Process for near-infrared-driven decomposition of metal precursors for the formation of amorphous metal and metal oxide films
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01J-023/652
B01J-023/72
B01J-023/74
B01J-023/89
B01J-037/34
B01J-035/00
C25B-011/04
C25B-009/10
B01J-037/02
B01J-023/08
B01J-023/14
B01J-023/24
B01J-023/34
B01J-023/46
B01J-023/70
B01J-023/745
B01J-023/75
C25B-001/04
H01M-004/90
B01J-037/12
B01J-027/135
출원번호
US-0539074
(2015-12-21)
등록번호
US-10173210
(2019-01-08)
국제출원번호
PCT/CA2015/051354
(2015-12-21)
국제공개번호
WO2016/101067
(2016-06-30)
발명자
/ 주소
Berlinguette, Curtis
Salvatore, Danielle
Dettlebach, Kevan
Hudkins, Jesse
출원인 / 주소
Click Materials Corp.
대리인 / 주소
Howard & Howard Attorneys PLLC
인용정보
피인용 횟수 :
0인용 특허 :
3
초록▼
The present invention provides a method for making materials and electrocatalytic materials comprising amorphous metals or metal oxides. This method provides a scalable preparative approach for accessing state-of-the-art electrocatalyst films, as demonstrated herein for the electrolysis of water, an
The present invention provides a method for making materials and electrocatalytic materials comprising amorphous metals or metal oxides. This method provides a scalable preparative approach for accessing state-of-the-art electrocatalyst films, as demonstrated herein for the electrolysis of water, and extends the scope of usable substrates to include those that are non-conducting and/or three-dimensional electrodes.
대표청구항▼
1. A process for forming an amorphous metal-containing electrocatalytic film, the process comprising the steps of: a) providing a substrate, wherein the substrate is glass, fluorine-doped tin oxide-coated glass, perfluorinated polymer membrane, a synthetic polymer, a metallic substrate, plastic, gla
1. A process for forming an amorphous metal-containing electrocatalytic film, the process comprising the steps of: a) providing a substrate, wherein the substrate is glass, fluorine-doped tin oxide-coated glass, perfluorinated polymer membrane, a synthetic polymer, a metallic substrate, plastic, glassy carbon or stainless steel;b) coating the substrate with a metal precursor solution; andc) exposing the coated substrate to near-infrared radiation to form the amorphous metal-containing film. 2. The process according to claim 1, wherein the amorphous metal-containing film is an amorphous metal oxide, an amorphous mixed metal oxide, an amorphous metal, or an amorphous mixed metal. 3. The process according to claim 1, wherein the amorphous metal-containing film comprises a metal selected from iron, iridium, manganese, nickel, copper, ruthenium, cobalt, tungsten, indium, tin, molybdenum, or any combination thereof. 4. The process according to claim 1, wherein the metal precursor is a metal salt. 5. The process according to claim 4, wherein the metal salt is MClxor M(NO3)x, where x is 2 or 3. 6. The process according to claim 4, wherein the metal salt is selected from the group consisting of FeCI3, Fe(NO3)3, IrCl3, NiCl2, Ni(NO3)2, Fe2Ni3Cl, CoCl2, RuCl3, CuCl2, and WCl6. 7. The process according to claim 1, wherein the metal precursor is a metal coordination complex. 8. The process according to claim 7, wherein the metal coordination complex is a 2-ethylhexanoate derivative or an acetylacetonate derivative. 9. The process according to claim 7, wherein the metal coordination complex is selected from the group consisting of Fe(eh)3, Cu(eh)2, lr(acac)3, Ni(eh)2, Mn(eh)3, Co(eh)2, Mo(eh)2, Sn(eh)2, In(acac)3, and Fe2Ni3(eh)3. 10. The process according to claim 1, wherein the step of exposing the coated substrate to near-infrared radiation is conducted in an oxidizing atmosphere. 11. The process according to claim 10, wherein the amorphous metal-containing film comprises α-FeOx, α-IrOx, α-NiOx, α-MnOx, -α-Fe2Ni3Ox α-CuOx, α-CoOx, α-MoOx, α-SnOx, αInOx, α-RuOx, or α-WOx. 12. The process according to claim 1, wherein the step of exposing the coated substrate to near-infrared radiation is conducted in an inert atmosphere. 13. The process according to claim 12, wherein the amorphous metal-containing film comprises α-Fe, α-Cu, α-Fe2Ni3, α-Ni, or α-Mn. 14. The process according to claim 1, further comprising the step of tuning the properties of the electrocatalytic film. 15. The process according to claim 14, wherein the tuning step comprises annealing the metal oxide film.
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이 특허에 인용된 특허 (3)
Hill Ross H. (Coquitlam GA CAX) Palmer Bentley J. (Athens GA) Avey ; Jr. Alfred A. (Burnaby CAX) Blair Sharon L. (Vancouver CAX) Chu Chu-Hui W. (Burnaby CAX) Gao Meihua (Burnaby CAX) Law Wai L. (Port, Method for directly depositing metal containing patterned films.
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