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Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65D-025/14
  • C23C-016/30
  • C23C-016/36
  • C23C-016/40
  • C23C-016/04
  • C23C-016/507
  • A61M-005/31
  • A61J-001/05
출원번호 US-0357418 (2012-11-09)
등록번호 US-10189603 (2019-01-29)
국제출원번호 PCT/US2012/064489 (2012-11-09)
국제공개번호 WO2013/071138 (2013-05-16)
발명자 / 주소
  • Felts, John T.
  • Fisk, Thomas E.
  • Abrams, Robert S.
  • Ferguson, John
  • Freedman, Jonathan R.
  • Pangborn, Robert J.
  • Sagona, Peter J.
  • Weikart, Christopher
출원인 / 주소
  • SIO2 MEDICAL PRODUCTS, INC.
대리인 / 주소
    McAndrews, Held & Malloy, Ltd.
인용정보 피인용 횟수 : 0  인용 특허 : 604

초록

A method for providing a passivation layer or pH protective coating on a substrate surface by PECVD is provided, the method comprising generating a plasma from a gaseous reactant comprising polymerizing gases. The lubricity, passivation, pH protective, hydrophobicity, and/or barrier properties of th

대표청구항

1. A filled package comprising: a vessel having a lumen defined at least in part by a wall, the wall having an interior surface facing the lumen and an outer surface; a barrier coating or layer of SiOx, wherein x is from 1.5 to 2.9, from 2 to 1000 nm thick, the barrier coating or layer of SiOx havin

이 특허에 인용된 특허 (604)

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  180. Kanno, Masahiro, Etching apparatus and etching method.
  181. Iacovangelo, Charles D.; Miebach, Thomas; Mercedes, Michael W.; Gasworth, Steven M.; Haag, Michael R., Expanding thermal plasma deposition system.
  182. Cathey David A. ; Browning Jimmy J. ; Xia Zhong-Yi, Fabrication of field emission array with filtered vacuum cathodic arc deposition.
  183. Deak Gedeon I. (Wilmington DE) Jackson Scott C. (Kennett Square PA), Film coated with glass barrier layer with metal dopant.
  184. Miyazaki Takao (Tokyo JPX) Yamada Yoshiro (Tokyo JPX) Komine Isamu (Tokyo JPX), Film thickness-measuring apparatus.
  185. Aitken, Bruce Gardiner; Bookbinder, Dana Craig; Garner, Sean Matthew; Quesada, Mark Alejandro, Flexible substrates having a thin-film barrier.
  186. Sanger Robert J. (Park Ridge IL) Metro Stephen M. (Chicago IL) Masterson Brian K. (Placerville CA), Flow cell with leakage detection.
  187. Nakajima Takeshi (Tokyo JPX), Flow dividing structure of mass flow controller.
  188. Drexel Charles F. (Rolling Hills CA) Mudd Daniel T. (St. Charles MO), Flowmeter.
  189. Pinkerton Robert N. ; Ifft Stephen A., Fluid flow meter and mixer having removable and replaceable displacement member.
  190. DeRoos, Fred L.; Mueller, Mark E.; Roehrig, Mark A., Fluid permeation testing apparatus employing mass spectrometry.
  191. DeRoos, Fred L.; Mueller, Mark E.; Roehrig, Mark A., Fluid permeation testing method employing mass spectrometry.
  192. Sung Ryong Kim KR; Sung Chul Park KR; Jun Seob Song KR, Fluorinated resins having a surface with high wettability.
  193. Gleason, Karen K.; Murthy, Shashi K., Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament chemical vapor deposition.
  194. Komada, Minoru, Gas barrier film.
  195. Komada,Minoru, Gas barrier film.
  196. Thomas R. Mallen ; Thomas A. Stevenson, Gas barrier polymer composition.
  197. Tetsuya Ishikawa ; Padmanabhan Krishnaraj ; Feng Gao ; Alan W. Collins ; Lily Pang, Gas distribution system for a CVD processing chamber.
  198. Eckhardt Richard (c/o ECD Corp. ; 196 Broadway Cambridge MA 02139), Gas flow metering.
  199. Nomura Hiroshi (Minnetonka MN), Gas permselective composite membrane prepared by plasma polymerization coating techniques.
  200. Nomura Hiroshi (Shorewood MN), Gas plasma polymerized permselective membrane.
  201. Walther, Marten; Geiger, Andreas; Auchter-Krummel, Petra; Spallek, Michael, Glass container for medicinal purposes.
  202. Spallek Michael,DEX ; Walther Marten,DEX ; Geiger Andreas,DEX, Glass containers which may be sterilized for medical purposes, in particular for the storage of pharmaceutical or diagnostic products.
  203. Venkatraman Chandra ; Brodbeck Cyndi, Hardcoats for flat panel display substrates.
  204. Aiyer,Arun Ananth; Meloni,Mark A.; Harvey,Kenneth C.; Kueny,Andrew Weeks, Heterodyne reflectometer for film thickness monitoring and method for implementing.
  205. Fan Yuh-Da,TWX ; Fang Weng-Liang,TWX, High density plasma (HDP) etch method for suppressing micro-loading effects when etching polysilicon layers.
  206. Campbell Gregor A. (Glendale CA) Conn Robert W. (Los Angeles CA) Katz Dan (Beverly Hills CA) Parker N. William (Fairfield CA) de Chambrier Alexis (Glendale CA), High density plasma deposition and etching apparatus.
  207. Ohno Yasunori (Hitachi JPX) Kurosawa Tomoe (Hitachi JPX) Sato Tadashi (Mito JPX) Ohshita Youichi (Hitachi JPX), High frequency plasma generation apparatus.
  208. Gold Nathan (Redwood City CA) Willenborg David L. (Dublin CA) Opsal Jon (Livermore CA) Rosencwaig Allan (Danville CA), High resolution ellipsometric apparatus.
  209. Petrmichl Rudolph Hugo (Center Valley PA) Knapp Bradley J. (Kutztown PA) Kimock Fred M. (Macungie PA) Daniels Brian Kenneth (Emmaus PA), Highly abrasion-resistant, flexible coatings for soft substrates.
  210. Konrad Franz,ATX, Holding device for a blood sample removal tubule of a blood removal device.
  211. Konrad,Franz, Holding device for a medical device.
  212. Konrad Franz,ATX, Holding device for body fluids and tissues.
  213. Konrad Franz,ATX, Holding device with a cylindrical container and blood sampling tube with such a holding device.
  214. Konrad,Franz, Holding device, particularly for bodily fluids, comprising a separating device, and a separating device therefor.
  215. Plester George,BEX, Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization.
  216. Plester George,BEX ; Ehrich Horst,DEX ; Rule Mark, Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the co.
  217. Mehta Rajendra K. (Hampton NJ), Hot-fillable plastic containers.
  218. Yializis, Angelo, Hybrid polymer film.
  219. Brown, James F., Hydrophobic formulations and vessel surfaces comprising same.
  220. Sato Masao,JPX, In-line fluorescent x-ray film thickness monitor.
  221. Xia,Li Qun; Xu,Huiwen; Witty,Derek R.; M'Saad,Hichem, In-situ oxide capping after CVD low k deposition.
  222. Mesa C. Michael (Boyds MD) Dalling N. Lawrence (Cross Junction VA) Lowery Sandra A. (St. Charles MO) Monroe O. Napoleon (Bethesda MD), Injection device having polyparaxylylene coated container.
  223. S��rensen,Anne; Buch Rasmussen,Thomas; N��sted,Ulrik, Injection-moulded stopper for medical containers.
  224. Goto, Seiji; Yamakoshi, Hideo; Ueda, Atsushi; Okamoto, Kenichi; Asahara, Yuji; Danno, Minoru, Inner electrode for barrier film formation and apparatus for film formation.
  225. Sagi Nehemiah Hemi ; Zhang Guosen Ronald ; Ghosh Ranajit Rana, Intelligent gas flow measurement and leak detection apparatus.
  226. Sakemi Toshiyuki,JPX ; Tanaka Masaru,JPX, Ion plating apparatus.
  227. Williams Joel L. (Cary NC) Martin David A. (Raleigh NC) Montgomery David B. (Cary NC), Ionizing plasma lubricant method.
