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특허 상세정보

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Method and apparatus for adding thermal energy to a glass melt

특허상세정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) C03B-005/02    C03B-005/225    H05H-001/24    H05H-001/46    C03C-003/06    C03C-003/062    C03C-003/064    C03C-003/078    C03C-003/083    C03C-003/085    C03C-003/087    C03C-003/089    C03C-003/091    C03C-003/12    C03C-003/145    H05B-007/08    H05B-007/12    H05B-007/22    H05H-001/28    H05H-001/30    H05H-001/34    H05H-001/50    C03B-005/185    C03B-005/193   
출원번호 US-0425517 (2017-02-06)
등록번호 US-10167220 (2019-01-01)
발명자 / 주소
  • Boughton, Daniel Robert
  • Jarvis, Scott Michael
출원인 / 주소
  • Corning Incorporated
인용정보 피인용 횟수 : 0  인용 특허 : 75
초록
▼

Disclosed herein are methods and apparatuses for adding thermal energy to a glass melt. Apparatuses for generating a thermal plasma disclosed herein comprise an electrode, a grounded electrode, a dielectric plasma confinement vessel extending between the two electrodes, and a magnetic field generator extending around the dielectric plasma confinement vessel. Also disclosed herein are methods for fining molten glass comprising generating a thermal plasma using the apparatuses disclosed herein and contacting the molten glass with the thermal plasma. Glass ...

대표
청구항
▼

1. A method for fining molten glass comprising: introducing a gas into an apparatus for generating a thermal plasma by a radio frequency (RF) electromagnetic field, the apparatus comprising: an electrode,a grounded electrode,a dielectric plasma confinement vessel extending between the electrode and the grounded electrode,a magnetic field generator extending around the dielectric plasma confinement vessel,an inlet for delivering a gas into the dielectric plasma confinement vessel,an RF current source to create the RF electromagnetic field for converting t...

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