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NTIS 바로가기한국정보전자통신기술학회논문지 = Journal of Korea institute of information, electronics, and communication technology, v.16 no.4, 2023년, pp.173 - 179
윤여혁 (Department of Information and Communication Technology Engineering, Jeonju University)
This paper analyzes the time-dependent dielectric breakdown(TDDB) degradation mechanism for each stress region of Peri devices manufactured by 4th generation VNAND process, and presents a complementary lifetime prediction model that improves speed and accuracy in a wider reliability evaluation regio...
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