장파장 적외선 흡수체로 응용하기 위한 Au-black을 질소가스 분위기의 저진공에서 Au를 증발원으로 하여 제조하였고, 증착조건에 따른 Au-black의 미세구조 분석, 적외선 흡수도 측정 및 패턴형성 실험을 통해 Au-black의 특성을 조사하였다. 단위면적당 질량이 약 600 $\mu\textrm{g}$/㎝/sup 2/이고, 챔버압력이 약 1 Torr이상인 증착조건으로 제조된 Au-black에서 적외선이 포획되는 높은 밀도의 미세공동이 존재하였고, 이 Au-black의 적외선 흡수도는 3∼14 $\mu\textrm{g}$의 파장범위에서 대체로 90%정도였다. 약 900 $\mu\textrm{g}$/cm/sup 2/이하의 단위면적당 질량을 갖는 Au-black의 경우 감광액 lift-off 공정에 의한 패턴형성이 가능하였다. 적외선 흡수도, 열용량 및 패턴형성을 고려할 매 적외선 흡수체로서의 Au-black을 제조하기 위해서는 챔버압력이 약 1 Torr이고, 단위면적당 질량이 약 600 $\mu\textrm{g}$/cm/sup 2/인 증착조건이 가장 적합하였다.
장파장 적외선 흡수체로 응용하기 위한 Au-black을 질소가스 분위기의 저진공에서 Au를 증발원으로 하여 제조하였고, 증착조건에 따른 Au-black의 미세구조 분석, 적외선 흡수도 측정 및 패턴형성 실험을 통해 Au-black의 특성을 조사하였다. 단위면적당 질량이 약 600 $\mu\textrm{g}$/㎝/sup 2/이고, 챔버압력이 약 1 Torr이상인 증착조건으로 제조된 Au-black에서 적외선이 포획되는 높은 밀도의 미세공동이 존재하였고, 이 Au-black의 적외선 흡수도는 3∼14 $\mu\textrm{g}$의 파장범위에서 대체로 90%정도였다. 약 900 $\mu\textrm{g}$/cm/sup 2/이하의 단위면적당 질량을 갖는 Au-black의 경우 감광액 lift-off 공정에 의한 패턴형성이 가능하였다. 적외선 흡수도, 열용량 및 패턴형성을 고려할 매 적외선 흡수체로서의 Au-black을 제조하기 위해서는 챔버압력이 약 1 Torr이고, 단위면적당 질량이 약 600 $\mu\textrm{g}$/cm/sup 2/인 증착조건이 가장 적합하였다.
Au-black for the application of the long wavelength infrared absorber has been prepared by evaporating Au under nitrogen gas-filled low vacuum condition. Characteristics of the deposited Au-black were carefully investigated through structural analysis, infrared absorbance measurement, and patterning...
Au-black for the application of the long wavelength infrared absorber has been prepared by evaporating Au under nitrogen gas-filled low vacuum condition. Characteristics of the deposited Au-black were carefully investigated through structural analysis, infrared absorbance measurement, and patterning of the layer, all of which are dependent on the deposition condition. High density of micro-cavity that trapped infrared were obtained, and infrared absorbance in the wavelength range from 3 $\mu\textrm{g}$ to 14 $\mu\textrm{g}$ was found to be about 90% when the Au-black layer was produced under the deposition condition of mass Per area of about 600 $\mu\textrm{g}$/cm$^{2}$ and chamber pressure of above 1 Torr. Photoresist lift-off process could be performed to pattern the Au-black, of which mass per area was below 900 $\mu\textrm{g}$/cm/ sup 2/. In view of absorbance, heat capacity, and pattern formation, the deposition condition of chamber pressure of about 1 Tow and mass per area of about 600$\mu\textrm{g}$/cm$^{2}$ was most adequate for preparing the Au-black as an infrared absorber.
Au-black for the application of the long wavelength infrared absorber has been prepared by evaporating Au under nitrogen gas-filled low vacuum condition. Characteristics of the deposited Au-black were carefully investigated through structural analysis, infrared absorbance measurement, and patterning of the layer, all of which are dependent on the deposition condition. High density of micro-cavity that trapped infrared were obtained, and infrared absorbance in the wavelength range from 3 $\mu\textrm{g}$ to 14 $\mu\textrm{g}$ was found to be about 90% when the Au-black layer was produced under the deposition condition of mass Per area of about 600 $\mu\textrm{g}$/cm$^{2}$ and chamber pressure of above 1 Torr. Photoresist lift-off process could be performed to pattern the Au-black, of which mass per area was below 900 $\mu\textrm{g}$/cm/ sup 2/. In view of absorbance, heat capacity, and pattern formation, the deposition condition of chamber pressure of about 1 Tow and mass per area of about 600$\mu\textrm{g}$/cm$^{2}$ was most adequate for preparing the Au-black as an infrared absorber.
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