-type reactor.
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