A repeating setpoint generator module selectively varies a setpoint for an output parameter according to a predetermined pattern that repeats during successive time intervals. A closed-loop module, during a first one of the time intervals, generates N closed-loop values based on N differences betwee
A repeating setpoint generator module selectively varies a setpoint for an output parameter according to a predetermined pattern that repeats during successive time intervals. A closed-loop module, during a first one of the time intervals, generates N closed-loop values based on N differences between (i) N values of the setpoint at N times during the first one of the time intervals and (ii) N measurements of the output parameter at the N times during the first one of the time intervals, respectively. An adjusting module, during the first one of the time intervals, generates N adjustment values based on N differences between (i) N values of the setpoint at the N times during a second one of the time intervals and (ii) N measurements of the output parameter at the N times during the second one of the time intervals, respectively.
대표청구항▼
1. A method of generating an output power, the method comprising: selectively varying a setpoint for an output parameter according to a predetermined pattern that repeats during successive time intervals;during a first one of the time intervals, generating N closed-loop values based on N differences
1. A method of generating an output power, the method comprising: selectively varying a setpoint for an output parameter according to a predetermined pattern that repeats during successive time intervals;during a first one of the time intervals, generating N closed-loop values based on N differences between (i) N values of the setpoint at N times during the first one of the time intervals and (ii) N measurements of the output parameter at the N times during the first one of the time intervals, respectively;during the first one of the time intervals, generating N adjustment values based on N differences between (i) N values of the setpoint at the N times during a second one of the time intervals and (ii) N measurements of the output parameter at the N times during the second one of the time intervals, respectively, wherein the second one of the time intervals is the time interval immediately preceding the first one of the time intervals;applying, using a power amplifier, output power to a load;generating N output values based on the N closed-loop values and the N adjustment values, respectively; andcontrolling power input to the power amplifier based on the N output values. 2. The method of claim 1 wherein the N times are equally spaced. 3. The method of claim 1 wherein the N times are not equally spaced. 4. The method of claim 1 wherein generating the N closed-loop values comprises generating the N closed-loop values using proportional-integral (PI) control. 5. The method of claim 1 wherein generating the N adjustment values comprises generating the N adjustment values using proportional-integral (PI) control. 6. The method of claim 1 further comprising: generating the N output values further based on a mixing ratio; andselectively varying the mixing ratio. 7. The method of claim 1 further comprising selectively adjusting a fundamental frequency of the power amplifier. 8. The method of claim 7 further comprising selectively adjusting the fundamental frequency of the power amplifier based on a reflected power. 9. The method of claim 7 further comprising selectively adjusting the fundamental frequency of the power amplifier based on a reflection coefficient. 10. The method of claim 1 further comprising applying, using the power amplifier, the output power to a plasma electrode. 11. The method of claim 1 further comprising: determining a distortion of the output power; andselectively adjusting a fundamental frequency of the power amplifier based on the distortion. 12. The method of claim 11 further comprising: determining a first frequency adjustment based on the distortion and at least one previous amount of distortion of the output power;determining a second frequency adjustment based on at least one previous amount of distortion of the output power; andsetting the fundamental frequency of the power amplifier based on a previous fundamental frequency of the power amplifier, the first frequency adjustment, and the second frequency adjustment. 13. The method of claim 12 further comprising determining the second frequency adjustment based on at least one previous value of the second frequency adjustment. 14. A method of generating an output power, the method comprising: selectively varying a setpoint for an output parameter according to a predetermined pattern that repeats during successive time intervals;during a first one of the time intervals, generating N adjustment values based on N differences between (i) N values of the setpoint at N times during a second one of the time intervals and (ii) N measurements of the output parameter at the N times during the second one of the time intervals, respectively, wherein the second one of the time intervals is the time interval immediately preceding the first one of the time intervals;generating N output values based on N closed-loop values and the N adjustment values, respectively; andcontrolling power input to a power amplifier based on the N output values. 15. The method of claim 14 further comprising during the first one of the time intervals, generating the N closed-loop values based on N differences between (i) N values of the setpoint at the N times during the first one of the time intervals and (ii) N measurements of the output parameter at the N times during the first one of the time intervals, respectively. 16. The method of claim 15 further comprising applying, using a power amplifier, the output power to a load. 17. The method of claim 14 further comprising applying, using a power amplifier, the output power to a load. 18. The method of claim 14 wherein the N times are equally spaced. 19. The method of claim 14 wherein the N times are not equally spaced. 20. The method of claim 14 wherein generating the N closed-loop values comprises generates the N adjustment values using at least one of proportional, integral, or derivative control. 21. The method of claim 14 further comprising: generating the N output values further based on a mixing ratio; andselectively varying the mixing ratio. 22. The method of claim 14 further comprising selectively adjusting a fundamental frequency of the output power. 23. The method of claim 22 further comprising selectively adjusting the fundamental frequency of the output power based on a reflected power. 24. The method of claim 22 further comprising selectively adjusting the fundamental frequency of the output power based on a reflection coefficient. 25. The method of claim 14 further comprising applying, using a power amplifier, the output power to a plasma electrode. 26. The method of claim 14 further comprising: determining a distortion of the output power; andselectively adjusting a fundamental frequency of the power amplifier based on the distortion. 27. The method of claim 14 further comprising: determining a first frequency adjustment based on the distortion and at least one previous amount of distortion of the output power;determining a second frequency adjustment based on at least one previous amount of distortion of the output power; andsetting the fundamental frequency of the power amplifier based on a previous fundamental frequency of the power amplifier, the first frequency adjustment, and the second frequency adjustment. 28. The method of claim 27 further comprising determining the second frequency adjustment based on at least one previous value of the second frequency adjustment.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (29)
Coumou, David J., Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events.
Coumou, David J.; Pham, Richard, Feedback control and coherency of multiple power supplies in radio frequency power delivery systems for pulsed mode schemes in thin film processing.
Coumou, David J.; Fisk, II, Larry J.; Radomski, Aaron T.; Kim, Jaehyun; Lee, Sang-Won; Smyka, Jonathan, Synchronization of RF pulsing with RF metrology, processing, and control.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.