한국화학연구원 Korea Research Institute of Chemical Technology
등록번호
TRKO200300002289
DB 구축일자
2013-04-18
초록▼
1. 1차년도 : 폴리머 광굴절제어고분자 설계, 다중 모드 광도파로 제작 공정의 개발 및 확립 -문헌조사 -광굴절제어고분자 설계 및 합성 -굴절률 특성평가 장치 구성 -PDMS 몰드를 이용한 몰딩 방법으로 폴리머 다중 모드 광도파로를 제작하는 공정을 개발, 확립 2. 2차년도 : 광굴절제어기능소재 합성, 초단거리 광 연결용 광도파로의 성능 향상 및 단거리 광연결용 광도파로 소자 개발 -폴리머 수율 및 열안정성 향상, 고분자 구조 제어에 따른 광기능성 규명 및 특성 평가 -폴리머 재료의 개선에 의
1. 1차년도 : 폴리머 광굴절제어고분자 설계, 다중 모드 광도파로 제작 공정의 개발 및 확립 -문헌조사 -광굴절제어고분자 설계 및 합성 -굴절률 특성평가 장치 구성 -PDMS 몰드를 이용한 몰딩 방법으로 폴리머 다중 모드 광도파로를 제작하는 공정을 개발, 확립 2. 2차년도 : 광굴절제어기능소재 합성, 초단거리 광 연결용 광도파로의 성능 향상 및 단거리 광연결용 광도파로 소자 개발 -폴리머 수율 및 열안정성 향상, 고분자 구조 제어에 따른 광기능성 규명 및 특성 평가 -폴리머 재료의 개선에 의한 초단거리 광 연결용 광도파로의 성능 향상 -단거리 광 연결용 광도파로 소자 개발 (몰딩 방법을 이용하여 1 mm x 1 mm 크기를 가지는 단거리 광도파로를 제작하는 공정 확립, 확립된 공정을 이용하여 1x2 광파워 분할기의 설계 및 제작) 3. 3차년도 : 광굴절률제어용 폴리머 재료의 함성조건 확보 및 소재 sample 공급, 광원, 광검출기와 결합 가능한 구조를 가지는 광도파로의 제작 기술 개발 및 다중 모드 광도파로 제작 기술을 이용한 소자 제작 -가역적 광굴절 제어 폴리머 소재 합성, 소재 sample 공급 -포토폴리머 소재 합성 및 정보저장기법연구 -초단거리(보드 상) 광 연결에 필요한, 광원 및 광검출기와 광도파로를 결합하는 방법 개발-다중 모드 광도파로 제작 기술을 이용하여 단일 모드 광도파로와 다중 모드 광도파로가 결합된 소자의 설계 및 제작
Abstract▼
1) Preparation of polymers having low optical loss with high refarctive index change upon light exposure. We have accumulated synthetic skills for polymers doped or chemically bound with photoisomerizable chromophores. Synthetic methods for stable monomers and polymers have been established. Part
1) Preparation of polymers having low optical loss with high refarctive index change upon light exposure. We have accumulated synthetic skills for polymers doped or chemically bound with photoisomerizable chromophores. Synthetic methods for stable monomers and polymers have been established. Particularly important was the development of photocurable fluorinated solutions. The solutions could be easily spin-coated onto silicon substrates and form highly transparent films under irradiation with UV light within 2 min. The resultant films showed very low optical loss (0.35 dB/cm) plus low birefringency (n : 0.001) upon polymerization. Polymer films having high refarctive index change upon light exposure was prepared using the photocurable fluorinated solutions and photoisomerizable chromophore. The resultant films contains 10 wt % of photoisomerizable chromophore showed photo induced refractive index change of 0.002 by Vis and UV light. 2) Preparation of Photopolymers We develop photopolymers, techniques for film preparation, instrumental set up and evaluation method for holographic recording. Finally we attempt to apply these newly developed phtochromic polymers to holographic recording media. Photopolymer film was prepared by doping the aromatic acrylate into a transparent polymeric binder or sol-gel process using organically modified alkoxy silanes. In particular, sol-gel process using organically modified alkoxy silanes and an aromatic methacrylate (AMA) gave an increased refractive index change upon visible light excitation. Furthermore, photopolymer films having visible light sensitivity could be fabricated in thickness up to ∼ 1 millimeter. The photopolymerization was monitored by FT-IR and photo-DSC. These phothpolymer films could be applied to a holographic memory. Plane-wave-grating holograms could be written onto the photopolymer film by interfering two collimated plane wave beams of 532 nm. The original letter image with rectangular pixel was completely reconstructed on the photopolymer film with high resolution. 