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NTIS 바로가기한국정밀공학회지 = Journal of the Korean Society for Precision Engineering, v.28 no.2, 2011년, pp.245 - 250
A high-resolution shadow mask, a nanostencil, is widely used for high resolution lithography. This high-resolution shadowmask is often fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. In this study, FIB milling on 500-nm-thin SiN membrane was tested and characterized...
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