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A reactor for preparing granular polysilicon by deposition of polycrystalline silicon on silicon seed particles has a reaction vessel, an inner reactor tube for a fluidized bed comprising granular polysilicon and a reactor bottom within the reactor vessel, a heating device for heating the fluidized

A reactor for preparing granular polysilicon by deposition of polycrystalline silicon on silicon seed particles has a reaction vessel, an inner reactor tube for a fluidized bed comprising granular polysilicon and a reactor bottom within the reactor vessel, a heating device for heating the fluidized bed in the inner reactor tube, at least one bottom gas nozzle for introduction of fluidizing gas and at least one reaction gas nozzle for introduction of reaction gas, a feed device to introduce silicon seed particles, an offtake line for granular polysilicon, and a device for discharging reactor offgas from the reactor vessel, and has a cylindrical component which has openings on its cylindrical surface, with at least 5% and not more than 95% of the cylindrical surface being open located between the inner reactor tube and the heating device.

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1. A reactor for preparing granular polysilicon by deposition of polycrystalline silicon on silicon seed particles, comprising: a reaction vessel having a reactor bottom; an inner reactor tube for a fluidized bed comprising granular polysilicon, a heater for heating the fluidized bed in the inner re

1. A reactor for preparing granular polysilicon by deposition of polycrystalline silicon on silicon seed particles, comprising: a reaction vessel having a reactor bottom; an inner reactor tube for a fluidized bed comprising granular polysilicon, a heater for heating the fluidized bed in the inner reactor tube; at least one bottom gas nozzle for introduction of fluidizing gas and at least one reaction gas nozzle for introduction of reaction gas; a silicon seed particle feed; an offtake line for granular polysilicon; a reactor offgas discharge for discharging reactor offgas from the reactor vessel; and a cylindrical component which has openings on its cylindrical surface such that at least 5% and not more than 95% of the cylindrical surface is open, the cylindrical component located between the inner reactor tube and the heater, and comprising a thermally conductive material such that heat energy is transferred by heat radiation and heat conduction to the cylindrical component such the cylindrical component can be brought to incandescence, or wherein the component comprises a material which is permeable to radiation energy from the heater. 2. The reactor of claim 1, wherein 40-70% of the cylindrical surface of the component is open. 3. The reactor of claim 2, wherein 45-60% of the cylindrical surface of the component is open. 4. The reactor of claim 1, wherein the heater comprises a resistance heater having a meandering shape or comprises a plurality of individual heating elements. 5. The reactor of claim 1, wherein the heater comprises a plurality of heating elements arranged concentrically around the inner reactor tube and the cylindrical component is also arranged concentrically around the inner reactor tube and within the heater. 6. The reactor of claim 1, wherein the heater comprises heating elements which are positioned in openings of the cylindrical component. 7. The reactor of claim 1, wherein the cylindrical component is constructed of at least one material selected from the group consisting of graphite, CFC, silicon, SiC and fused silica, or wherein the cylindrical component is coated with one or more of these materials.