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NTIS 바로가기융합정보논문지 = Journal of Convergence for Information Technology, v.12 no.2, 2022년, pp.149 - 156
In this paper, it was attempted to form a titanium (Ti: Titanium) thin film using the atmospheric pressure plasma process technology for the conductor, which is the main component of the optical sensor. The atmospheric plasma equipment was remodeled. A 4-inch Ti target for sputter was etched using C...
J.-I. Lee, S. Lee, H.-M. Oh, B. R. Cho, K.-H. Seo & M. Y. Kim (2020). 3D Contact Position Estimation of Image-Based Areal Soft Tactile Sensor with Printed Array Markers and Image Sensors. Sensors, 20(13), 3796. DOI : 10.3390/s20133796
A. Inoue, T. Okino, S. Koyama & Y. Hirose (2020). Modeling and Analysis of Capacitive Relaxation Quenching in a Single Photon Avalanche Diode (SPAD) Applied to a CMOS Image Sensor. Sensors, 20(10), 3007. DOI : 10.3390/s20103007
M. Roslina & M. R. Mokhtar (2020). Self-referencing optical intensity sensor based on radio-frequency spectrum interrogation. Optical Fiber Technology, 53, 102009. DOI : 10.1016/j.yofte.2019.102009
Z. Krstic & V. D. Krstic (2012). Silicon nitride: the engineering material of the future, Journal of Materials Science, 47, 535-552. DOI : 10.1007/s10853-011-5942-5
M. D. Groner, F. H. Fabreguette, J. W. Elam & S. M. George (2004). Low-Temperature Al 2 O 3 Atomic Layer Deposition. Chemistry of Materials, 16(4), 639-645. DOI : 10.1021/cm0304546
O. A. Dicks, J. Cottom, A. L. Shluger & V. V. Afanas'ev (2019). The origin of negative charging in amorphous Al 2 O 3 films: the role of native defects. Nanotechnology, 30(20), 205201. DOI : 10.1088/1361-6528/ab0450
D. Arl, V. Roge, N. Adjeroud, B. R. Pistillo, M. Sarr, N. Bahlawane & D. Lenoble (2020). SiO 2 thin film growth through a pure atomic layer deposition technique at room temperature. RSC Advances, 10(31), 18073-18081. DOI : 10.1039/D0RA01602K
H. P. Kim, M. J. Kim, K. B. Kim, H. Khachatryan & J. Jang (2017). Properties of atmospheric hydrogen-plasma-treated CH 3 NH 3 Pb 3 perovskite films. Surface & Coatings Technology, 330, 228-233. DOI : 10.1016/j.surfcoat.2017.09.002
H. Khachatryan, H. P. Kim, S. N. Lee, H. K. Kim, M. J. Kim, K. B. Kim & J. Jang (2018). Novel method for dry etching CH 3 NH 3 PbI 3 perovskite films utilizing atmospheric-hydrogen-plasma. Materials Science in Semiconductor Processing, 75, 1-9. DOI : 10.1016/j.mssp.2017.11.019
H. Khachatryan, Y. H. Kim, K. B. Kim, H. J. Yang & M. J. Kim (2019). Direct etching of perovskite film by electron-beam scanning. Materials Science in Semiconductor Processing, 90, 171-181. DOI : 10.1016/j.mssp.2018.10.022
H. Khachatryan, S.-N. Lee, K.-B. Kim & M. J. Kim (2019). Deposition of Al Thin Film on Steel Substrate: The Role of Thickness on Crystallization and Grain Growth. Metals, 9(12), 1-8. DOI : 10.3390/met9010012
H. Khachatryan, S.-N. Lee, K.-B. Kim, H.-K. Kim & M. J. Kim (2018). Al thin film: The effect of substrate type on Al film formation and morphology. Journal of Physics and Chemistry of Solids, 122, 109-117. DOI : 10.1016/j.jpcs.2018.06.018
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