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NTIS 바로가기Thin solid films, v.379 no.1/2, 2000년, pp.213 - 217
Liou, Bor Wen (Department of Electrical Engineering, Wu-Feng Institute of Technology, Chiayi, Taiwan, PR China) , Lee, Chung Len (Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University, Hsinchu, Taiwan, PR China)
AbstractThis work studied plasma effects on the resistivity, effective free carrier concentration, and mobility of As+-doped, F-implanted polycrystalline silicon (polysilicon) thin films of various thicknesses. It was found that the resistivity of the polysilicon thin film increases with the decreas...
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