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NTIS 바로가기한국정밀공학회지 = Journal of the Korean Society for Precision Engineering, v.23 no.3 = no.180, 2006년, pp.56 - 60
정성일 (LG 생산기술원) , 오현석 (LG 생산기술원) , 김규만 (경북대학교 기계공학부)
A high-resolution shadow mask, or called a nanostencil was fabricated for high resolution lithography. This high-resolution shadowmask was fabricated by a combination or MEMS processes and focused ion beam (FIB) milling. 500 nm thick and
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