다음과 같은 기능을 한번의 로그인으로 사용 할 수 있습니다.
NTIS 바로가기
한국세라믹학회지 = Journal of the Korean Ceramic Society, v.42 no.5 = no.276, 2005년, pp.359 - 365
고철호 (경남대학교 대학원 재료공학과) , 김봉섭 (경남대학교 대학원 재료공학과) , 윤존도 (경남대학교 신소재공학부) , 김광호 (부산대학교 재료공학부)
AI-Helper
Silicon nitride coating films with various ratios of nitrogen to silicon contents were prepared and characterized. The film was coated on silicon substrate by sputtering method with changing nitrogen gas flow rate in a chamber. The nitrogen to silicon ratio was found to have values in a range from 0...
J. Finster, E.-D. Klinkenberg, and J. Heeg, ' ESCA and SEXAFS Investigations of Insulation Materials for ULSI Microelectromics Vacuum,' 41 [7-9] 1586-89 (1990)
V. Gottschalch, R. Schmidt, B. Rheinlander, D. Pudis, S. Hardt, J. Kvietkova, G Wagner, and R. Franzheld, ' Plasma-Enhanced Chemical Vapor Deposition of $SiO_{x}$ / $SiN_{x}$ Bragg Reflectors,' Thin Solid Films, 416 224-32 (2002)
G. M. Ingo, N. Zacchetti, D. delia Sala, and C. Coluzza, ' X-Ray Photoelectron Spectroscopy Investigation on the Chemical Structure of Amorphous Silicon Nitride (a- $SiN_{x}$ ),' J. Vac. Sci. Tech., A7 [5] 3048-55 (1989)
R. Padmanabhan and N. C. Saha, ' X-Ray Photoelectron and Auger Electron Spectroscopy Studies of Photochemical Vapor Deposition Silicon Nitrides,' J. Vac. Sci. Tech., A6 [4] 2226-31 (1988)
I. Umezu, T. Yamaguchi, K. Kohno, M. Inada, and A. Sugimura, ' Preparation of $SiN_{x}$ Film by Pulsed Laser Ablation in Nitrogen Gas Ambient,' Appl. Surf. Sci., 197-198 376-78 (2002)
E. Dehan, P. Temple-Boyer, R. Henda, J. J. Pedroviejo, and E. Scheid, ' Optical and Structural Properties of $SiO_{x}$ and $SiN_{x}$ Materials,' Thin Solid Films, 266 14-9 (1995)
H. Matsuki, K. Hoshino, T. Taguchi, Y. Ueno, and T. Hattori, ' Analysis of Plasma-Deposited $SiN_{x}$ Films Using XPS,' Techn. Report Inst. Electronics, Infomation, and Comm. Engr., 93 [46] 25-30 (1993)
J. Masek and J. J Mares, ' Model of Inactive Nitrogen Incorporation in Amorphous Silicon: Nitridated Vacancy,' Phys. Status Sol. B, 135 [1] K33-K38 (1986)
H. Kakinuma, M. Mohri, M. Sakamoto, and T. Tsuruoka, ' Structural Properties of Polycrystalline Silicon Films Prepared at Low Temperature by Plasma Chemical Vapor Deposition,' J. Appl. Phys., 70 [12] 7374-81 (1991)
G. M. Ingo and N. Zacehetti, ' XPS Investigation on the Growth Model of a- $SiN_{x}$ and Silicon and Nitrogen Chemical Bondings,' High Temp. Sci., 28 137-51 (1990)
J. Robertson, ' The Electronic Properties of Silicon Nitride,' Phil. Mag. B, 44 [2] 215-37 (1981)
S. Veprek and A. S. Argon, ' Mechanical Properties of Superhard Nanocomposites,' Surf. and Coat. Tech., 146-147 175-82 (2001)