3) Multiplexed hologram storage in photopolymers We studied 100 ㎛ Dupont photopolymer(HRF-150-100) for characteristics of hologram formation at 514 nm with various grating spacings and light intensities as well as shrinkage ratios with various incident angles. To combine rotational and angular multiplexings, we used two different rotational multiplexing schemes by rotation of photopolymer and reference beam, We also performed shift-rotational multilpexing with rotation of reference beam. 4) Development of rewritable holographic recording film Photochromic polymer films for rewritable holographic recording media was prepared by using acetyl substituted diarylethene (DAMBTF6) and fluorinated acrylate matrix. Photochromic films of 200 micron tllickness could be easily prepared by photo curing of the DAMBTF6 mixture in the presence of a photo initiator. The resultant transparent films showed color change from Pale yellow to a red by switching ligh source from visible (532 nm) to an ultraviolet (365 nm). Reversible refractive index change could be attained from the polymeric film using ultraviolet and visible light sources. Holographic recording was performed the photochromic films by interfering two collimated plane wave beams. The records were completely erased upon excitation with a visible or ultraviolet light, and the film was rewritable either by 532 nm laser or by 325 nm laser. Recording and erasing was possible within 2 sec. Images were recorded onto a pixelated spatial light modulator (SLM) with rectangular pixel apertures and reconstructed on the photochromic films to show recovery of the original images with high resolution. 5) Polymer device (1) Development of molding process with a PDMS mold Polymeric large-core (47 ㎛ x 41 ㎛) optical waveguides for optical interconnection have been fabricated by using a molding process with a polydimethylsiloxane (PDMS) mold. For low-cost low-loss large-core waveguides, our newly developed thick-photoresist patterning process is used for a master fabrication. Also a low-loss thermocurable polymer, perfluorocyclobutane(PFCB) , is used in fabricating optical waveguides by the molding process for the first time. The propagation loss is measured to be 0.4 dB/cm at the wavelength of 1.3 ㎛. (2) Fabrication of a multimode waveguide using improved UV-curable polymer Multimode polymer optical waveguides have been fabricated by using the transfer molding process with a PDMS mold. By using this simple process and our newly developed UV curable materials (EFIRON WR series), large core size (45 ㎛ x 45 ㎛) multimode waveguides for very short-distance optical interconnection applications are easily prepared. Resulting waveguides exhibit very smooth surface profile and square cross section of core dimension. The propagation loss of fabricated waveguide is measured to 0.2dB/cm at 850nm (3) Fabrication of multimode waveguide devices for short-distance optical interconnection Large-core (1000 ㎛ x 1000 ㎛) multimode optical waveguide devices for a short-distance optical interconnection are fabricated by a molding process with a PDMS mold. The master is patterned by using Su-8 thick-photoresist developed for micro-electromechanical systems(MEMS) fabrication. The PDMS mold is used to replicate the waveguide pattern of NOA72, UV-curable epoxy The propagation loss of the waveguide is about 0.5 dB/cm at the