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NTIS 바로가기International journal of precision engineering and manufacturing, v.9 no.1, 2008년, pp.12 - 18
Wu, Chien-Feng (Department of Mechanical Engineering, National Chiao Tung University) , Hung, Chih-Ming (Department of Mechanical Engineering, National Chiao Tung University) , Chen, Juhn-Horng (Department of Mechanical Engineering, Chung Hua University) , Lee, An-Chen (Department of Mechanical Engineering, National Chiao Tung University)
This paper describes two run-to-run controllers, a nonlinear multiple exponential-weight moving-average (NMEWMA) controller and a dynamic model-tuning minimum-variance (DMTMV) controller, for photolithography processes. The relationships between the input recipes (exposure dose and focus) and output...
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