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NTIS 바로가기한국정밀공학회지 = Journal of the Korean Society for Precision Engineering, v.25 no.9 = no.210, 2008년, pp.109 - 115
이성훈 (중앙대학교 기계공학부) , 석종원 (중앙대학교 기계공학부) , 김필기 (중앙대학교 기계공학부) , 오승희 (중앙대학교 기계공학부) , 석종혁 (인하공업전문대학 화공환경과) , 오병준 ((주)에이앤아이)
The cleaning process of contaminant particles adhering to the microchips, integrated circuits (ICs) or the like is essential in modern microelectronics industry. In the cleaning process particularly working with the application of inert gases, the removal of contaminant particles of submicron scale ...
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