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NTIS 바로가기Materials Research Society symposia proceedings, v.585, 1999년, pp.183 -
Vyatkin, A. F. , Egorov, V. K. , Egorov, E. V.
AbstractStrain relaxation in epitaxial Si-Ge structures induced by ion beam bombardment has been studied using a He+ channeling technique. It is shown that hot ion beam bombardment (230°C, Si+ ions with energy 200 keV and fluence 6·1013 ion/cm2) of thin strained Si-Ge layers results in pa...
Bean, J. C., Sheng, T. T., Feldman, L. C., Fiory, A. T., Lynch, R. T.. Pseudomorphic growth of GexSi1−x on silicon by molecular beam epitaxy. Applied physics letters, vol.44, no.1, 102-104.
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