N. Niederhofer, P. Nesladek, H. D. Mannling, K. Moto, S. Veprek, and M. Jilek, ' Structural Properties, Internal Stress and Thermal Stability of nc-TiN/a-SiN, nc-TiN/Ti- $Si_{x}$ and nc-( $Ti_{1-y}Al_{y}Si_{x}$ )N Superhard Nanocomposite Coatings Rearchjng the Hardness of Diamond,' Surf. and Coat. Tech., 120-121 173-78 (1999)
J. Patscheider, T. Zehnder, and M. Diserens, ' Structure-Performance Relations in Nanocomposite Coatings,' Surf. and Coat. Tech., 146-147 201-08 (2001)
M. Diserens, J. Patschejder, and F. Levy, ' Improving the Properties of Titanium Nitride by Incorporation of Silicon,' Surf. and Coat. Tech., 108-109 241-46 (1998)
F. Vaz, L. Rebouta, P. Goudeau, T. Gnardeau, J. Pacaud, J. P. Riviere, and A. Traverse, ' Structural Transitions in Hard Si-Based TiN Coatings: The Effect of Bias Voltage and Temperature,' Surf. and Coat. Tech., 146-147 274-79 (2001)
F. Vaz, L. Rebouta, P. Goudeau, J. Pacaud, H. Garem, J. P. Riviere, A. Cavaleiro, and E. Alves, ' Characterization of $Ti_{1-x}Si_{x}N_{y}$ Nanocomposite Films,' Surf. and Coat. Tech., 133-134 307-13 (2000)
S. Veprek, A. Niederhofer, K. Moto, T. Bolom, H. D. Mannling, P. Nesladek, G. Dollinger, and A. Bergmaier, ' Composition, Nanostructure, and Origin of the Ultrahardness in nc-TiN/a- $Si_{3}N_{4}$ /a- and nc- $TiSi_{2}$ Nanocomposites with Hv 80 to $\geq$ 105 GPa,' Surf. and Coat. Tech., 133-134 152-59 (2000)
J. Petalas and S. Logothetidis, 'Tetrahedron-Model Analysis of Silicon Nitride Thin Film and the Effect of Hydrogen and Temperature on their Optical Properties,' Phys. Rev. B, 50 [16] 11801-16 (1994).
H. R. Philipp, 'Optical and Bonding Model for Non-Crystalline $SiO_{x}$ and $SiO_{x}N_{y}$ Materials,' J. Non-Crystalline Solids, 8-10 627-32 (1972)
R. J. Temkin, 'An Analysis of the Radial Distribution Function of $SiO_{x}$ ,' J. Non-Crystalline Solids, 17 [2] 215-30 (1975)
V. A. Volodin, M. D. Efremov, V. A. Gritsenko, and S. A. Kochubei, 'Raman Study of Silicon Nanocrystals Formed in $SiN_{x}$ Films by Excimer Laser or Thermal Annealing,' Appl. Phys. Lett., 73 [9] 1212-14 (1998)
J. Zi, H. Buscher, C. Falter, W. Lduwing, K. Zhang, and X. Xie, ' Raman Shifts in Si Nanocrystals,' Appl. Phys. Lett., 69 [2] 200-02 (1996)
H. Hayashi, K. Wakita, Y. Nakayama, and T. Kawamura, ' Nano-Crystalline Silicon in a- $SiN_{x}$ :H Films,' Tech. Report Inst. Electronics, Infomation, and Comm. Eng., 91 [362] 45-9 (1991)
Z. Igbal, S. Vepick, A. P. Webb, and P. Capezzuto, ' Raman Scattering from Small Particle Size Polycrystalline Silicon,' Solid State Comm., 37 993-96 (1981)
*원문 PDF 파일 및 링크정보가 존재하지 않을 경우 KISTI DDS 시스템에서 제공하는 원문복사서비스를 사용할 수 있습니다.
저자가 APC(Article Processing Charge)를 지불한 논문에 한하여 자유로운 이용이 가능한, hybrid 저널에 출판된 논문
Copyright KISTI. All Rights Reserved.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.