  228. Domine,Joseph D.; Valentage,Jeffrey; Meka,Prasadarao, Ionomer laminates and articles formed from ionomer laminates.
  229. Smallhorn Edward A. (Dartmouth CAX) Oliver John B. (Dartmouth CAX), Laminar flow element.
  230. Huang Yufeng ; Alvesteffer William J. ; Outlaw Ronald A., Laminar flow element with inboard sensor taps and coaxial laminar flow guides.
  231. Moelle, Christoph; Bewig, Lars; Koppe, Frank; Kuepper, Thomas; Geisler, Stefan; Bauer, Stefan; Dzick, Juergen; Henn, Christian, Layer system.
  232. Ushio Yoshijiro,JPX ; Ueda Takehiko,JPX, Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same.
  233. Ushio, Yoshijiro; Ueda, Takehiko, Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same.
  234. Ushio,Yoshijiro; Ueda,Takehiko, Layer-thickness detection methods and apparatus for wafers and the like, and polishing apparatus comprising same.
  235. Lubrecht, Thea E., Low silicone plastic prefillable syringe.
  236. Rose, Peter; Lopata, Eugene; Felts, John, Low κ dielectric inorganic/organic hybrid films and method of making.
  237. Tingey Kevin G. (So. Sandy UT) Williamitis Victor A. (Dayton OH) Daugherty Charles W. (Jamestown OH) Lambert Jeanne E. (Conyers GA) Mersch Steven H. (Germantown OH), Lubricant soluble fluorescent agent and method for its use in a system for detection of lubricant coatings.
  238. Tingey Kevin G. ; Williamitis Victor A. ; Daugherty Charles W. ; Lambert Jeanne E. ; Mersch Steven H., Lubricant soluble fluorescent agent and method for its use in a system for detection of lubricant coatings.
  239. Tingey, Kevin; Johnson, Steven W.; Purdy, E. Robert; Orr, Douglas P.; Lee, Min-Shiu, Lubricious coating for a medical device.
  240. Dubrovsky, Timothy; Abrams, Barnaby; Diwu, Zhenjun; Meng, Qinglin; Liao, Jinfang; Guo, Haitao, Luminescent dyes with a water-soluble intramolecular bridge and their biological conjugates.
  241. Shannon, Steven C.; Drexel, Masao; Stinnett, James A.; Rui, Ying; Xiao, Ying; Lindley, Roger A.; Yousif, Imad, Magnetic confinement of a plasma.
  242. Cook Joel M. (Pleasanton CA) Trow John R. (Santa Clara CA), Magnetic field enhanced plasma processing chamber.
  243. Miyata, Koji, Magnetic field generator for magnetron plasma.
  244. Madocks, John, Magnetic mirror plasma source.
  245. Madocks, John, Magnetic mirror plasma source and method using same.
  246. Gerald Yin ; Peter Loewenhardt ; Arnold Kholodenko ; Hong Chin Shan ; Chii Lee ; Dan Katz, Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma.
  247. Peter K. Loewenhardt ; Gerald Z. Yin ; Philip M. Salzman, Magnetically enhanced inductively coupled plasma reactor with magnetically confined plasma.
  248. Tuda Mutumi,JPX ; Ono Kouichi,JPX ; Tsuchihashi Masaaki,JPX ; Hanazaki Minoru,JPX ; Komemura Toshio,JPX ; Oku Kouji,JPX ; Nakaguma Shinji,JPX, Magnetically enhanced microwave plasma generating apparatus.
  249. Class Walter H. (Yonkers NY) Hurwitt Steven D. (Park Ridge NJ) Hill Michael L. (New York NY) Hutt Marvin K. (Oakland NJ), Magnetically enhanced plasma process and apparatus.
  250. Hanley Peter R. (Danville CA) Savas Stephen E. (San Jose CA) Levy Karl B. (Saratoga CA) Jha Neeta (Santa Clara CA) Donohoe Kevin (Mountain View CA), Magnetically enhanced plasma reactor system for semiconductor processing.
  251. Collins George J. (807 W. Oak St. Fort Collins CO 80521) McNeil John R. (13423 Desert Hills NE. Albuquerque NM 87111) Yu Zeng-gi (North Aggie Village Apt. 7C ; C.S.U. Fort Collins CO 80523), Magnetron deposition of ceramic oxide-superconductor thin films.
  252. Wei, Ronghua, Magnetron sputtering apparatus and method for depositing a coating using same.
  253. Yumshtyk Gennady,CAX ; Ioumchtyk Michael,CAX, Magnetron sputtering method and apparatus.
  254. Martin David Alan, Manifold system.
  255. Kasahara,Osamu; Maeda,Kiyohiko; Yoneda,Akihiko, Manufacturing method of semiconductor device, and substrate processing apparatus.
  256. Hattori Takeshi (Tokyo JPX) Onzuka Kuniyuki (Oita JPX) Ichizawa Yoshiyuki (Saitama JPX), Means and method for forming syringe.
  257. Leonid A. Vasilyev ; Charles E. Bryson, III ; Robert Linder ; Sergey Borodyansky ; Dmitri Klyachko, Measurement of film thickness by inelastic electron scattering.
  258. Juvinall John W. ; Ringlien James A., Measurement of hot container wall thickness.
  259. Nelson Keith A. (Newton MA) Duggal Anil R. (Arlington MA) Rogers John A. (Cambridge MA), Measurement of material properties with optically induced phonons.
  260. Cohen, Richmond R.; Keusch, Preston, Medical article having blood-contacting surface.
  261. D'Souza, Ajit Joseph M.; Montgomery, David B., Medical components having coated surfaces exhibiting low friction and low reactivity.
  262. Stewart Mark T. ; Iverson Vernon B. ; Keeney Kenneth W. ; Taylor Catherine E., Medical electrical lead having controlled texture surface and method of making same.
  263. Buch-Rasmussen, Thomas; Jannasch, Patric; J.o slashed.rgensen, Erling Bonne, Medicament container of polymer of cyclic hydrocarbon for storing a liquid medicament.
  264. Buch-Rasmussen Thomas,DKX ; Jannasch Patric,DKX ; J.o slashed.rgensen Erling Bonne,DKX, Medicament container of polymer of linear olefin for storing a liquid medicament.
  265. Shaw David G. ; Le Gonidec Paul,FRX, Metallized film capacitor.
  266. Wilhelm Rolf (Munich DEX), Method and apparatus for PCVD internal coating a metallic pipe by means of a microwave plasma.
  267. Potyrailo, Radislav Alexandrovich; Brennan, Michael Jarlath, Method and apparatus for characterizing the barrier properties of members of combinatorial libraries.
  268. Plester George (Brussels BEX) Ehrich Horst (Dorsten DEX), Method and apparatus for coating hollow containers through plasma-assisted deposition of an inorganic substance.
  269. Bailey ; III Andrew D. ; Schoepp Alan M. ; Bright Nicolas, Method and apparatus for controlling the volume of a plasma.
  270. Grabarz Henry J. (Huntington CT) Grill Alfred (White Plains NY) Holber William M. (New York NY) Logan Joseph S. (Poughkeepsie NY) Yeh James T. C. (Katonah NY), Method and apparatus for filing high aspect patterns with metal.
  271. Omote,Kazuhiko; Himeda,Akihiro, Method and apparatus for film thickness measurement.
  272. Goodwin,Andrew James; Ward,Luke; Merlin,Patrick; Badyal,Jas Pal Singh, Method and apparatus for forming a coating.
  273. Pradhan, Anshu A.; Hayden, Douglas B.; Kinder, Ronald L.; Dulkin, Alexander, Method and apparatus for increasing local plasma density in magnetically confined plasma.
  274. White Gerald W. (Dallas TX), Method and apparatus for making plastic containers having decreased gas permeability.
  275. Semersky,Frank E.; Sturgill,Dennis T., Method and apparatus for measuring a characteristic of a plastic container.
  276. Ascheman,Timothy Alan; Mayer,Daniel W., Method and apparatus for measuring gas transmission rates of deformable or brittle materials.
