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A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent; wherein Ri41 represents a hydrogen atom or a methyl group, Ri42 represents a C1 to C10 hydrocarbon group that may be substituted with a

A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent; wherein Ri41 represents a hydrogen atom or a methyl group, Ri42 represents a C1 to C10 hydrocarbon group that may be substituted with a hydroxy group, a C2 to C7 acyl group or a hydrogen atom, Ri43 in each occurrence independently represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group, “p” represents an integer of 0 to 4, Z represents a divalent C3 to C20 hydrocarbon group having a group represented by formula (Ia), and a methylene group contained in the hydrocarbon group may be replaced by an oxygen atom, a sulfur atom or a carbonyl group, *—(CH2)w—Or— (Ia): wherein “w” and “r” each independently represents an integer of 1 to 10, and * represent a bonding position.

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1. A resist composition comprising: a resin having an acid-labile group but not having a structural unit represented by formula (I),a resin consisting of the structural unit represented by formula (I) and a structural unit selected from the group consisting of a structural unit represented by formul

1. A resist composition comprising: a resin having an acid-labile group but not having a structural unit represented by formula (I),a resin consisting of the structural unit represented by formula (I) and a structural unit selected from the group consisting of a structural unit represented by formula (a2-1), a structural unit represented by formula (a2-2) and a structural unit represented by formula (a2-3),an acid generator, anda solvent: wherein Ri41 represents a hydrogen atom or a methyl group,Ri42 represents a C2 to C7 acyl group or a hydrogen atom, or a C1 to C10 hydrocarbon group in which a hydrogen atom can be replaced by a hydroxy group,Ri43 in each occurrence independently represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group,“p” represents an integer of 0 to 4,Z represents a divalent C3 to C20 hydrocarbon group having a group represented by formula (Ia), and a methylene group contained in the hydrocarbon group may be replaced by an oxygen atom, a sulfur atom or a carbonyl group: *—[(CH2)w—O]r—  (Ia)wherein “w” and “r” each independently represents an integer of 1 to 10, and* represent a bonding position, provided that Ri42 represents a C2 to C7 acyl group when “w” represents 1, where Ra7, Ra8 and Ra9 each independently represent a hydrogen atom or a methyl group,Ra10 in each occurrence independently represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group,m′ represents an integer of 0 to 4,Ra11 represents a hydrogen atom, a C1 to C10 primary or secondary hydrocarbon group,Ra12 represents a C1 to C6 primary or secondary alkyl group,La1 represents a C2 to C6 alkanediyl group where the carbon atom bonding to an oxygen atom is a primary or secondary carbon atom, andn represents an integer of 1 to 30; andwherein the structural unit represented by formula (I) is a structural unit represented by formula (I-1) or formula (I-2): wherein Ri41 represents a hydrogen atom or a methyl group,Ri42 represents a C1 to C10 hydrocarbon group that may be substituted with a hydroxy group, a C2 to C7 acyl group or a hydrogen atom,Ri43 in each occurrence independently represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group,“p” represents an integer of 0 to 4,Ri44 represents a C1 to C10 hydrocarbon group,“r” represents an integer of 1 to 10, andRi45 represents a C1 to C10 hydrocarbon group that may be substituted with a hydroxy group, a C2 to C7 acyl group or a hydrogen atom. 2. The resist composition according to claim 1 wherein the resin having an acid-labile group is a resin having a structural unit represented by formula (a1-2): wherein Ra5 represents a hydrogen atom or a methyl group,Ra1′ and Ra2′ each independently represent a hydrogen atom or a C1 to C12 hydrocarbon group, Ra33′ represents a C1 to C20 hydrocarbon group, or Ra1′ represents a hydrogen atom or a C1 to C12 hydrocarbon group, and Ra2′ and Ra33′ are bonded together with a carbon atom and an oxygen atom bonded thereto to form a divalent heterocyclic group having 2 to 20 carbon atoms, and a methylene group contained in the hydrocarbon group represented by Ra1′ and Ra2′ or the divalent heterocyclic group may be replaced by an oxygen atom or a sulfur atom,Ra6 in each occurrence independently represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group, and“mz” represents an integer of 0 to 4. 3. The resist composition according to claim 1 wherein the acid generator is a compound having a group represented by formula (B1): wherein Rb1 represents a C1 to C18 hydrocarbon group in which a hydrogen atom may have a fluorine atom and in which a methylene group may be replaced by an oxygen atom or a carbonyl group. 4. A method for producing a resist pattern comprising steps (1) to (4): (1) applying the resist composition according to claim 1 onto a substrate;(2) drying the applied composition to form a composition layer;(3) exposing the composition layer; and(4) developing the exposed composition layer. 5. A resin comprising a structural unit represented by formula (1-2): wherein Ri41 represents a hydrogen atom or a methyl group,Ri43 in each occurrence independently represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group,“p” represents an integer of 0 to 4,Ri44 represents a C1 to C10 hydrocarbon group,“r” represents an integer of 1 to 10, andRi45 represents a C1 to C10 hydrocarbon group that may be substituted with a hydroxy group, a C2 to C7 acyl group or a hydrogen atom.