[논문]Identifying and quantitating defects on chemical vapor deposition grown graphene layers by selected electrochemical deposition of Au nanoparticles

So, Hye-Mi; Mun, Jeong-Hun; Bang, Gyeong-Sook; Kim, Taek-Yong; Cho, Byung-Jin; Ahn, Chi-Won

doi:10.5714/cl.2012.13.1.056

Identifying and quantitating defects on chemical vapor deposition grown graphene layers by selected electrochemical deposition of Au nanoparticles 원문보기

Carbon letters, v.13 no.1, 2012년, pp.56 - 59

So, Hye-Mi (National Nanofab Center) , Mun, Jeong-Hun (Department of Electrical Engineering, Korea Advanced Institute of Science and Technology) , Bang, Gyeong-Sook (National Nanofab Center) , Kim, Taek-Yong (Department of Electrical Engineering, Korea Advanced Institute of Science and Technology) , Cho, Byung-Jin (Department of Electrical Engineering, Korea Advanced Institute of Science and Technology) , Ahn, Chi-Won (National Nanofab Center)

Abstract ▼ AI-Helper

The defect sites on chemical vapor deposition grown graphene are investigated through the selective electrochemical deposition (SED) of Au nanoparticles. For SED of Au nanoparticles, an engineered potential pulse is applied to the working electrode versus the reference electrode, thereby highlighting the defect sites, which are more reactive relative to the pristine surface. Most defect sites decorated by Au nanoparticles are situated along the Cu grain boundaries, implying that the origin of the defects lies in the synthesis of uneven graphene layers on the rough Cu surface.

주제어

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제안 방법

In this work, we have quantitatively investigated the defects on large size, high quality graphene layers grown by the CVD method via SED of Au nanoparticles. By adjusting the potential applied to the graphene, selective deposition of Au nanoparticles on specific defect sites was achieved.

대상 데이터

Employing a multi-potential system, we controlled both the nanoparticle size and packing density. A droplet of HAuCl₄ in 100 mM KCl (supporting electrolyte) was placed on the device and transferred graphene was used as a working electrode. A reduction potential was then applied with respect to an Ag|AgCl|KCl (3M) reference electrode with current monitoring using a Pt counter-electrode.

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