  277. Norton Adam E. (Palo Alto CA) Pham Hung V. (San Jose CA), Method and apparatus for measuring reflectance in two wavelength bands to enable determination of thin film thickness.
  278. Carodiskey Thomas J., Method and apparatus for measuring the thickness of a coated material.
  279. Itagaki, Yosuke; Yamada, Keizo; Ushiki, Takeo, Method and apparatus for measuring thickness of thin film.
  280. Nomoto,Mineo; Hirose,Takenori; Saito,Keiya, Method and apparatus for measuring thickness of thin film and device manufacturing method using same.
  281. Gold Nathan (Redwood City CA) Willenborg David L. (Dublin CA) Opsal Jon (Livermore CA) Rosencwaig Allan (Danville CA), Method and apparatus for measuring thickness of thin films.
  282. Saito Hiroshi (Fujisawa JPX) Suzuki Yasumichi (Yokohama JPX) Sano Shuuzoo (Yokohama JPX) Shimizu Tamotsu (Yokohama JPX) Aiuchi Susumu (Yokohama JPX), Method and apparatus for microwave assisting sputtering.
  283. Fujimura Shuzo (Tokyo JPX), Method and apparatus for microwave plasma anisotropic dry etching.
  284. Ringermacher,Harry Israel; Rozier,Elena, Method and apparatus for nondestructive evaluation of insulative coating.
  285. Kuepper, Thomas; Bewig, Lars; Moelle, Christoph; Brandt, Lars; Niklos, Thomas, Method and apparatus for plasma enhanced chemical vapor deposition.
  286. Mantei Thomas D. (Cincinnati OH), Method and apparatus for plasma etching a substrate.
  287. Bailey, III,Andrew D., Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma.
  288. Mahoney Leonard J. (Madison WI), Method and apparatus for plasma surface treatment of the interior of hollow forms.
  289. Kesil,Boris; Velikov,Leonid; Vorobyev,Yuri, Method and apparatus for precision measurement of film thickness.
  290. Kuehnle Manfred R. (New London NH) Hagenlocher Arno (Santa Rosa CA) Schuegraf Klaus (Torrance CA) Statz Hermann (Wayland CA), Method and apparatus for producing gas impermeable, chemically inert container structures for food and volatile substanc.
  291. Pu Bryan (San Jose CA) Shan Hongching (San Jose CA), Method and apparatus for producing plasma uniformity in a magnetic field-enhanced plasma reactor.
  292. Colpo, Pascal; Rossi, Francois, Method and apparatus for sequential plasma treatment.
  293. Saito Hiroshi (Yokohama JPX) Tateishi Hideki (Yokohama JPX) Kobayashi Shigeru (Tokyo JPX) Aiuchi Susumu (Yokohama JPX) Suzuki Yasumichi (Yokohama JPX) Sakata Masao (Yokohama JPX) Shimamura Hideaki (Y, Method and apparatus for sputtering.
  294. Hfling Erich (Kreuzlingen CHX) Maly Zdenek (Kreuzlingen CHX), Method and apparatus for the determination of the thickness of transparent layers of lacquer.
  295. Laurent, Jacques, Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process.
  296. Rust Ray Dean, Method and apparatus for vacuum deposition of highly ionized media in an electromagnetic controlled environment.
  297. Sagi Nehemiah Hemi ; Zhang Guosen Ronald ; Ghosh Ranajit Rana, Method and apparatus of nondestructive testing a sealed product for leaks.
  298. Sagi, Nehemiah Hemi; Zhang, Guosen Ronald; Ghosh, Ranajit Rana; Wang, Xuguang, Method and apparatus of nondestructive testing a sealed product for leaks.
  299. Wang Wei ; Miller Keith ; Gogh James Van ; Gopalraja Praburam, Method and apparatus to improve the side wall and bottom coverage in IMP process by using magnetic field.
  300. Hama,Kenichi; Kage,Tsuyoshi; Kobayashi,Takumi; Kawabe,Takeharu, Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus.
  301. Moore,Rodney, Method and device for determining the permeation of a barrier layer.
  302. Keith A. Nelson ; John A. Rogers ; Matthew J. Banet ; John Hanselman ; Martin Fuchs, Method and device for measuring the thickness of opaque and transparent films.
  303. Nelson Keith A. ; Rogers John A. ; Banet Matthew J. ; Hanselman John ; Fuchs Martin, Method and device for measuring the thickness of opaque and transparent films.
  304. Nelson Keith A. ; Rogers John A. ; Banet Matthew J. ; Hanselman John ; Fuchs Martin, Method and device for measuring the thickness of opaque and transparent films.
  305. Vanden Brande, Pierre; Weymeersch, Alain, Method and device for plasma treatment of moving metal substrates.
  306. Fischer Helmut,DEX, Method and device for the determination of measurement uncertainties in X-ray fluorescence layer thickness.
  307. Bicker, Matthias; Hormes, Robert; Lohmeyer, Manfred, Method and device for the internal plasma treatment of hollow bodies.
  308. Lizenberg, Michael; Lewis, Frank; Müller, Hartwig; Vogel, Klaus; Arnold, Gregor; Behle, Stephan; Lüttringhaus-Henkel, Andreas; Bicker, Matthias; Klein, Jürgen, Method and device for the plasma treatment of workpieces.
  309. Behle, Stephan; Kuhr, Markus; Walther, Marten; Wolff, Detlef; Bicker, Matthias, Method and device for the simultaneous coating and moulding of a body.
  310. Schwarzenbach, Walter; Roessler, Bertrand; Fayet, Pierre, Method and device for treating surfaces using a glow discharge plasma.
  311. Heimreid Ken (Brananveien 44B 3940 Heistad NOX), Method and device for treatment of blood.
  312. Gibson ; Jr. Gerald W., Method and structure for controlling plasma uniformity.
  313. Boardman,William John; Tudhope,Andrew William; Mercado,Raul Donate, Method and system for coating internal surfaces of prefabricated process piping in the field.
  314. Tudhope, Andrew William; Boardman, William John; Mercado, Raul Donate; Contreras, Frederick, Method and system for coating internal surfaces using reverse-flow cycling.
  315. Tudhope, Andrew William; Boardman, William John; Mercado, Raul Donate; Contreras, Frederick, Method and system for coating sections of internal surfaces.
  316. Chatard,Dominique; Grunwald,Heinrich; Lothar,Wilhelm; K?ss,Hanno, Method for blow forming a container made of plastic and for coating the inside of said container.
  317. Tropsha Yelena G., Method for depositing a multilayer barrier coating on a plastic substrate.
  318. Wei,Ronghua; Rincon,Christopher; Arps,James, Method for depositing coatings on the interior surfaces of tubular structures.
  319. Wei, Ronghua; Rincon, Christopher; Arps, James, Method for depositing coatings on the interior surfaces of tubular walls.
  320. Jaworowski Mark ; Janowsky Glenn T. ; Weston Charles H., Method for fabricating and inspecting coatings.
  321. Yu Chorng-Tao (Yorba Linda CA) Isaak Kenneth H. (Tustin CA), Method for film thickness endpoint control.
  322. Ryuji Okamura JP, Method for forming a deposited film by plasma chemical vapor deposition.
  323. Roca I Cabarrocas, Pere; Bulkin, Pavel; Daineka, Dmitri; Leempoel, Patrick; Descamps, Pierre; Kervyn De Meerendre, Thibault, Method for forming a film with a graded bandgap by deposition of an amorphous material from a plasma.
  324. Sakamoto, Hitoshi; Nishimori, Toshihiko; Goya, Saneyuki; Abe, Takao; Ueda, Noriaki, Method for forming metallic film and apparatus for forming the same.
  325. Suzuki Keizo (Hachioji JPX) Hiraiwa Atsushi (Kodaira JPX) Takahashi Shigeru (Hachioji JPX) Nishimatsu Shigeru (Kokubunji JPX) Ninomiya Ken (Tokyo JPX) Okudaira Sadayuki (Ome JPX), Method for growing silicon-including film by employing plasma deposition.
  326. Givens John H. ; Elliott Richard L., Method for improved bottom and side wall coverage of high aspect ratio features.
