Nanotechnology (NT) has been received a great attention as one of the most important technologies in twenty-first century (21C) - biotechnology (BT), information technology (IT), and environmental technology (ET). A great effort has been made for better performance by down-sizing microstructures int...
Nanotechnology (NT) has been received a great attention as one of the most important technologies in twenty-first century (21C) - biotechnology (BT), information technology (IT), and environmental technology (ET). A great effort has been made for better performance by down-sizing microstructures into the 1 ~ 100nm regime, i.e., nanostructures in the developments of integrated circuits (IC). Nanostructures for the advanced IC require more complex and energy-intensive fabrication technique. Meanwhile, alternative materials we need in nanoscale have been received a growing attention because of their idiosyncratic natures and fascinating properties; many studies have been demonstrated these nanoscale materials, for example, carbon nanotube (CNT), deoxyribonucleic acid (DNA), composite nanowires, and nanoparticles are showing peculiar behaviors. Colloidal particles are subject to intensive research as building blocks for fabricating a single-electron transistor, a quantum dot, a high-density memory, periodic array nanopatterns, and photonic crystals with both opal and inverse opal structures. Although such materials are promising building blocks in integrated electronics and photonic systems. there is still a long way to go in the practical applications; the positioning and economic issues are remained to be solved yet. Many fabrication studies on using the colloidal particles, including field effect transistors, diodes, light-emitting diodes, diode lasers, photonic devices and photonic diode lasers, have demonstrated for just individual unit devices, not a fabrication in large area. Therefore, it is required novel ideas of the fabrication with low cost and manufacturing processes with controllable ways beyond the existing state of the art fabricating technique. Chap. 2 provides brief fundamental backgrounds: conventional photolithography, microcontact print, self-assembled monolayers (SAMs), and colloidal nanoparticles. Chap. 3 also describes the fabrication of colloidal crystals from two-dimensional (2D) patterns up to one-dimensional (1D) structure by drying-mediated self-assembly of monodisperse silica colloidal particles in geometrically confined drying cell placed on line patterned SiO_(2) surfaces. The convective transport direction over the physical line pattern's direction on the surfaces is responsible for the geometric pattern and surface coverage of self-assembling colloidal particles. We also explained the growth of "clear" 2D line patterns and 1D wire of the self-assembled colloids under the influence of convective flow direction on the physically patterned surfaces. Effects of patterned surface structures with the modulation of hydrophobicity in the fabrication of two-dimensional (2D) self-aligned colloidal crystals were addressed. In Chap. 4, it is demonstrated a novel fabrication method of nanostructures using self-assembled materials at two different length scales as a lithographic mask. A combined use of the self-assembled monolayers (SAMs) of octadecyltrichlorosilane (OTS) at a nanometer scale and the colloidal 2D crystal at the sub-micrometer scale enables us to produce a periodic nanometer scale pattern mask. It was also demonstrated the capability to control the size of the periodic patterns in the range of 50 ~ 100 nm by adjusting the size of the self-assembling silica colloidal particles. Effect of the capillary confined liquid on the size of the patterns was also discussed. Selective growth of TiO_(2) by atomic layer deposition (ALD) and of cobalt by chemical vapor deposition (CVD), and selective etching of SiO_(2) films through the patterned OTS-SAMs as a passivation layer allowed us to fabricate the periodic array of isolated nanostructures as well as nanoholes. Chap. 5 briefly surveys photonic crystals as future applications of the present work, and discussed some preliminary results.
Nanotechnology (NT) has been received a great attention as one of the most important technologies in twenty-first century (21C) - biotechnology (BT), information technology (IT), and environmental technology (ET). A great effort has been made for better performance by down-sizing microstructures into the 1 ~ 100nm regime, i.e., nanostructures in the developments of integrated circuits (IC). Nanostructures for the advanced IC require more complex and energy-intensive fabrication technique. Meanwhile, alternative materials we need in nanoscale have been received a growing attention because of their idiosyncratic natures and fascinating properties; many studies have been demonstrated these nanoscale materials, for example, carbon nanotube (CNT), deoxyribonucleic acid (DNA), composite nanowires, and nanoparticles are showing peculiar behaviors. Colloidal particles are subject to intensive research as building blocks for fabricating a single-electron transistor, a quantum dot, a high-density memory, periodic array nanopatterns, and photonic crystals with both opal and inverse opal structures. Although such materials are promising building blocks in integrated electronics and photonic systems. there is still a long way to go in the practical applications; the positioning and economic issues are remained to be solved yet. Many fabrication studies on using the colloidal particles, including field effect transistors, diodes, light-emitting diodes, diode lasers, photonic devices and photonic diode lasers, have demonstrated for just individual unit devices, not a fabrication in large area. Therefore, it is required novel ideas of the fabrication with low cost and manufacturing processes with controllable ways beyond the existing state of the art fabricating technique. Chap. 2 provides brief fundamental backgrounds: conventional photolithography, microcontact print, self-assembled monolayers (SAMs), and colloidal nanoparticles. Chap. 3 also describes the fabrication of colloidal crystals from two-dimensional (2D) patterns up to one-dimensional (1D) structure by drying-mediated self-assembly of monodisperse silica colloidal particles in geometrically confined drying cell placed on line patterned SiO_(2) surfaces. The convective transport direction over the physical line pattern's direction on the surfaces is responsible for the geometric pattern and surface coverage of self-assembling colloidal particles. We also explained the growth of "clear" 2D line patterns and 1D wire of the self-assembled colloids under the influence of convective flow direction on the physically patterned surfaces. Effects of patterned surface structures with the modulation of hydrophobicity in the fabrication of two-dimensional (2D) self-aligned colloidal crystals were addressed. In Chap. 4, it is demonstrated a novel fabrication method of nanostructures using self-assembled materials at two different length scales as a lithographic mask. A combined use of the self-assembled monolayers (SAMs) of octadecyltrichlorosilane (OTS) at a nanometer scale and the colloidal 2D crystal at the sub-micrometer scale enables us to produce a periodic nanometer scale pattern mask. It was also demonstrated the capability to control the size of the periodic patterns in the range of 50 ~ 100 nm by adjusting the size of the self-assembling silica colloidal particles. Effect of the capillary confined liquid on the size of the patterns was also discussed. Selective growth of TiO_(2) by atomic layer deposition (ALD) and of cobalt by chemical vapor deposition (CVD), and selective etching of SiO_(2) films through the patterned OTS-SAMs as a passivation layer allowed us to fabricate the periodic array of isolated nanostructures as well as nanoholes. Chap. 5 briefly surveys photonic crystals as future applications of the present work, and discussed some preliminary results.
Keyword
#nanopatterning periodic array surface nanostructure
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