본 연구는 광전소자 제조 공정에서 투명전극증착 후 열처리시 발생하는 out diffusion 현상과 염료감응 태양전지에서 flexible 기판 사용이 불가능한문제를 해결하는 방안으로 저온증착이 가능한 AZO/Ag/AZO 다층박막 시편을 제조하고, 그 특성을 분석하여 최적의 Ag 두께를 선정하였다. Ag 두께를 5, 7, 10, 13, 15[nm]로 증착하여 시편을 제조하고 각각의 미세구조특성, 전기적특성, 광학적특성 그리고 적외선반사특성을 분석하였다. 순수한 ...
본 연구는 광전소자 제조 공정에서 투명전극증착 후 열처리시 발생하는 out diffusion 현상과 염료감응 태양전지에서 flexible 기판 사용이 불가능한문제를 해결하는 방안으로 저온증착이 가능한 AZO/Ag/AZO 다층박막 시편을 제조하고, 그 특성을 분석하여 최적의 Ag 두께를 선정하였다. Ag 두께를 5, 7, 10, 13, 15[nm]로 증착하여 시편을 제조하고 각각의 미세구조특성, 전기적특성, 광학적특성 그리고 적외선반사특성을 분석하였다. 순수한 ZnO peak는 약 34.45°에서 관찰되었고, AZO peak는 Al2O3 의 첨가에 의해 오른쪽으로 미세하게 이동하여 관찰 되며, 모두 (002)면 우선 배향성을 나타내었다. Ag peak는 약 38.2°에서 관찰되었고, Ag 두께 5[nm]이상에서 두께가 증가 할 수 록 peak 강도가 증가하며, 모두 (111)면 우선 배향성을 나타내었다. 최적화된 AZO/Ag/AZO 다층박막의 Ag 두께는 13[nm]로 나타났으며, 여기서 면저항은 4.911[Ω/sq], 비저항은 [Ω·cm]로 AZO 박막에 비해 면저항은 약 400배, 비저항은 약 100배 감소하였다. 가시광영역 투과율은 77.82[%]로 AZO 박막에 비해 다소 감소하였으나 근적외선(1000nm) 반사율 64.26[%], 원적외선(2000nm) 반사율 90.23[%]의 적외선 반사특성을 나타내었다.
본 연구는 광전소자 제조 공정에서 투명전극 증착 후 열처리시 발생하는 out diffusion 현상과 염료감응 태양전지에서 flexible 기판 사용이 불가능한문제를 해결하는 방안으로 저온증착이 가능한 AZO/Ag/AZO 다층박막 시편을 제조하고, 그 특성을 분석하여 최적의 Ag 두께를 선정하였다. Ag 두께를 5, 7, 10, 13, 15[nm]로 증착하여 시편을 제조하고 각각의 미세구조특성, 전기적특성, 광학적특성 그리고 적외선반사특성을 분석하였다. 순수한 ZnO peak는 약 34.45°에서 관찰되었고, AZO peak는 Al2O3 의 첨가에 의해 오른쪽으로 미세하게 이동하여 관찰 되며, 모두 (002)면 우선 배향성을 나타내었다. Ag peak는 약 38.2°에서 관찰되었고, Ag 두께 5[nm]이상에서 두께가 증가 할 수 록 peak 강도가 증가하며, 모두 (111)면 우선 배향성을 나타내었다. 최적화된 AZO/Ag/AZO 다층박막의 Ag 두께는 13[nm]로 나타났으며, 여기서 면저항은 4.911[Ω/sq], 비저항은 [Ω·cm]로 AZO 박막에 비해 면저항은 약 400배, 비저항은 약 100배 감소하였다. 가시광영역 투과율은 77.82[%]로 AZO 박막에 비해 다소 감소하였으나 근적외선(1000nm) 반사율 64.26[%], 원적외선(2000nm) 반사율 90.23[%]의 적외선 반사특성을 나타내었다.
In this study, we manufactured AZO/Ag/AZO multi-layer film specimens that can be deposited at low low temperatures. This would solve the problem of the out-diffusion phenomenon during heat treatment that follows the transparent electrode deposition of the photoelectric device manufacturing process, ...
In this study, we manufactured AZO/Ag/AZO multi-layer film specimens that can be deposited at low low temperatures. This would solve the problem of the out-diffusion phenomenon during heat treatment that follows the transparent electrode deposition of the photoelectric device manufacturing process, as well as the problem of using flexible substrates for dye-sensitized solar cells. we also analyzed the characteristics of the manufactured specimens to deduce the optimal Ag thickness. The specimens were manufactured with Ag deposition thicknesses of 5, 7, 10, 13, and 15[nm]. The microstructural, electrical, optical, and ultraviolet reflectance characteristics were analyzed for each specimen. A pure ZnO peak was observed at approximately 34.45°. The AZO peak was observed to move toward the right as Al2O3 was added, and all specimens displayed a preferred orientation in the (002) plane. An Ag peak was observed at approximately 38.2°. For thicknesses greater than 5[nm], the peak intensity increased with thickness, and all specimens exhibited a preferred orientation in the (111) plane. The optimal Ag thickness for the AZO/Ag/AZO multi-layer film appeared to be 13[nm] where the sheet resistance and resistivity were 4.911[Ω/sq] and [Ω·cm], respectively, 400 times lower than AZO film for the former, and 100 times lower for the latter. While the multi-layer film’s permeability for the visible spectrum is 77.82[%], which is slightly lower than that achieved by the AZO film, its near-infrared(NIR){1000[nm]} reflectance coefficient was 64.26[%] and far-infrared(FIR){2000[nm]} reflectance coefficient was 90.23[%].
In this study, we manufactured AZO/Ag/AZO multi-layer film specimens that can be deposited at low low temperatures. This would solve the problem of the out-diffusion phenomenon during heat treatment that follows the transparent electrode deposition of the photoelectric device manufacturing process, as well as the problem of using flexible substrates for dye-sensitized solar cells. we also analyzed the characteristics of the manufactured specimens to deduce the optimal Ag thickness. The specimens were manufactured with Ag deposition thicknesses of 5, 7, 10, 13, and 15[nm]. The microstructural, electrical, optical, and ultraviolet reflectance characteristics were analyzed for each specimen. A pure ZnO peak was observed at approximately 34.45°. The AZO peak was observed to move toward the right as Al2O3 was added, and all specimens displayed a preferred orientation in the (002) plane. An Ag peak was observed at approximately 38.2°. For thicknesses greater than 5[nm], the peak intensity increased with thickness, and all specimens exhibited a preferred orientation in the (111) plane. The optimal Ag thickness for the AZO/Ag/AZO multi-layer film appeared to be 13[nm] where the sheet resistance and resistivity were 4.911[Ω/sq] and [Ω·cm], respectively, 400 times lower than AZO film for the former, and 100 times lower for the latter. While the multi-layer film’s permeability for the visible spectrum is 77.82[%], which is slightly lower than that achieved by the AZO film, its near-infrared(NIR){1000[nm]} reflectance coefficient was 64.26[%] and far-infrared(FIR){2000[nm]} reflectance coefficient was 90.23[%].
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