  327. Moslehi Mehrdad M., Method for inductively-coupled-plasma-enhanced ionized physical-vapor deposition.
  328. Chatard, Dominique, Method for measuring gas permeability of a coating on a plastic wall and device for implementing the method.
  329. Mayer William N. (White Bear Lake MN), Method for measuring material permeability characteristics.
  330. Mayer William N. (White Bear Lake MN), Method for measuring permeability of a material.
  331. Isei,Yoshito; Hirai,Tokumi, Method for measuring thickness of thin film-like material during surface polishing, and surface polishing method and surface polishing apparatus.
  332. Xu Yiping (Tucson AZ) Li Yuan J. (Tucson AZ), Method for measuring thin-film thickness and step height on the surface of thin-film/substrate test samples by phase-shi.
  333. Mikami,Toru, Method for monitoring film thickness, a system for monitoring film thickness, a method for manufacturing a semiconductor device, and a program product for controlling film thickness monitoring system.
  334. Felts John T., Method for plasma deposition of a thin film onto a surface of a container.
  335. Martin David Alan (Raleigh NC), Method for plasma processing.
  336. Montgomery David B. (Cary NC) Williams Joel L. (Cary NC), Method for plasma treatment of small diameter tubes.
  337. Karakelle Mutlu (Dayton OH) Zdrahala Richard J. (Dayton OH), Method for preparing lubricated surfaces and product.
  338. Esser Klaus (Konigswinter DEX) Karsch Ulrich (Niederkassel DEX) Runkel Jurgen (Bonn DEX) Grunwald Heinrich (Gomaringen DEX) Nauenburg Klaus (Tubingen DEX) Weichart Jurgen (Balzers LIX) Diener Christo, Method for producing a polymer coating inside hollow plastic articles.
  339. Geisler Michael (Waechtersbach DEX) Koetter-Faulhaber Rudolf (Hanau DEX) Wuerz Susanne (Neuberg DEX), Method for producing a reflective surface on a substrate.
  340. Maruyama Tohru (Sagamihara JPX) Abe Michio (Ohita JPX) Nomiyama Hiroaki (Sagamihara JPX) Okazaki Sachiko (No. 20-11 ; Takaido-Higashi 2-chome ; Suginami-ku ; Tokyo JPX) Kogoma Masuhiro (No. 843-15 ; , Method for producing medical materials.
  341. Felts John T. (Alameda CA) Chatham ; III Hood (Fairfield CA) Countrywood Joseph (Napa CA) Nelson Robert J. (Walnut Creek CA), Method for rapid plasma treatments.
  342. Xie,Jun; Yap,Hoon Lian; Yeap,Chuin Boon; Lok,Weoi San, Method for reducing argon diffusion from high density plasma films.
  343. Roche Gregory A. ; Hodul David T. ; Vahedi Vahid, Method for reduction of plasma charging damage during chemical vapor deposition.
  344. Doehler Joachim (Union Lake MI) Hudgens Stephen J. (Southfield MI) Ovshinsky Stanford R. (Bloomfield Hills MI) Dotter II Buddie (Utica MI) Peedin Lester R. (Oak Park MI) Krisko Jeffrey M. (Highland M, Method for the high rate plasma deposition of high quality material.
  345. Fortin John K. (Boulder CO), Method for the manufacture of shaped products of biaxially oriented polymeric material.
  346. Masso Jon D. (Whitinsville MA) Brennan William D. (Woodstock CT) Rotenberg Don H. (Westboro MA), Method imparting anti-static, anti-reflective properties to ophthalmic lenses.
  347. Kondo Noriyuki (Kyoto JPX), Method of and apparatus for measuring film thickness.
  348. Tsuji Osamu (Ohotsu JPX), Method of and system for processing halogenated hydrocarbons.
  349. Ye Liang,GBX, Method of depositing a silicon oxide coating on glass and the coated glass.
  350. Kaganowicz Grzegorz (Princeton NJ), Method of depositing a silicon oxide layer.
  351. Dietze Gerald R. ; Kononchuk Oleg V., Method of determining the thickness of a layer on a silicon substrate.
  352. Moulton, William G., Method of forming IV catheter and needle assembly.
  353. Carano, Donald J., Method of forming a closure for a fluid collection tube.
  354. Plester George,BEX, Method of forming a coating on an inner surface.
  355. Felts John T., Method of forming a film on a substrate.
  356. Felts John T., Method of forming a film on a substrate.
  357. Yializis Angelo, Method of forming a hybrid polymer film.
  358. Hu Ing-Feng (Midland MI) Tou James C. (Midland MI), Method of forming a plasma polymerized film.
  359. Sliemers Francis A. (Columbus OH) Nandi Uma S. (Columbus OH) Behrer Philip C. (Columbus OH) Nance George P. (Columbus OH), Method of forming abrasion-resistant plasma coatings and resulting articles.
  360. Levy, Sagy; Bloom, Robin S.; Kepten, Avashai, Method of forming dielectric films.
  361. Lagendijk Andre (Oceanside CA), Method of forming silicon dioxide glass films.
  362. Hetzler,Kevin George; Lubrecht,Thea; Groskopf,Roger William, Method of fusing a component to a medical storage of transfer device and container assembly.
  363. Hetzler,Kevin George; Lubrecht,Thea; Groskopf,Roger William, Method of fusing a component to a medical storage or transfer device and container assembly.
  364. Shufflebotham Paul Kevin ; Weise Mark, Method of high density plasma CVD gap-filling.
  365. Walther Marten,DEX ; Spallek Michael,DEX ; Danielzik Burkhardt,DEX ; Heming Martin,DEX ; Segner Johannes,DEX, Method of making a hollow, interiorly coated glass body and a glass tube as a semi-finished product for forming the glass body.
  366. Walther Marten,DEX ; Heming Martin,DEX ; Spallek Michael,DEX ; Zschaschler Gudrun,DEX, Method of making a vessel having a wall surface having a barrier coating.
  367. D'Arrigo, Christina Joy; Schiller, Eric; Economou, Anthony, Method of making an elongate syringe barrel.
  368. Rose Peter ; Lopata Eugene ; Felts John, Method of making low .kappa. dielectric inorganic/organic hybrid films.
  369. Ogawa Kazufumi (Hirakata JPX) Mino Norihisa (Settu JPX) Soga Mamoru (Osaka JPX) Higashino Hidetaka (Soraku JPX), Method of manufacturing a chemically adsorbed film.
  370. Ogawa Kazufumi (Osaka JPX) Soga Mamoru (Osaka JPX) Ozaki Shinji (Osaka JPX) Ikuta Shigeo (Osaka JPX), Method of manufacturing a chemically adsorbed film.
  371. Kawata Noriaki,JPX ; Hikima Kiyoshi,JPX, Method of manufacturing a cylindrical supporting member for electrophotography.
  372. Nakahigashi Takahiro,JPX ; Kuwahara Hajime,JPX ; Fujiyama Hiroshi,JPX, Method of manufacturing a tube having a film on its inner peripheral surface and apparatus for manufacturing the same.
  373. Mayer, Daniel W.; Tuomela, Stephen D., Method of measuring the transmission rate of a permeant through a container and determining shelf life of a packaged product within the container.
  374. Jiang, Zhi Cheng; Li, Shan Dan; Kam, Yuen Kwan; Liu, Yi Wei, Method of nano thin film thickness measurement by auger electron spectroscopy.
  375. Miller, Matthew L.; Hoffman, Daniel J.; Shannon, Steven C.; Kutney, Michael; Carducci, James; Nguyen, Andrew, Method of plasma confinement for enhancing magnetic control of plasma radial distribution.
  376. Lopata Eugene S. ; Felts John T., Method of plasma enhanced silicon oxide deposition.
  377. Haines, Daniel; Burzio, Luis; Bicker, Matthias; Hormes, Robert; Koller, Horst; Buki, Jasmina; Bauch, Hartmut; Lohmeyer, Manfred, Method of preparing a macromolecule deterrent surface on a pharmaceutical package.
  378. Komiya Yuji (Tama JPX), Method of preparing laminated packaging material.
  379. Chen Ching-Hwa (Milpitas CA) Yin Gerald (Cupertino CA) Inoue Takashi (Tokyo JPX), Method of producing flat ECR layer in microwave plasma device and apparatus therefor.