wavelength of 650 nm, Based on these waveguides, two types of the power splitter have been fabricated; one is T-shaped and the other Y-shaped. The T-shaped splitter has a structural excess loss of 1.5 dB and its split ratio is 1'0.96. The Y-shaped splitter has a structural excess loss of 0.3 dB and its split ratio is 1 : 1.04. (4) Fabrication of a multimode waveguide with a 45 degree mirror for optical interconnection Multimode waveguide with a 45 degree mirror is fabricated by a molding process with a PDMS mold. A thick photoresist Az9260 is used in patterning the master, The waveguide has dimensions of 50 Um x 50 Um since it is used for very short-distance optical interconnection like the interconnection on a board. For the replication to polymer, WG-25 and NOA73, UV-curable epoxy are used as core materials. The propagation losses are measured to be 0.9 dB/cm for WG-25 and 0.4 dB/cm for NOA73 at the wavelength of 850 nm. A method of fabricating 45 degree mirrors at the end of these waveguides by tilting the sample and illuminating UV is proposed. The measured loss of a mirror is about 0.9 dB. (5) Fabrication of a filter using the multimode waveguide fabrication process We have demonstrated the feasibility of the process fabricating a single-mode waveguide and a multimode waveguide aligned vertically on the same substrate. Using this process, we have proposed and demonstrated a filter that drops optical signal propagating in a single-mode waveguide to a multimode waveguide in the specific wavelength interval by a long-period grating, The fabrication process of this filter consists of conventional fabrication of the single-mode waveguide and fabrication of the multimode waveguide with a large cross-section area, e. g. 50 ㎛ x 50 ㎛ by the molding method with a PDMS mold. We have used thermo-curable polymers PFCB and BCB as the cladding and the core materials, respectively. For the multimode waveguide core polymer, we have used the UV-curable epoxy, NOA61. The center wavelength of the fabricated filter with a grating period of 315.9 ㎛ is 1537.7 nm. The grating-interaction length is 11 mm and the maximum attenuation at the center wavelength is 17.8 dB.
목차 Contents
제 1 장 연구개발과제의 개요...25
제 1 절 연구개발의 목적 및 필요성...25
1. 기술적 측면...25
가. 폴리머 광소자 소재...25
나. 폴리머 광소자...27
2. 경제. 산업적 측면...29
3. 사회. 문화적 측면...29
제 2 절 연구개발범위...30
1. 광굴절제어 고분자소재...30
2. 광연결용 폴리머 광소자...30
제 2 장 국내외 기술 개발 현황...32
제 1 절 광굴절제어 소재 및 광도파로 소재...32
제 2 절 포토 폴리머 및 이를 이용한 정보저장...34
제 3 절 폴리머 광연결소자...36
제 3 장 연구개발수행 내용 및 결과...38
제 1 절 이론적 접근...38
1. 광굴절률 제어...38
2. 고분자 광도파로 소재의 광진행 손실 특성...39
3. 고분자 광도파로 소재의 복굴절률 감소...41
4. 홀로그램 기록 매커니즘...42
제 2 절 실험...45
1. 시약 및 재료...45
2. 측정 기기...46
제 3 절 연구내용 및 결과...47
1. 저손실, 저이방성 볼소계 아크릴레이트 박막 특성 평가...47
가. 불소계 아크릴레이트 화합물의 합성...47
(1) 퍼플루오르 에틸렌옥시 카보네이트 디메타크릴레이트의 합성...47
(2) 퍼플루오르 펜틸 우레탄 디메타크릴레이트의 합성...47
(3) 퍼를루오르 헥산디올 디아크릴레이트의 합성...47
나. 불소계 아크릴레이트 조성물의 제조 및 박막 제조...48
다. 불소계 아크릴레이트 조성물을 이용한 광도파용 다층 고분자 박막의 제조 및 박막의 광손실측정...48
라. 불소계 아크릴레이트 조성물의 광경화 거동...49
마. 불소계 아크릴레이트 박막의 실리콘웨이퍼상의 morphology...50
바. 불소계 아크릴레이트 박막의 광손실 및 복굴절률 측정...51
2. 광굴절율 제어 소재의 제조 및 광유도 굴절율 변화...52
가. 불소계 아크릴레이트를 이용한 광굴절 제어 박막의 제조...52
나. 광굴절제어 고분자를 이용한 광변색 박막의 제조...53
다. 폴리스티렌 도핑 시스템을 이용한 광굴절제어 박막의 제조...53
라. 광유도 굴절율 변화 특성...53
(1) 불소계 아크릴레이트를 이용한 광굴절 제어 박막의 광유도 굴절율 변화 특성...53
(2) 광굴절 제어 고분자 및 폴리스티렌 도핑 시스템을 이용한 광굴절 제어 박막의 광유도 굴절율 변화 특성...54
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