초록

Abstract ▼

◎ Purpose
■Development of low-cost and high throughput replication and hetero-transfer process of 10~100nm scale, large-area, and highly integrated nano pattern.
- patterned feature size (line width) : 10nm~100nm, patterned pitch : 20nm~300nmm, patterned feature ratio (line width to gap size)

◎ Purpose
■Development of low-cost and high throughput replication and hetero-transfer process of 10~100nm scale, large-area, and highly integrated nano pattern.
- patterned feature size (line width) : 10nm~100nm, patterned pitch : 20nm~300nmm, patterned feature ratio (line width to gap size) : 1:1~1:9, patterned aspect ratio : 1:1~1:3, transmittance of patterned bare structured materials : 92%, patterned area : 8inch
■Commercialization of large area nano-structured anti-fog films/lens, nano-sized wire grid polarizer using 10~100nm scale patterning processes
- Development and commercialization of pitches under 100nm, nano-structured exterior and interior anti-fog films (pattern scale: 50nm, pattern radius: 0R~2R, transmittance : 92%, hardness: 2H, chemical resistance: pH 5~8, anti-fog stability: over 2years)
- Development and commercialization of pitches under 100nm, nano-structured anti-fog optical lens of eyeglasses (pattern scale: 20nm, pattern radius: 8R, transmittance : 92%, hardness: 2H, chemical resistance: pH 5~8, anti-fog stability: over 2years)
- Development and commercialization of pitches under 100nm, WGP (transmittance: 85%, extinction ratio: 10⁴, haze:<1%, extinction ratio distribution: <1%)
◎ Contents

■Development of 10~100nm scale, low-cost, and high-throughput replication-based process of large scale and highly integrated nano-pattern using reversible soft-lithography
■Development of surface energy formulation technology, mechanical modulation, surface pre- or post-treatment technology for reversible nano-structures transfer
■Development of optimized fabrication process of pitches under 100nm, nano-structured exterior and interior films and optical lens of eyeglasses

■Development of new materials and transfer printing process for the realization of novel sub-100 patterning technology.
■Fabrication of 8-inch, 10 - 50 nm width master template based on the self-assembly of block copolymers.
■Development of manufacturing process of wire-grid polarizer with a transmittance of >85% and extinction ratio of 10⁴.

■Simulation of nanostructures to find out their opto-electrical properties.
■Designing and fabricating of master mold which are based on simulation results.
■Research for realization of scaling of nanostructures.
■Research for fabricating of nanostructures and inventing damage-free transfer method via master mold.
■Fabricating devices using nanostructures and finding out their potential to application.
■Research for fabricating large-scale devices and their commercialization via nanostructures
◎ Expected Contribution
○Development of next-generation nano-structure patterning technology and its commercial applications can lead IT-based national growth in the global markets. (original technology, standard patents generation, and globally competitive technology)
○Nano-structured anti-fog films require high stability, and therefore, it can offer high market substitution effect to optical products, IT products, large-scale exterior materials, and eyeglasses that do not have anti-fog characteristics
■New WGP fabrication process based on nano-transfer printing technology will contribute to the reduction of power consumption and manufacturing cost.
■Nanostructures which can be applied to various devices bring out low-cost fabrication rather than photo-lithography process which is now widely used, but needs high-cost.
■It can not still to find out research group which research nanosturucture designing, fabrication and its application, it can create new industry and also bring out additional profit through technical transfer and royalty.

목차 Contents

• 표지 ... 1
• 목차 ... 2
• 국가연구개발사업 연차실적·계획서(협약용) ... 3
• 한 글 요 약 문 ... 4
• SUMMARY ... 5
• 연 구 분 야 ... 6
• Ⅰ. 실적 (1차년도) ... 7
• 1. 연구개발 목표 및 평가의 착안점 ... 7
• 2. 연구범위 및 연구수행 방법 ... 10
• 3. 연구수행 내용 및 결과 ... 11
• 3-1. 총괄연구개발과제 ... 11
• 3-2. 제1세부과제 ... 12
• 3-3. 제2세부과제 ... 22
• 3-3. 제3세부과제 ... 29
• 4. 연구개발목표의 달성도 및 자체평가 ... 37
• 5. 연구성과 ... 40
• 6. 연구비 집행실적 (총괄) ... 42
• 7. 연구수행에 따른 문제점 및 개선방향 ... 43
• 8. 중요 연구변경 사항 ... 44
• 9. 기타 건의사항 ... 45
• 10. 자체평가의견서 (총괄) ... 46
• 11. 연구비 사용실적 확인서 ... 59
• Ⅱ. 계획 (2차년도) ... 60
• Ⅱ-1. 총괄과제 (대면적 2D 나노구조화기술을 이용한 방습필름 및 WGP(Wire Grid Polarizer) 사업화) ... 60
• Ⅲ-2. 세부과제 ... 125
• Ⅲ-2-1. (세부과제 1) 2차원 크기 (Sub 100nm) 및 비용한계극복 나노구조화 (나노구조 방습필름/렌즈 상용화) ... 125
• Ⅲ-2-2. (세부과제 2) Sub-100nm 초미세 마스터 제작 및 이종전사를 위한 핵심 소재/공정 개발 (나노 Wire Grid Polarizer 상용화) ... 180
• Ⅲ-2-3. (세부과제 3) sub 100nm 비용한계극복 나노구조화 설계 및 평가 ... 222
• 끝페이지 ... 257