  380. Fayet Pierre (Lausanne CHX) Jaccoud Bertrand (Siviriez CHX), Method of producing interiorly sterile packages possessing superior barrier properties.
  381. Hu, Ing-Feng; Tou, James C., Method of providing an abrasion resistant coating.
  382. Hanawa Hiroji (Santa Clara CA), Method of treating a workpiece with a plasma and processing reactor having plasma igniter and inductive coupler for semi.
  383. Sandhu Gurtej Singh ; Thakur Randhir P. S., Method to achieve rough silicon surface on both sides of container for enhanced capacitance/area electrodes.
  384. Williams Joel L. (Cary NC) Burkett Susan L. (Northport AL) McGuire Shel (Omaha NE), Method to reduce gas transmission.
  385. Russell,Derrek Andrew, Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma.
  386. Thomas H. Ronald (Easton PA) Babacz Robert J. (Bethlehem PA) Newton Robert R. (Nazareth PA), Methods and apparatus for depositing barrier coatings.
  387. Thomas H. Ronald ; Babacz Robert J ; Newton Robert R., Methods and apparatus for depositing barrier coatings.
  388. Babacz Robert J. (Bethlehem PA), Methods and apparatus for externally treating a container with application of internal bias gas.
  389. Trotter, Joseph T.; Hamel, Jean-Bernard; Carpenter, John Frank; Randolph, Theodore; Gabrielson, John Paul, Methods for evaluating the aggregation of a protein in a suspension including organopolysiloxane and medical articles coated with organopolysiloxane containing a protein solution.
  390. Babacz Robert J. (Bethlehem PA), Methods for externally treating a container with application of internal bias gas.
  391. Hu Can B. ; Myers Keith E. ; Peterson Robert C., Methods for harvesting adipose tissue containing autologous microvascular endothelial cells.
  392. Chen, Xiaoxi (Kevin); Galbraith, William, Methods for producing surfaces that resist non-specific protein binding and cell attachment.
  393. Saito,Takao; Nakamura,Yukinori; Kondo,Yoshimasa; Ohtake,Naoto, Methods for producing thin films on substrates by plasma CVD.
  394. Otoshi Hirokazu (Nagahama JPX) Takei Tetsuya (Nagahama JPX) Takai Yasuyoshi (Nagahama JPX) Okamura Ryuji (Shiga JPX) Shirai Shigeru (Hikone JPX) Misumi Teruo (Nagahama JPX), Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure.
  395. Hirose Naoki (Atsugi JPX) Inujima Takashi (Atsugi JPX) Takayama Toru (Atsugi JPX), Microwave plasma apparatus employing helmholtz coils and ioffe bars.
  396. Hirose Naoki (Atsugi) Inujima Takashi (Atsugi) Takayama Toru (Atsugi JPX), Microwave plasma etching and deposition method employing first and second magnetic fields.
  397. Kriesel Marshall S. (St. Paul MN) Thompson Thomas N. (Richfield MN), Mixing and delivery syringe assembly.
  398. Foerch Renate (London CAX) Hunter Duncan H. (London CAX) McIntyre N. Stewart (London CAX) Sodhi Rana N. S. (Toronto CAX), Modification of polymer surfaces by two-step reactions.
  399. Moorman Jack W. ; Bush M. Elizabeth, Modular biopsy and microwave ablation needle delivery apparatus adapted to in situ assembly and method of use.
  400. Moorman, Jack W.; Bush, M. Elizabeth, Modular biopsy and microwave ablation needle delivery apparatus adapted to in situ assembly and method of use.
  401. Auerbach, Andrew; Chauhan, Bhanu P. S.; Clarke, Richard P.; Haider, M. Ishaq; Latif, Umar, Multi-arm cyclic or cubic siloxane-based formulations for drug delivery.
  402. Moslehi Mehrdad M. (Dallas TX) Davis Cecil J. (Greenville TX) Jones John (Plano TX) Matthews Robert T. (Plano TX), Multi-electrode plasma processing apparatus.
  403. Janik,Gary R.; Moore,Jeffrey, Multi-technique thin film analysis tool.
  404. Moslehi Mehrdad M. (Dallas TX), Multi-zone plasma processing method and apparatus.
  405. Shaw David G. ; Cline Daniel S. ; Dawson Eric P. ; Langlois Marc, Multicolor interference coating.
  406. Martin, Peter M.; Graff, Gordon L.; Gross, Mark E.; Hall, Michael G.; Mast, Eric S., Multilayer plastic substrates.
  407. Martin, Peter M.; Graff, Gordon L.; Gross, Mark E.; Hall, Michael G.; Mast, Eric S., Multilayer plastic substrates.
  408. Martin, Peter M.; Graff, Gordon L.; Gross, Mark E.; Hall, Michael G.; Mast, Eric S., Multilayer plastic substrates.
  409. Rule, Mark; Shi, Yu; Gebele, Thomas; Grimm, Helmut; Budke, Elisabeth, Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same.
  410. Felts, John T., Multiple source deposition plasma apparatus.
  411. Moslehi Mehrdad M. (Dallas TX), Multipurpose low-thermal-mass chuck for semiconductor processing equipment.
  412. Porret, Jean-Yves; Jansen, Hubert, Multipurpose packages for sterile products or products to be sterilized.
  413. Moorman, Jack W.; Bush, M. Elizabeth, Needle kit and method for microwave ablation, track coagulation, and biopsy.
  414. Moorman,Jack W.; Bush,M. Elizabeth, Needle kit and method for microwave ablation, track coagulation, and biopsy.
  415. Etchells Arthur W. (Philadelphia PA) Donofrio David J. (Wilmington DE), Non-degrading pressure regulator.
  416. Tropsha Yelena G. ; Martin David A. ; Mar Kevin D. ; Graper Jane C. ; Ghandhi Jamshed B., Non-ideal barrier coating architecture and process for applying the same to plastic substrates.
  417. Hardman,Lori; Spinti,Mark; Ren,Jie Jane; Sung,An Min Jason; Pelkey,Brian James; Wu,Shang Ren; Korona,Lawrence, Non-volatile lubricant system for medical devices.
  418. Larson, Paul E.; Watson, David G., Nondestructive characterization of thin films based on acquired spectrum.
  419. Larson, Paul E.; Watson, David G.; Moulder, John F., Nondestructive characterization of thin films using measured basis spectra.
  420. Hirokane,Junji; Iwata,Noboru, Optical storage medium enabling uniform light transmittance, optical read/write apparatus for same, and optical read/write method for same.
  421. Hirokane, Junji; Iwata, Noboru, Optical storage medium, optical read/write apparatus, and optical read/write method.
  422. Hirokane, Junji; Iwata, Noboru, Optical storage medium, optical read/write apparatus, and optical read/write method.
  423. Taskis Charles Bernard,GBX ; Whatmore Paul John,GBX, Package.
  424. Jaccoud,Bertrand, Packaging laminate with gas and aroma barrier properties.
  425. Roulin Anne (Molondin CHX) Jaccoud M. Bertrand (Siviriez CHX), Packaging laminate with gas and aroma barrier properties.
  426. Gegenwart Rainer (Roedermark DEX) Ritter Jochen (Laubach DEX), Particle source, especially for reactive ionic etching and plasma-supported CVD processes.
  427. Frank Christian Doughty ; Joel Brad Bailey, Permanent magnet ECR plasma source with integrated multipolar magnetic confinement.
  428. Doughty Frank C. ; Spencer John E., Permanent magnet ECR plasma source with magnetic field optimization.
  429. Babcock Walter C. (Bend OR) Hyde Geoffrey D. (Bend OR) Johnson Bruce M. (Bend OR) Rayfeld George W. (Bend OR), Permselective hollow fiber fluid separation membranes having plasma-polymerized lumen-side coatings.
  430. Romberg Val G. (Parkerford PA) Kiang Patty H. (Collegeville PA) Curry Wayne T. (Pottstown PA), Pharmaceutical elastomeric coating.
  431. Romberg Val G. (Parkerford) Kiang Patty H. (Collegeville) Curry Wayne T. (Pottstown PA), Pharmaceutical elastomeric coating.
