Organosilica materials, which are a polymer of at least one independent monomer of Formula Z1OZ2OSiCH23 (I), wherein Z1 and Z2 each independently represent a hydrogen atom, a C1-C4 alkyl group or a bond to a silicon atom of another monomer and at least one other monomer is provided herein. Methods o
Organosilica materials, which are a polymer of at least one independent monomer of Formula Z1OZ2OSiCH23 (I), wherein Z1 and Z2 each independently represent a hydrogen atom, a C1-C4 alkyl group or a bond to a silicon atom of another monomer and at least one other monomer is provided herein. Methods of preparing and processes of using the organosilica materials, e.g., for gas separation, color removal etc., are also provided herein.
대표청구항▼
1. An organosilica material, which is a polymer of at least one independent monomer unit of Formula [Z1OZ2OSiCH2]3 (I), wherein Z1 and Z2 each independently represent a hydrogen atom or a bond to a silicon atom of another monomer unit and at least one other monomer unit selected from the group consi
1. An organosilica material, which is a polymer of at least one independent monomer unit of Formula [Z1OZ2OSiCH2]3 (I), wherein Z1 and Z2 each independently represent a hydrogen atom or a bond to a silicon atom of another monomer unit and at least one other monomer unit selected from the group consisting of: (i) an independent unit of Formula Z3OZ4Z5Z6Si (II), wherein each Z3 represents a hydrogen atom or a bond to a silicon atom of another monomer unit; and Z4, Z5 and Z6 are each independently selected from the group consisting of a hydroxyl group, a C1-C4 alkyl group, a nitrogen-containing C1-C10 alkyl group, a nitrogen-containing heteroaralkyl group, a nitrogen-containing optionally substituted heterocycloalkyl group, and an oxygen atom bonded to a silicon atom of another monomer unit;(ii) an independent unit of Formula Z7Z8Z9Si—R1—SiZ7Z8Z9 (III), wherein each Z7 independently represents a hydroxyl group or an oxygen bonded to a silicon atom of another monomer unit; each Z8 and Z9 independently represent a hydroxyl group, a C1-C4 alkyl group or an oxygen bonded to a silicon atom of another monomer unit; and each R1 represents a nitrogen-containing C2-C10 alkylene group; and(iii) a combination thereof. 2. The organosilica material of claim 1, wherein Z1 and Z2 each independently represent a hydrogen atom or a bond to a silicon atom of another monomer unit. 3. The organosilica material of claim 1, wherein at least one independent unit of Formula (II) is present, wherein each Z3 represents a hydrogen atom or a bond to a silicon atom of another monomer unit; and Z4, Z5 and Z6 are each independently selected from the group consisting of a hydroxyl group, a C1-C2 alkyl group, a nitrogen-containing C4-C10 alkyl group, a nitrogen-containing C4-C10 heteroaralkyl group, or a nitrogen-containing optionally substituted C4-C10 heterocycloalkyl group. 4. The organosilica material of claim 3, wherein each Z3 represents a hydrogen atom or a bond to a silicon atom of another monomer unit; and Z4, Z5 and Z6 are each independently selected from the group consisting of a hydroxyl group, and an oxygen bonded to a silicon atom of another monomer unit. 5. The organosilica material of claim 1, wherein at least one independent unit of Formula (III) is present, wherein each Z7 represents a hydroxyl group or an oxygen bonded to a silicon atom of another monomer unit; each Z8 and Z9 independently represent a hydroxyl group, a C1-C2 alkyl group or an oxygen bonded to a silicon atom of another monomer unit; and each R1 represents a nitrogen-containing C4-C10 alkyl group. 6. The organosilica material of claim 5, wherein each Z7 represents a hydroxyl group or an oxygen bonded to a silicon atom of another monomer unit; each Z8 and Z9 independently represent a hydroxyl group, methyl or an oxygen bonded to a silicon atom of another monomer unit; and each R1 is selected from the group consisting of 7. The organosilica material of claim 1 further comprising a monomer unit selected from the group consisting of: (i) an independent unit of Formula [Z10OZ11SiCH2]3 (IV), wherein each Z10 represents a hydrogen atom or a bond to a silicon atom of another monomer unit and each Z11 represents a hydroxyl group, a C1-C6 alkyl group or an oxygen atom bonded to a silicon atom of another monomer unit;(ii) an independent unit of Formula Z12OZ13Z14Z15Si (V), wherein each Z12 represents a hydrogen atom or a bond to a silicon atom of another monomer unit; and Z13, Z14 and Z15 are each independently selected from the group consisting of a hydroxyl group, a C1-C4 alkyl group, and an oxygen atom bonded to a silicon atom of another monomer unit;(iii) an independent unit of Formula Z16Z17Z18Si—R2—SiZ16Z17Z18 (VI), wherein each Z16 independently represents a hydroxyl group or an oxygen bonded to a silicon atom of another monomer unit; each Z17 and Z18 independently represent a hydroxyl group, a C1-C4 alkyl group or an oxygen bonded to a silicon atom of another monomer unit; and each R2 is selected from the group consisting of a C1-C8 alkylene group, a C2-C8 alkenylene group, a C2-C8 alkynylene group an optionally substituted C6-C20 aralkyl and an optionally substituted C4-C20 heterocycloalkyl group; and(iv) a combination thereof. 8. The organosilica material of claim 1, wherein the organosilica has an average pore diameter between about 2.0 nm and about 25.0 nm. 9. The organosilica material of claim 1, wherein the organosilica material has a total surface area of about 500 m2/g to about 2000 m2/g. 10. The organosilica material of claim 1, wherein the organosilica material has a pore volume of about 3.0 cm3/g to about 10 cm3/g. 11. The organosilica material of claim 1, further comprising at least one catalytic metal incorporated within the pores of the material. 12. The organosilica material of claim 11, wherein the catalytic metal is selected from the group consisting of a Group 6 element, a Group 8 element, a Group 9 element, a Group 10 element and a combination thereof. 13. The organosilica material of claim 1 made using essentially no structure directing agent or porogen. 14. A gas separation process comprising contacting a gas mixture containing at least one contaminant with the organosilica material of claim 1. 15. The process of claim 14, wherein the gas mixture comprises CH4 and the at least one contaminant is CO2 and/or H2S. 16. The process of claim 14, wherein the process comprises PSA, TSA, PPSA, PTSA, RCPSA, RCTSA, RC-PPSA or RC-PTSA. 17. A process for selectively separating a contaminant from a feed gas mixture, the process comprising: a) contacting the feed gas mixture under sorption conditions with the organosilica material of claim 1;b) adsorbing the contaminant into/onto the organosilica material;c) subjecting the organosilica material of claim 1 to desorption conditions by which at least a portion of the sorbed contaminant is desorbed; andd) retrieving a contaminant-rich product stream that has a higher mol % of contaminant than the feed gas mixture. 18. The process of claim 17, wherein the feed gas mixture comprises CH4. 19. The process of claim 17, wherein the contaminant is CO2 and/or H2S.
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