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NTIS 바로가기한국유화학회지 = Journal of oil & applied science, v.24 no.3 = no.68, 2007년, pp.309 - 318
이종대 (충북대학교 공과대학 화학공학과) , 이태준 (충북대학교 공과대학 화학공학과) , 이창훈 (한양대학교 화학공학과) , 조경태 (충북대학교 공과대학 화학공학과)
Novolac is widely used as the primary solid component of most photoresists in semiconductor and microelectronic devices. In this study, novolac resins were prepared by condensation of 35% formaldehyde with phenolic compounds such as m-/p-cresol, 2,5-dimethylphenol and bisphenol A in the presence of ...
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A. Knop and L.A. Pilato, 'Phenolic Resin', p. 1, Spinger-Verlag, Berlin (1986)
A. Furuta, M. Hanabata and Y. Uemura, High Performance Positive Photoresists, J. Vac. Sci. Technol. B, 4, 430 (1986)
S. Miloshev, P. Novakov, V. Dimitrov and I. Gitsov, Synthesis of Novolac Resins: 2. Influence of The Reaction Medium on The Properties of the Novolac Oligomers, Polymer, 32, 3067 (1991)
L. E. Bogan, Determination of Cresol Novolak Copolymer Composition and Branch Density Using Carbon-13 NMR Spectroscopy, Macromolecules, 24, 4807 (1991)
E. Bogan, The Novolak Synthesis Reaction: A Description Based on Reactivities, Macromolecules, 25, 1966 (1992)
T. F. Yeh, H. Y. Shih and A. Reiser, Percolation View of Novolak Dissolution and Dissolution Inhibition, Macromolecules, 25, 5345 (1992)
R. Yang, S. A. Soper and W. Wang, A New UV Lithography Photoresist Based on Composite of EPON Resins 165 and 154 for Fabrication of High-Aspect-Ratio Microstructures, Sens. Actuators A: Phys. 135, 625 (2007)
C. M. Berger and C. L. Henderson, The Effect of Humidity on Water Sorption in Photoresist Polymer Thin Films, Polymer, 44, 2101 (2003)
D. Roy, A. Gandhi, P. K. Basu, P. Raghunathan and S. V. Eswaran, Optimization of Monomer Content and Degree of Linearity in Lithographically Interesting Novolac Copolymers using NMR Spectroscopy, Microelectronic Ens., 70, 58 (2003)
P. J. de Bruyn, L. M. Foo, A. S. C. Lim, M. G. Looney and D. H. Solomon, The Chemistry of Novolac Resins. Part 4. The Strategic Synthesis of Model Compounds, Tetrahedron, 53, 13915 (1997)
M. Kobayashi, F. Sanda and T. Endo, Application of Phosphonium Ylides to Latent Catalysts for Polyaddition of Bisphenol A Diglycidyl Ether with Bisphenol A: Model System of Epoxy-Novolac Resin, Macromolecules, 32, 4751 (1999)
Z. Anthony, U. S. Patent 5,130,410 (1992)
S. K. Lee and H. Lee, Synthesis and Properties of Mixed meta-and para-Cresol/Formaldehyde Novolak Resins, Polymer (Korea), 16, 662 (1992)
U. Westerwelle, G. Bahr, G. Grutzner and F. Reuther, Partially Carboxymethylated Novolaks for Photoresist Systems: New Photoresists for Development under Mildly Alkaline Conditions, Microelectronic Eng., 41/42, 343 (1998)
U. Yasunori, M. Hiroshi, and T. Yoshiyuki, U. S. Patent 6,815,140 (2004)
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