  432. Romberg Val. G. (7930 Beverly Blvd. Upper Darby PA 19082) Kiang Patty H. (3563 Arcola Rd. Collegeville PA 19426) Curry Wayne T. (1035 Belleview Ave. Pottstown PA 19464), Pharmaceutical elastomeric coating.
  433. Haines, Daniel; Burzio, Luis; Bicker, Matthias; Koller, Horst; Marjanovic, Jasmina; Hormes, Robert, Pharmaceutical package having a multi-functional surface and a method of preparing a multi-functional surface on a pharmaceutical package.
  434. Harris, Caroline S.; Szanyi, Janos, Photo-induced hydrophilic article and method of making same.
  435. Murata Masayoshi (Nagasaki JPX) Takeuchi Yoshiaki (Nagasaki JPX), Plasma CVD apparatus including rotating magnetic field generation means.
  436. Otto Jurgen (Mannheim DEX) Segner Johannes (Stromberg DEX) Paquet Volker (Mainz DEX), Plasma CVD method of producing a gradient layer.
  437. Murakami, Yasuo; Nakahigashi, Takahiro, Plasma CVD method, plasma CVD apparatus, and electrode.
  438. Etzkorn Heinz W. (Neu Anspach DEX) Krmmel Harald (Mainz DEX) Paquet Volker (Mainz DEX) Weidmann Gnter (Armsheim DEX), Plasma CVD process for coating a dome-shaped substrate.
  439. Nakamura Seiichi (Amagasaki JPX) Nakayama Satoshi (Amagasaki JPX) Inoue Takashi (Amagasaki JPX), Plasma apparatus.
  440. Hirose Naoki (Atsugi JPX) Inushima Takashi (Atsugi JPX), Plasma chemical vapor reaction method employing cyclotron resonance.
  441. Korevaar,Bastian A.; Iacovangelo,Charles D.; Miebach,Thomas; Mercedes,Michael W., Plasma coating system for non-planar substrates.
  442. Trow John ; Ishikawa Tetsuya, Plasma confinement for an inductively coupled plasma reactor.
  443. Affinito, John D.; Graff, Gordon L.; Martin, Peter M.; Gross, Mark E.; Burrows, Paul E.; Sapochak, Linda S., Plasma enhanced chemical deposition for high and/or low index of refraction polymers.
  444. Collins Kenneth S. ; Roderick Craig A. ; Trow John R. ; Yang Chan-Lon ; Wong Jerry Yuen-Kui ; Marks Jeffrey ; Keswick Peter R. ; Groechel David W. ; Pinson ; II Jay D. ; Ishikawa Tetsuya ; Lei Lawren, Plasma etch processes.
  445. Lee Sang-yeoul,KRX, Plasma etching chamber for manufacturing semiconductor devices.
  446. Honda, Masanobu; Nagaseki, Kazuya; Hayashi, Hisataka, Plasma etching method.
  447. Honda, Masanobu; Nagaseki, Kazuya; Inazawa, Koichiro; Matsuyama, Shoichiro; Hayashi, Hisataka, Plasma etching method and plasma etching unit.
  448. Tsai Chin-Chi (Oak Ridge TN) Gorbatkin Steven M. (Oak Ridge TN) Berry Lee A. (Oak Ridge TN), Plasma generating apparatus for large area plasma processing.
  449. Hu Ing-Feng, Plasma generating device and method.
  450. Sekine Makoto (Yokohama JPX) Horioka Keiji (Yokohama JPX) Okano Haruo (Tokyo JPX) Okumura Katsuya (Yokohama JPX) Hasegawa Isahiro (Zushi JPX) Narita Masaki (Yokohama JPX), Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field.
  451. Stewart Mark T. (Brooklyn Center MN) Morris Mary M. (Mounds View MN) Di Domenico Edward (Anoka MN) Keeney Kenneth W. (Forest Lake MN), Plasma process for reducing friction within the lumen of polymeric tubing.
  452. Stewart Mark T. (Brooklyn Center MN) Morris Mary M. (Mounds View MN) Di Domenico Edward (Anoka MN) Keeney Kenneth W. (Forest Lake MN), Plasma process for reducing friction within the lumen of polymeric tubing.
  453. Appleyard, Nicholas John, Plasma processing apparatus.
  454. Ishii Nobuo (Yamanashi-ken JPX) Hata Jiro (Yamanashi-ken JPX) Koshimizu Chishio (Yamanashi-ken JPX) Tahara Yoshifumi (Tokyo JPX) Nishikawa Hiroshi (Tokyo JPX) Imahashi Isei (Yamanashi-ken JPX), Plasma processing apparatus.
  455. Ogino Satoshi,JPX ; Yonekura Kazumasa,JPX ; Kimura Hajime,JPX ; Sakamori Shigenori,JPX, Plasma processing apparatus.
  456. Taki Masakazu,JPX ; Ootera Hiroki,JPX ; Oomori Tatsuo,JPX, Plasma processing apparatus.
  457. Iwasaki, Masahide; Ukei, Tomoaki, Plasma processing apparatus and method.
  458. Setoyama Eiji,JPX ; Ishiguro Kouji,JPX ; Murakami Hajime,JPX ; Seki Hirofumi,JPX, Plasma processing apparatus and method of cleaning the apparatus.
  459. Miyata,Koji; Sato,Tetsuji, Plasma processing apparatus and plasma processing method.
  460. Hana Barankova SE; Ladislav Bardos SE, Plasma processing apparatus having rotating magnets.
  461. Imahashi Issei (Yamanashi-ken JPX), Plasma processing apparatus with a rotating electromagnetic field.
  462. Inaba, Hiroshi; Sasaki, Shinji; Hirano, Shinya; Furusawa, Kenji; Yamasaka, Minoru; Amatatsu, Atsushi; Xu, Shi, Plasma processing apparatus with real-time particle filter.
  463. Ono,Hiroo; Tateshita,Koichi; Honda,Masanobu; Nagaseki,Kazuya; Hayashi,Daisuke, Plasma processing device.
  464. Masuda Toshio,JPX ; Mitani Katsuhiko,JPX ; Kaji Tetsunori,JPX ; Tanaka Jun'ichi,JPX ; Watanabe Katsuya,JPX ; Shirayone Shigeru,JPX ; Otsubo Toru,JPX ; Sasaki Ichiro,JPX ; Fukumoto Hideshi,JPX ; Koizu, Plasma processing system and plasma processing method.
  465. Collins Kenneth S. ; Yang Chan-Lon ; Wong Jerry Yuen-Kui ; Marks Jeffrey ; Keswick Peter R. ; Groechel David W., Plasma reactor and processes using RF inductive coupling and scavenger temperature control.
  466. Yin Gerald Zheyao ; Lee Chii Guang ; Kholodenko Arnold ; Loewenhardt Peter K. ; Shan Hongching ; Ma Diana Xiaobing ; Katz Dan, Plasma reactor having a helicon wave high density plasma source.
  467. Collins, Kenneth S.; Yang, Chan-Lon; Wong, Jerry Yuen-Kui; Marks, Jeffrey; Keswick, Peter R.; Groechel, David W.; Roderick, Craig A.; Trow, John R.; Ishikawa, Tetsuya; Pinson, II, Jay D.; Lei, Lawren, Plasma reactor using inductive RF coupling, and processes.
  468. Quiles, Efrain; Noorbakhsh, Hamid; Carducci, James D, Plasma reactor with a tri-magnet plasma confinement apparatus.
  469. Blalock Guy, Plasma reactors and method of cleaning a plasma reactor.
  470. Sakama Mitsunori (Kanagawa JPX) Fukada Takeshi (Kanagawa JPX) Ichijo Mitsuhiro (Kanagawa JPX) Abe Hisashi (Kanagawa JPX), Plasma treatment apparatus.
  471. Kimura Shin-Ichiro (Hachioji JPX) Murakami Eiichi (Kokubunji JPX) Warabisako Terunori (Tokyo JPX) Miyake Kiyoshi (Kanagawa JPX) Sunami Hideo (Tokyo JPX), Plasma treatment system.
  472. Barnes Michael S. (Mahopac NY) Forster John C. (Poughkeepsie NY) Keller John H. (Poughkeepsie NY), Plasma wafer processing tool having closed electron cyclotron resonance.
  473. Moslehi Mehrdad M. (Dallas TX), Plasma-assisted processing magneton with magnetic field adjustment.
  474. Ackermann Ulrich (Mainz-Gonsenheim DEX) Kersten Ralf T. (Bremthal DEX) Etzkorn Heinz-Werner (Neu-Ansbach DEX) Paquet Volker (Mainz DEX) Rutze Uwe (Mainz DEX), Plasma-enhanced CVD coating process.
  475. Williams Joel L. (Cary NC) Burkett Susan L. (Northport AL) McGuire Shel (Omaha NE), Plastic articles of reduced gas transmission and method therefor.
  476. Hirata Sadao (Yokohama JPX) Tanikawa Isao (Ayase JPX) Maruhashi Yoshitsugu (Yokohama JPX), Plastic bottles and process for preparation thereof.
  477. Sudo Morihiro,JPX ; Togashi Hiroshi,JPX, Plastic cap and a process for the production of the same.
  478. Hahn, Granville J., Plastic container with decreased gas permeability.
  479. Plester George,BEX ; Ehrich Horst,DEX ; Rule Mark ; Pickel Herbert,DEX ; Humele Heinz,DEX, Plastic containers with an external gas barrier coating.
  480. Humele, Heinz; Pickel, Herbert; Plester, George; Ehrich, Horst; Rule, Mark, Plastic containers with an external gas barrier coating, method and system for coating containers using vapor deposition, method for recycling coated containers, and method for packaging a beverage.
  481. Donald J. Carano, Plastic tube and resealable closure having protective collar.
  482. Sasaki Yasuyuki,JPX ; Bizen Takehiko,JPX ; Miyama Hiroshi,JPX ; Morisako Takeshi,JPX ; Tsukada Hiroko,JPX, Pouring spout.
  483. Haber Terry M. (El Toro CA) Smedley William H. (Lake Elsinore CA) Foster Clark B. (Laguna Niguel CA), Pre-filled safety syringe having a retractable needle.
  484. Engle, Frank W.; Bright, Clark I., Precise measurement system for barrier materials.
  485. Reinhard Michael,DEX ; Spallek Michael,DEX, Prefilled, low particle, sterile disposable syringe for injecting preparations and procedure for manufacture.
  486. Nakazawa, Akira; Berry, Norman Micheal; Jackson, Garry Raymond; Hibbard, Christopher; Mackey, Paul Ian; Silverbrook, Kia, Printhead cartridge with no paper path obstructions.
  487. Wellerdieck Klaus,CHX ; Wegmann Urs,CHX ; Hoefler Karl,CHX, Process and apparatus for sputter etching or sputter coating.
  488. Darr,Richard C.; Hubbard,Joy Lynn; Simpson,Thomas Jackson, Process and apparatus for testing bottles.
  489. Behle, Stephan; Lüettringhaus-Henkel, Andreas; Eimann, Peter; Klein, Juergen, Process and apparatus for the plasma coating of workpieces with spectral evaluation of the process parameters.
  490. Wolfgang Lohwasser DE, Process and device for manufacturing forms of packaging.
  491. Williams Joel L. (Cary NC) Burkett Susan L. (Hillsborough NC) McGuire Shel (Omaha NE), Process for barrier coating of plastic objects.
  492. Williams Joel L. (Cary NC) Burkett Susan L. (Hillsborough NC) McGuire Shel (Omaha NE), Process for barrier coating of plastic objects.
  493. Williams Joel L. (Cary NC) Burkett Susan L. (Hillsborough NC) McGuire Shel (Omaha NE), Process for barrier coating of plastic objects.
  494. Williams Joel L. ; Burkett Susan L. ; McGuire Shel, Process for barrier coating of plastic objects.
  495. Laurent Jacques,CHX, Process for coating the interior wall of a container with a SiOx barrier layer.
  496. Perot, Frédéric, Process for decontamination by radiation of a product such as a packaging containing medical devices.
  497. Montgomery David B. (Cary NC), Process for depositing barrier film on three-dimensional articles.
  498. Lefebvre Paul M. ; Seeser James W. ; Seddon Richard Ian ; Scobey Michael A. ; Manley Barry W., Process for depositing optical thin films on both planar and non-planar substrates.
  499. Havens, Marvin R., Process for detecting leaks in sealed packages.
  500. Ahern, Brian F.; Grippi, Nicholas A.; Soskey, Paul R.; Carano, Donald J.; Hutton, Norman J.; DeSalvo, Danielle M.; Lusardi, Gregory L., Process for forming multilayer containers.
  501. Namiki Tsunehisa,JPX, Process for forming silicon oxide coating on plastic material.
  502. Tsunehisa Namiki JP, Process for forming silicon oxide coating on plastic material.
  503. Grtner Georg F. (Aachen DEX) Janiel Peter A. (Wrselen DEX), Process for glow-discharge-activated reactive deposition of metal from a gas phase.
  504. Hostettler Fritz ; Helmus Michael N. ; Ding Ni, Process for hydrophilicization of hydrophobic polymers.
  505. Hwang Chorng-Fure Robin ; Martin Frank E. ; Sullivan Tim M. ; Williams Joel L., Process for manufacture of closure assembly.
  506. Mayer William N. ; Tuomela Stephen D. ; Krake Guss L., Process for measuring vapor transmission through materials.
  507. Wertheimer Michael R. (Westmount CAX) Schreiber Henry P. (Brossard CAX), Process for modifying large polymeric surfaces.
  508. Koulik,Pavel; Samsonov,Mikhail; Cherepanov,Alexander; Petrov,Evguenii, Process for plasma surface treatment and device for realizing the process.
  509. Wittenberg, Dieter; Kuepper, Thomas; Zogg, Lutz; Mehrtens, Andree, Process for producing patterned optical filter layers on substrates.
  510. Behle,Stephan; Bicker,Matthias, Production of a composite material having a biodegradable plastic substrate and at least one coating.
  511. Hasz Wayne Charles ; Borom Marcus Preston ; Johnson Curtis Alan, Protected thermal barrier coating composite with multiple coatings.
  512. Hasz Wayne Charles ; Borom Marcus Preston ; Johnson Curtis Alan, Protected thermal barrier coating composite with multiple coatings.
  513. Barry Lee-Mean Yang ; Steven Marc Gasworth, Protective coating by high rate arc plasma deposition.
  514. Yang Barry Lee-Mean ; Gasworth Steven Marc, Protective coating by high rate arc plasma deposition.
  515. Hu Ing-Feng (Midland MI) Tou James C. (Midland MI), Protective film for articles and method.
  516. Tucker Robyn Laurie ; Gyure Sandor ; Odell Robert B., Protective sealing barrier for a syringe.
  517. Tucker Robyn Laurie ; Gyure Sandor ; Odell Robert B., Protective sealing barrier for a syringe.
  518. Tucker Robyn Laurie ; Gyure Sandor ; Odell Robert B., Protective sealing barrier for a syringe.
  519. Glukhoy, Yuri; Kerzhner, Tatiana; Ryaboy, Anna, RF antenna assembly for treatment of inner surfaces of tubes with inductively coupled plasma.
  520. Chalmers Scott A., Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sample.
  521. Brace John G. (Brown Deer WI), Rapid estimation of the oxygen permeation rate of a thin film on a plastic container.
  522. Ghandhi Jamshed B., Rapid evaluation of thin-film barrier coatings on thick substrates via transient response measurements.
  523. Ghandhi Jamshed B., Rapid evaluation of thin-film barrier coatings on thick substrates via transient response measurements.
  524. Bicker,Matthias; Behle,Stephan; Klippe,Lutz; L��ttringhaus Henkel,Andreas; Arnold,Gregor, Rapid process for the production of multilayer barrier layers.
  525. Chappa, Ralph A.; Stucke, Sean M.; Amos, Richard A.; Everson, Terrence P.; Chudzik, Stephen J.; Read, legal representative, Pam; Swan, Dale G.; Duquette, Peter H., Reagent and method for providing coatings on surfaces.
  526. Chappa, Ralph A.; Stucke, Sean M.; Amos, Richard A.; Everson, Terrence P.; Chudzik, Stephen J.; Swan, Dale G.; Duquette, Peter H., Reagent and method for providing coatings on surfaces.
  527. Chappa,Ralph A.; Stucke,Sean M.; Amos,Richard A.; Everson,Terrence P.; Chudzik,Stephen J.; Swan,Dale G.; Duquette,Peter H., Reagent and method for providing coatings on surfaces.
  528. Konrad, Franz, Receiving device comprising an adjustable covering element.
  529. Gorokhovsky, Vladimir I., Rectangular cathodic arc source and method of steering an arc spot.
  530. Glowacki, Kristoffer; Thörne, Johan Fredrik; Larsson, Lars-Åke Lennart; Hager, Jörgen Bruno, Reducing withdrawal force in a safety IV catheter.
  531. Keller John H., Reduction of semiconductor structure damage during reactive ion etching.
  532. Robert Zurcher ; C. Mark Newby, Resealable closure for containers.
  533. Grippi Nicholas A. (Nutley NJ), Rubber/plastic stopper composite with mechanical adhesive joints.
  534. Sudo Morihiro,JPX ; Kawachi Yasushi,JPX, Sanitary container.
  535. Sudo Morihiro,JPX ; Kawachi Yasushi,JPX, Sanitary container and production process thereof.
  536. Ando,Kazunori; Nihei,Amiko, Scanning probe microscopy system and method of measurement by the same.
  537. Liu, Yongming; Zhao, Xia, Sealing members, articles using the same and methods of reducing sticktion.
  538. Zhao, Xia; Liu, Yongming, Sealing members, articles using the same and methods of reducing sticktion.
  539. Sudo Masamichi,JPX ; Muraki Tomoyasu,JPX, Sealing stopper for a syringe and a prefilled syringe.
  540. Miller Henry F., Self-sealing closure for a medical speciman collection container.
  541. Yamartino, John M.; Loewenhardt, Peter K.; Lubomirsky, Dmitry; Singh, Saravjeet, Shaping a plasma with a magnetic field to control etch rate uniformity.
  542. Terry,Richard N.; Walsh,Kevin, Silane copolymer compositions containing active agents.
  543. Charles Dominic Iacovangelo, Silicon dioxide deposition by plasma activated evaporation process.
  544. Namiki, Tsunehisa; Ieki, Toshihide; Kurashima, Hideo; Inagaki, Hajime; Kobayashi, Akira; Yamada, Koji; Tanikawa, Miwako, Silicon oxide film.
  545. Lim, Kiang Heng; Lau, Steven, Single use syringe.
  546. Moh, Jon Yaohan; Pelkey, Brian J.; Griggs, Julia E., Single-use syringe.
  547. Sudo Morihiro,JPX, Sliding piston for syringe.
  548. Takashima,Jun; Ekawa,Koichi; Murai,Hideyuki, Spectrometric measuring instrument.
  549. Givens John H. (Boise ID) Elliott Richard L. (Meridian ID), Sputter deposition method for improved bottom and side wall coverage of high aspect ratio features.
  550. Kim Byeong-Chan,KRX, Sputtering deposition apparatus and method utilizing charged particles.
  551. Kobayashi Masahiko,JPX ; Takahashi Nobuyuki,JPX, Sputtering device and sputtering method.
  552. Tateishi Hideki (Yokohama JPX) Saito Hiroshi (Fujisawa JPX) Sasaki Shinji (Yokohama JPX) Horiuchi Mitsuaki (Hachioji JPX), Sputtering process and an apparatus for carrying out the same.
  553. Bryan William J. (Granby CT) Perrotti Patrick A. (Newington CT), Sputtering process burnable poison coating.
  554. Lagowski, Jacek; Savtchouk, Alexander; Wilson, Marshall D., Steady state method for measuring the thickness and the capacitance of ultra thin dielectric in the presence of substantial leakage current.
  555. Savtchouk, Alexander; Lagowski, Jacek; D'amico, John; Wilson, Marshall D.; Jastrzebski, Lubomir L., Steady state method for measuring the thickness and the capacitance of ultra thin dielectric in the presence of substantial leakage current.
  556. Hetzler, Kevin George; Lubrecht, Thea, Sterilizable transfer or storage device for medicaments, drugs and vaccines.
  557. Hetzler, Kevin George; Lubrecht, Thea, Sterilizable transfer or storage device for medicaments, drugs and vaccines.
  558. Niermann, Volker; Iskra, Michael J., Stopper-shield assembly.
  559. Burns James A. (Elizabeth NJ), Stopper-shield combination closure.
  560. Honda, Masanobu, Substrate processing method.
  561. Dunn Terry S. (Raleigh NC) Montgomery David B. (Cary NC) Williams Joel L. (Cary NC), Substrate with chemically modified surface and method of manufacture thereof.
  562. Bookbinder, Dana Craig; Fiacco, Richard Michael; Hrdina, Kenneth Edward; Moore, Lisa Anne; Schiefelbein, Susan Lee, Synthetic silica glass optical material having high resistance to laser induced damage.
  563. Sudo, Morihiro; Koshidaka, Tsuyoshi, Syringe piston.
  564. Geiger, Andreas; Wittland, Frank, Syringe tip cap and method for producing a syringe tip cap.
  565. Moesli, Thomas; Wolbring, Peter, Syringe with a closure.
  566. DiGregorio, Henry; Foote, David; Getty, James, Syringes with a reduced susceptibility to freeze-thaw void formation and methods of manufacturing such syringes.
  567. Elsayed-Ali, Hani E.; Waldbusser, Edwin, System for deposition of inert barrier coating to increase corrosion resistance.
  568. Morrow, Darrell R., System for determing the integrity of a package or packaging material based on its transmission of a test gas.
  569. Kim, Jong-Bum; Lefkowitz, Steven Martin; Nobile, John, Thin film coated microwell arrays.
  570. Kim, Jong-Bum; Lefkowitz, Steven Martin; Nobile, John; Roth, George Thomas; Yu, Pengguang, Thin film coated microwell arrays and methods of using same.
  571. Borghs Gustaaf Regina,BEX ; Deneffe Kristin Johanna Leona,BEX, Thin film deposition chamber with ECR-plasma source.
  572. Matsuoka Morito (Hitachi JPX) Ono Ken\ichi (Mito JPX), Thin film forming apparatus.
  573. Negahdaripour Shahriar ; Khamene Ali, Thin film measuring device and method.
  574. Khuri-Yakub B. T. (Palo Alto CA) Bhardwaj Sanjay (Stanford CA) Saraswat Krishna (Cupertino CA), Thin film process monitoring techniques using acoustic waves.
  575. Rosencwaig Allan (Danville CA) Opsal Jon (Livermore CA), Thin film thickness measurement with thermal waves.
  576. Hirose, Takenori; Noguchi, Minori; Kenbo, Yukio; Maeda, Shunji; Ninomiya, Takanori; Tsuchiyama, Hirofumi, Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same.
  577. Hannotiau Michel (Jodoigne BEX) Renard Guy (Tarcienne BEX) Terneu Robert (Thimon BEX), Thin film thickness monitoring with the intensity of reflected light measured at at least two discrete monitoring wavele.
  578. Felts John T. (Alameda CA), Thin gas barrier films.
  579. Huang, Xueying, Thin nanometer-controlled polymer film gradient.
  580. Haque Reza (Hamden CT) Smith ; III Edward F. (Madison CT), Three-step plasma treatment of copper foils to enhance their laminate adhesion.
  581. Jack W. Moorman ; M. Elizabeth Bush, Track ablation device and methods of use.
  582. Soerensen, Anne; Sparholt, Philip Albert; Hansen, Marianne Rye, Transparent, flexible, impermeable plastic container for storage of pharmaceutical liquids.
  583. Morita Yutaka (Takarazuka JPX) Katayama Masayoshi (Yokohama JPX) Kato Takashi (Kawasaki JPX), Turbine flowmeter.
  584. Gordon Lee Graff ; Mark Edward Gross ; Ming Kun Shi ; Michael Gene Hall ; Peter Maclyn Martin ; Eric Sidney Mast, Ultrabarrier substrates.
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